{"id":"https://openalex.org/W2007485203","doi":"https://doi.org/10.1063/1.108973","title":"Influence of ion energy on the physical properties of plasma deposited SiO2 reset films","display_name":"Influence of ion energy on the physical properties of plasma deposited SiO2 reset films","publication_year":1993,"publication_date":"1993-01-18","ids":{"openalex":"https://openalex.org/W2007485203","doi":"https://doi.org/10.1063/1.108973","mag":"2007485203"},"language":"en","primary_location":{"id":"doi:10.1063/1.108973","doi":"https://doi.org/10.1063/1.108973","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.108973","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101995126","display_name":"O. Joubert","orcid":"https://orcid.org/0000-0003-3374-1481","observed_orcids":["https://orcid.org/0000-0003-3374-1481"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"O. Joubert","raw_affiliation_strings":["Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001504620","display_name":"Rudolf R. Burke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"R. Burke","raw_affiliation_strings":["Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113627775","display_name":"L. Vallier","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"L. Vallier","raw_affiliation_strings":["Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108495233","display_name":"C. Martinet","orcid":"https://orcid.org/0000-0002-1324-3058","observed_orcids":["https://orcid.org/0000-0002-1324-3058"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I177483745","display_name":"Universit\u00e9 Joseph Fourier","ror":"https://ror.org/02aj0kh94","country_code":"FR","type":"education","lineage":["https://openalex.org/I177483745","https://openalex.org/I899635006"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"C. Martinet","raw_affiliation_strings":["Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique et Chimie des Proc\u00e9d\u00e9s Plasma, Universit\u00e9 Joseph Fourier (Grenoble 1), CNRS et CNET, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I177483745"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110606860","display_name":"Roderick A. B. Devine","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"R. A. B. Devine","raw_affiliation_strings":["France Telecom, Centre National d\u2019Etudes des T\u00e9l\u00e9communications, CNET-CNS, BP 98, 38243 Meylan Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"France Telecom, Centre National d\u2019Etudes des T\u00e9l\u00e9communications, CNET-CNS, BP 98, 38243 Meylan Cedex, France","institution_ids":["https://openalex.org/I19370010"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":7.6876,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.97828,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"62","issue":"3","first_page":"228","last_page":"230"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.7964000105857849,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.7964000105857849,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.12219999730587006,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0203000009059906,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-dioxide-thin-films","display_name":"SiO2 thin films","score":0.8600000143051147},{"id":"https://openalex.org/keywords/plasma-deposition","display_name":"plasma deposition","score":0.6259999871253967},{"id":"https://openalex.org/keywords/ion-energy","display_name":"ion energy","score":0.9279999732971191},{"id":"https://openalex.org/keywords/electron-cyclotron-resonance-plasma","display_name":"electron cyclotron resonance plasma","score":0.871999979019165},{"id":"https://openalex.org/keywords/microwave-plasma","display_name":"microwave plasma","score":0.7459999918937683},{"id":"https://openalex.org/keywords/refractive-index","display_name":"refractive index","score":0.9729999899864197},{"id":"https://openalex.org/keywords/infrared-absorption","display_name":"infrared absorption","score":0.7820000052452087},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.8379999995231628},{"id":"https://openalex.org/keywords/electrical-properties","display_name":"electrical properties","score":0.8669999837875366}],"concepts":[{"id":"https://openalex.org/C175361016","wikidata":"https://www.wikidata.org/wiki/Q245591","display_name":"Electron cyclotron resonance","level":3,"score":0.6768541932106018},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5736882090568542},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.521577775478363},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.5168347954750061},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5158118605613708},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.507087230682373},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.49043795466423035},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.47335076332092285},{"id":"https://openalex.org/C181500209","wikidata":"https://www.wikidata.org/wiki/Q215328","display_name":"Excited state","level":2,"score":0.45149466395378113},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4443928599357605},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.4182977080345154},{"id":"https://openalex.org/C125287762","wikidata":"https://www.wikidata.org/wiki/Q1758948","display_name":"Absorption (acoustics)","level":2,"score":0.41400039196014404},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4122540056705475},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.37380820512771606},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.37141913175582886},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.16879189014434814},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.12207981944084167},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.08848053216934204},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1063/1.108973","doi":"https://doi.org/10.1063/1.108973","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.108973","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},{"id":"pmh:oai:HAL:hal-00282427v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-00282427","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Applied Physics Letters, 1993, 62(3), pp.228","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W1992558291","https://openalex.org/W2002161020","https://openalex.org/W2008534859","https://openalex.org/W2018559238","https://openalex.org/W2019212189","https://openalex.org/W2032242943","https://openalex.org/W2042118863","https://openalex.org/W2056582154","https://openalex.org/W2059623550","https://openalex.org/W2139466690","https://openalex.org/W2219205550"],"related_works":["https://openalex.org/W2100641891","https://openalex.org/W1992123172","https://openalex.org/W2219205550","https://openalex.org/W2005867084","https://openalex.org/W2321816144","https://openalex.org/W1013877525","https://openalex.org/W1967568532","https://openalex.org/W7097432481","https://openalex.org/W1983540296","https://openalex.org/W1984302543"],"abstract_inverted_index":{"Silicon":[0],"dioxide":[1],"films":[2],"have":[3],"been":[4,49],"deposited":[5],"using":[6],"a":[7],"SiH4+O2":[8],"microwave":[9],"plasma":[10],"excited":[11],"by":[12],"distributed":[13],"electron":[14],"cyclotron":[15],"resonance.":[16],"The":[17,28,36],"ratio":[18],"of":[19,22,38,69,77],"flow":[20],"rates":[21],"the":[23,44,70],"reactive":[24],"gas":[25],"was":[26,30],"O2/SiH4\u223c7.":[27],"substrate":[29],"not":[31],"heated":[32],"intentionally":[33],"(T<150":[34],"\u00b0C).":[35],"effect":[37],"ion":[39,64],"energy":[40],"during":[41],"deposition,":[42],"in":[43],"10\u2013150":[45],"eV":[46],"range,":[47],"has":[48],"studied":[50],"through":[51],"refractive":[52],"index,":[53],"infrared":[54],"absorption":[55],"bands,":[56],"chemical":[57],"etch":[58],"rate,":[59],"and":[60],"electrical":[61],"measurements.":[62],"For":[63],"energies":[65],"\u227350":[66],"eV,":[67],"many":[68],"film":[71],"characteristics":[72],"are":[73],"close":[74],"to":[75],"those":[76],"thermal":[78],"SiO2":[79]},"counts_by_year":[{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}