{"id":"https://openalex.org/W2007706530","doi":"https://doi.org/10.1364/ao.35.000701","title":"Surface morphologies of sputter-deposited aluminum films studied using a high-resolution phase-measuring laser interferometric microscope","display_name":"Surface morphologies of sputter-deposited aluminum films studied using a high-resolution phase-measuring laser interferometric microscope","publication_year":1996,"publication_date":"1996-02-01","ids":{"openalex":"https://openalex.org/W2007706530","doi":"https://doi.org/10.1364/ao.35.000701","mag":"2007706530","pmid":"https://pubmed.ncbi.nlm.nih.gov/21069058"},"language":"en","primary_location":{"id":"doi:10.1364/ao.35.000701","doi":"https://doi.org/10.1364/ao.35.000701","is_oa":false,"landing_page_url":"https://doi.org/10.1364/ao.35.000701","pdf_url":null,"source":{"id":"https://openalex.org/S4210211917","display_name":"Applied Optics","issn_l":"0003-6935","issn":["0003-6935","1539-4522","1540-8981","1559-128X","2155-3165"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["anvur-scientific","dongbi-c","jufo-1","medline","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310315679","host_organization_name":"Optica Publishing Group","host_organization_lineage":["https://openalex.org/P4310315679"],"host_organization_lineage_names":["Optica Publishing Group"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Optics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110494541","display_name":"Masakazu Furukawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1320697193","display_name":"Canon (Japan)","ror":"https://ror.org/05gg0gh87","country_code":"JP","type":"company","lineage":["https://openalex.org/I1320697193"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masakazu Furukawa","raw_affiliation_strings":["M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","institution_ids":["https://openalex.org/I1320697193"]},{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan","institution_ids":["https://openalex.org/I1320697193"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008056976","display_name":"Yoshito Yamamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1320697193","display_name":"Canon (Japan)","ror":"https://ror.org/05gg0gh87","country_code":"JP","type":"company","lineage":["https://openalex.org/I1320697193"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshito Yamamoto","raw_affiliation_strings":["M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","institution_ids":["https://openalex.org/I1320697193"]},{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan","institution_ids":["https://openalex.org/I1320697193"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054583844","display_name":"Hiroshi Ikakura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1320697193","display_name":"Canon (Japan)","ror":"https://ror.org/05gg0gh87","country_code":"JP","type":"company","lineage":["https://openalex.org/I1320697193"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Ikakura","raw_affiliation_strings":["M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, \nJapan","institution_ids":["https://openalex.org/I1320697193"]},{"raw_affiliation_string":"M. Furukawa, Y. Yamamoto, and H. Ikakura are with the Process Equipment Engineering Division, Canon Sales Co., Inc., 2-13-29 Koonan, Minato-ku, Tokyo 108, #N#Japan","institution_ids":["https://openalex.org/I1320697193"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083530391","display_name":"Nobuo Tanaka","orcid":"https://orcid.org/0000-0003-1496-2115","observed_orcids":["https://orcid.org/0000-0003-1496-2115"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Nobuo Tanaka","raw_affiliation_strings":["N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, \nJapan","N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, \nJapan","institution_ids":[]},{"raw_affiliation_string":"N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, #N#Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009727479","display_name":"Masayuki Hashimoto","orcid":"https://orcid.org/0000-0003-2340-7359","observed_orcids":["https://orcid.org/0000-0003-2340-7359","https://orcid.org/0000-0003-0671-0524"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masayuki Hashimoto","raw_affiliation_strings":["N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, \nJapan","N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, \nJapan","institution_ids":[]},{"raw_affiliation_string":"N. Tanaka and M. Hashimoto are with NS Semiconductor Co., Ltd., 1580 Yamamoto, Tateyama, Chiba 294, #N#Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Atsushi Sano","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I113306721","display_name":"Hiroshima University","ror":"https://ror.org/03t78wx29","country_code":"JP","type":"education","lineage":["https://openalex.org/I113306721"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Atsushi Sano","raw_affiliation_strings":["A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, \nJapan","A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, \nJapan","institution_ids":["https://openalex.org/I113306721"]},{"raw_affiliation_string":"A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, #N#Japan","institution_ids":["https://openalex.org/I113306721"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5067629492","display_name":"Shoso Shingubara","orcid":"https://orcid.org/0000-0003-2134-1691","observed_orcids":["https://orcid.org/0000-0003-2134-1691"]},"institutions":[{"id":"https://openalex.org/I113306721","display_name":"Hiroshima University","ror":"https://ror.org/03t78wx29","country_code":"JP","type":"education","lineage":["https://openalex.org/I113306721"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shoso Shingubara","raw_affiliation_strings":["A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, \nJapan","A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, #N#Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, \nJapan","institution_ids":["https://openalex.org/I113306721"]},{"raw_affiliation_string":"A. Sano and S. Shingubara are with the Department of Electrical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima 724, #N#Japan","institution_ids":["https://openalex.org/I113306721"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.1448,"has_fulltext":false,"cited_by_count":12,"citation_normalized_percentile":{"value":0.87014189,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"35","issue":"4","first_page":"701","last_page":"701"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.002400000113993883,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/aluminum-thin-films","display_name":"aluminum thin films","score":0.8209999799728394},{"id":"https://openalex.org/keywords/sputter-deposition","display_name":"sputter deposition","score":0.9769999980926514},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.8629999756813049},{"id":"https://openalex.org/keywords/rms-roughness","display_name":"RMS roughness","score":0.8939999938011169},{"id":"https://openalex.org/keywords/reflectivity","display_name":"reflectivity","score":0.7829999923706055},{"id":"https://openalex.org/keywords/temperature-dependence","display_name":"temperature dependence","score":0.5490000247955322},{"id":"https://openalex.org/keywords/argon-pressure","display_name":"argon pressure","score":0.8930000066757202},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.9649999737739563},{"id":"https://openalex.org/keywords/skewness","display_name":"skewness","score":0.5809999704360962}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8611489534378052},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.7267842292785645},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.6424385905265808},{"id":"https://openalex.org/C166689943","wikidata":"https://www.wikidata.org/wiki/Q850283","display_name":"Interferometry","level":2,"score":0.5574691295623779},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5326060056686401},{"id":"https://openalex.org/C67649825","wikidata":"https://www.wikidata.org/wiki/Q196538","display_name":"Microscope","level":2,"score":0.5305609703063965},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.5235751867294312},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.47812142968177795},{"id":"https://openalex.org/C159074562","wikidata":"https://www.wikidata.org/wiki/Q2557276","display_name":"White light interferometry","level":3,"score":0.4721298813819885},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.45994728803634644},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.4533237814903259},{"id":"https://openalex.org/C71907059","wikidata":"https://www.wikidata.org/wiki/Q223323","display_name":"Root mean square","level":2,"score":0.4438607692718506},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4314335286617279},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.41911572217941284},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.3498494029045105},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11285361647605896},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.0839506983757019},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1364/ao.35.000701","doi":"https://doi.org/10.1364/ao.35.000701","is_oa":false,"landing_page_url":"https://doi.org/10.1364/ao.35.000701","pdf_url":null,"source":{"id":"https://openalex.org/S4210211917","display_name":"Applied Optics","issn_l":"0003-6935","issn":["0003-6935","1539-4522","1540-8981","1559-128X","2155-3165"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["anvur-scientific","dongbi-c","jufo-1","medline","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310315679","host_organization_name":"Optica Publishing Group","host_organization_lineage":["https://openalex.org/P4310315679"],"host_organization_lineage_names":["Optica Publishing Group"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Optics","raw_type":"journal-article"},{"id":"pmid:21069058","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/21069058","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied optics","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1975416352","https://openalex.org/W2010945721","https://openalex.org/W2017334281","https://openalex.org/W2020324449","https://openalex.org/W2027889431","https://openalex.org/W2044696641","https://openalex.org/W2048396380","https://openalex.org/W2051483708","https://openalex.org/W2075493703","https://openalex.org/W2080326088","https://openalex.org/W2084962088","https://openalex.org/W2092665522","https://openalex.org/W2138054929","https://openalex.org/W2740627227"],"related_works":["https://openalex.org/W2332793238","https://openalex.org/W1983833418","https://openalex.org/W1969593939","https://openalex.org/W1980774656","https://openalex.org/W1027800473","https://openalex.org/W4404322521","https://openalex.org/W2016039906","https://openalex.org/W4387718008","https://openalex.org/W2382732650","https://openalex.org/W3095063782"],"abstract_inverted_index":{"Sputter-deposited":[0],"aluminum":[1],"(Al)":[2],"film":[3],"surface":[4,87],"morphologies":[5,88],"were":[6],"studied":[7],"with":[8],"a":[9,15,77],"new":[10],"nondestructive":[11],"method":[12],"that":[13,43,98],"incorporates":[14],"high-resolution":[16],"phase-measuring":[17],"laser":[18],"interferometric":[19],"microscope.":[20],"Good":[21],"correlation":[22],"is":[23,47,60],"obtained":[24],"between":[25],"rms":[26,45,68,100],"roughness":[27,46,69,101],"and":[28,35,70,86],"reflectivity":[29,52,54],"for":[30],"various":[31],"conditions":[32],"of":[33,66,107],"temperature":[34,64],"argon":[36],"gas":[37],"pressure.":[38],"It":[39],"should":[40],"be":[41],"noted":[42],"the":[44,63,67,71,99,105,108,112,119],"much":[48],"more":[49],"sensitive":[50],"than":[51],"when":[53,111],"exceeds":[55],"90%.":[56],"A":[57],"drastic":[58],"change":[59],"observed":[61],"in":[62,82],"dependence":[65],"skewness":[72],"at":[73],"200":[74],"\u00b0C.":[75],"As":[76],"result":[78],"there":[79],"are":[80,116],"changes":[81],"Al":[83,113],"grain":[84,114],"sizes":[85,115],"based":[89],"on":[90,104],"concomitant":[91],"scanning":[92],"electron":[93],"microscope":[94],"observations.":[95],"We":[96],"found":[97],"value":[102],"depends":[103],"resolution":[106],"objective":[109],"especially":[110],"comparable":[117],"to":[118],"resolution.":[120]},"counts_by_year":[{"year":2018,"cited_by_count":2},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-09-27T08:07:27.782135","created_date":"2016-06-24T00:00:00"}