{"id":"https://openalex.org/W2007193978","doi":"https://doi.org/10.1016/0038-1101(70)90056-0","title":"Electron tunneling and contact resistance of metal-silicon contact barriers","display_name":"Electron tunneling and contact resistance of metal-silicon contact barriers","publication_year":1970,"publication_date":"1970-02-01","ids":{"openalex":"https://openalex.org/W2007193978","doi":"https://doi.org/10.1016/0038-1101(70)90056-0","mag":"2007193978"},"language":"en","primary_location":{"id":"doi:10.1016/0038-1101(70)90056-0","doi":"https://doi.org/10.1016/0038-1101(70)90056-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0038-1101(70)90056-0","pdf_url":null,"source":{"id":"https://openalex.org/S77418581","display_name":"Solid-State Electronics","issn_l":"0038-1101","issn":["0038-1101","1879-2405"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid-State Electronics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5040851820","display_name":"A.Y.C. Yu","orcid":"https://orcid.org/0000-0002-2021-3674","observed_orcids":["https://orcid.org/0000-0002-2021-3674"]},"institutions":[{"id":"https://openalex.org/I81844223","display_name":"Fairchild Semiconductor (United States)","ror":"https://ror.org/03yca1933","country_code":"US","type":"company","lineage":["https://openalex.org/I81844223"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"A.Y.C. Yu","raw_affiliation_strings":["Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, California 94304, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, California 94304, USA","institution_ids":["https://openalex.org/I81844223"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5040851820"],"corresponding_institution_ids":["https://openalex.org/I81844223"],"apc_list":{"value":2410,"currency":"USD","value_usd":2410},"apc_paid":null,"fwci":4.1327,"has_fulltext":false,"cited_by_count":548,"citation_normalized_percentile":{"value":0.94470727,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":98,"max":100},"biblio":{"volume":"13","issue":"2","first_page":"239","last_page":"247"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.989300012588501,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.989300012588501,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.003000000026077032,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.002199999988079071,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electron-tunneling","display_name":"electron tunneling","score":0.9909999966621399},{"id":"https://openalex.org/keywords/contact-resistance","display_name":"contact resistance","score":0.968999981880188},{"id":"https://openalex.org/keywords/metal-silicon-contacts","display_name":"metal-silicon contacts","score":0.9769999980926514},{"id":"https://openalex.org/keywords/tunnel-barrier","display_name":"tunnel barrier","score":0.6100000143051147},{"id":"https://openalex.org/keywords/schottky-contacts","display_name":"Schottky contacts","score":0.7039999961853027},{"id":"https://openalex.org/keywords/tunneling-current","display_name":"tunneling current","score":0.414000004529953}],"concepts":[{"id":"https://openalex.org/C120398109","wikidata":"https://www.wikidata.org/wiki/Q175751","display_name":"Quantum tunnelling","level":2,"score":0.7372605204582214},{"id":"https://openalex.org/C123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","level":3,"score":0.6986857056617737},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6338027715682983},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5799943208694458},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.5137990117073059},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.5087636113166809},{"id":"https://openalex.org/C57473165","wikidata":"https://www.wikidata.org/wiki/Q7315604","display_name":"Resistance (ecology)","level":2,"score":0.46108314394950867},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.36307793855667114},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3352554440498352},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.2839648127555847},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.26774609088897705},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12880688905715942},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.055923014879226685},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.05295145511627197},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0038-1101(70)90056-0","doi":"https://doi.org/10.1016/0038-1101(70)90056-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0038-1101(70)90056-0","pdf_url":null,"source":{"id":"https://openalex.org/S77418581","display_name":"Solid-State Electronics","issn_l":"0038-1101","issn":["0038-1101","1879-2405"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid-State Electronics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W1522420786","https://openalex.org/W1974643526","https://openalex.org/W1978918623","https://openalex.org/W1982584359","https://openalex.org/W1984073102","https://openalex.org/W1986573991","https://openalex.org/W1988345173","https://openalex.org/W1989852422","https://openalex.org/W2007678606","https://openalex.org/W2020173428","https://openalex.org/W2027887775","https://openalex.org/W2054812637","https://openalex.org/W2071063713","https://openalex.org/W2082893111","https://openalex.org/W2086468331","https://openalex.org/W2095430333","https://openalex.org/W2140873745","https://openalex.org/W2162943538","https://openalex.org/W2163678992","https://openalex.org/W2163900876","https://openalex.org/W3104052334"],"related_works":["https://openalex.org/W4255679862","https://openalex.org/W2087458520","https://openalex.org/W1983771280","https://openalex.org/W4233950828","https://openalex.org/W3111650637","https://openalex.org/W3017102594","https://openalex.org/W2140873745","https://openalex.org/W3015026075","https://openalex.org/W4251421969","https://openalex.org/W3094924424"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":16},{"year":2025,"cited_by_count":7},{"year":2024,"cited_by_count":15},{"year":2023,"cited_by_count":8},{"year":2022,"cited_by_count":20},{"year":2021,"cited_by_count":17},{"year":2020,"cited_by_count":19},{"year":2019,"cited_by_count":16},{"year":2018,"cited_by_count":19},{"year":2017,"cited_by_count":7},{"year":2016,"cited_by_count":27},{"year":2015,"cited_by_count":24},{"year":2014,"cited_by_count":21},{"year":2013,"cited_by_count":22},{"year":2012,"cited_by_count":18}],"updated_date":"2026-11-08T12:12:28.789561","created_date":"2025-10-10T00:00:00"}