{"id":"https://openalex.org/W2007644962","doi":"https://doi.org/10.1016/0039-6028(76)90468-4","title":"Removal of oxide films from silicon surfaces in a high vacuum system: an in situ ellipsometric study","display_name":"Removal of oxide films from silicon surfaces in a high vacuum system: an in situ ellipsometric study","publication_year":1976,"publication_date":"1976-06-01","ids":{"openalex":"https://openalex.org/W2007644962","doi":"https://doi.org/10.1016/0039-6028(76)90468-4","mag":"2007644962"},"language":"en","primary_location":{"id":"doi:10.1016/0039-6028(76)90468-4","doi":"https://doi.org/10.1016/0039-6028(76)90468-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(76)90468-4","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5073747117","display_name":"M. A. Hopper","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I141945490","display_name":"University of British Columbia","ror":"https://ror.org/03rmrcq20","country_code":"CA","type":"education","lineage":["https://openalex.org/I141945490"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"M.A. Hopper","raw_affiliation_strings":["Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada","institution_ids":["https://openalex.org/I141945490"]}]},{"author_position":"middle","author":{"id":null,"display_name":"R.A. Clarke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I141945490","display_name":"University of British Columbia","ror":"https://ror.org/03rmrcq20","country_code":"CA","type":"education","lineage":["https://openalex.org/I141945490"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"R.A. Clarke","raw_affiliation_strings":["Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada","institution_ids":["https://openalex.org/I141945490"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5029450398","display_name":"L. Young","orcid":"https://orcid.org/0000-0003-2569-6094","observed_orcids":["https://orcid.org/0000-0003-2569-6094"]},"institutions":[{"id":"https://openalex.org/I141945490","display_name":"University of British Columbia","ror":"https://ror.org/03rmrcq20","country_code":"CA","type":"education","lineage":["https://openalex.org/I141945490"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"L. Young","raw_affiliation_strings":["Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering University of British Columbia Vancouver, B. C., Canada","institution_ids":["https://openalex.org/I141945490"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I141945490"],"apc_list":{"value":3340,"currency":"USD","value_usd":3340},"apc_paid":null,"fwci":3.4349,"has_fulltext":false,"cited_by_count":19,"citation_normalized_percentile":{"value":0.91373507,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"56","issue":null,"first_page":"472","last_page":"481"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.41749998927116394,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.41749998927116394,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.2011999934911728,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.07129999995231628,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-surface-cleaning","display_name":"silicon surface cleaning","score":0.7429999709129333},{"id":"https://openalex.org/keywords/oxide-film-removal","display_name":"oxide film removal","score":0.8960000276565552},{"id":"https://openalex.org/keywords/argon-ion-bombardment","display_name":"argon ion bombardment","score":0.8450000286102295},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.800000011920929},{"id":"https://openalex.org/keywords/heat-treatment","display_name":"heat treatment","score":0.796999990940094},{"id":"https://openalex.org/keywords/in-situ-ellipsometry","display_name":"in situ ellipsometry","score":0.8320000171661377},{"id":"https://openalex.org/keywords/high-vacuum","display_name":"high vacuum","score":0.7590000033378601},{"id":"https://openalex.org/keywords/optical-flatness","display_name":"optical flatness","score":0.6850000023841858},{"id":"https://openalex.org/keywords/high-temperature-annealing","display_name":"high-temperature annealing","score":0.531000018119812}],"concepts":[{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.743049681186676},{"id":"https://openalex.org/C2777822432","wikidata":"https://www.wikidata.org/wiki/Q216681","display_name":"In situ","level":2,"score":0.7252371907234192},{"id":"https://openalex.org/C2780148907","wikidata":"https://www.wikidata.org/wiki/Q647584","display_name":"Flashing","level":2,"score":0.6842372417449951},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.6311794519424438},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6229220032691956},{"id":"https://openalex.org/C2779105228","wikidata":"https://www.wikidata.org/wiki/Q2286029","display_name":"Silicon oxide","level":4,"score":0.5739848613739014},{"id":"https://openalex.org/C82225425","wikidata":"https://www.wikidata.org/wiki/Q7880334","display_name":"Ultra-high vacuum","level":2,"score":0.5736315250396729},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5428469777107239},{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.5321917533874512},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4396848678588867},{"id":"https://openalex.org/C204530211","wikidata":"https://www.wikidata.org/wiki/Q752823","display_name":"Thermal","level":2,"score":0.41336801648139954},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.30321598052978516},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.29530853033065796},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2933123707771301},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.21066811680793762},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.06563585996627808},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0039-6028(76)90468-4","doi":"https://doi.org/10.1016/0039-6028(76)90468-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(76)90468-4","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W1944890485","https://openalex.org/W1972100726","https://openalex.org/W1977382111","https://openalex.org/W1988064932","https://openalex.org/W1994375676","https://openalex.org/W2012861544","https://openalex.org/W2014602930","https://openalex.org/W2021790503","https://openalex.org/W2034848908","https://openalex.org/W2039568857","https://openalex.org/W2042469719","https://openalex.org/W2042906403","https://openalex.org/W2059671080","https://openalex.org/W2060787066","https://openalex.org/W2066638353","https://openalex.org/W2070642095","https://openalex.org/W2083783752","https://openalex.org/W2086443957","https://openalex.org/W2087368116","https://openalex.org/W2095484084","https://openalex.org/W2132402707","https://openalex.org/W2141468414","https://openalex.org/W4235687059"],"related_works":["https://openalex.org/W1966608264","https://openalex.org/W2006194947","https://openalex.org/W1984644250","https://openalex.org/W1979394218","https://openalex.org/W2102501918","https://openalex.org/W2073114128","https://openalex.org/W4244466683","https://openalex.org/W2006400514","https://openalex.org/W2156147183","https://openalex.org/W2326165915"],"abstract_inverted_index":null,"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}