{"id":"https://openalex.org/W2006246176","doi":"https://doi.org/10.1116/1.585920","title":"Synchrotron radiation stepper with new alignment system","display_name":"Synchrotron radiation stepper with new alignment system","publication_year":1992,"publication_date":"1992-11-01","ids":{"openalex":"https://openalex.org/W2006246176","doi":"https://doi.org/10.1116/1.585920","mag":"2006246176"},"language":"en","primary_location":{"id":"doi:10.1116/1.585920","doi":"https://doi.org/10.1116/1.585920","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.585920","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5043798297","display_name":"Fumio Sat\u014d","orcid":"https://orcid.org/0000-0001-9224-7825","observed_orcids":["https://orcid.org/0000-0001-9224-7825"]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"F. Sato","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113848608","display_name":"Kotaro Ito","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Ito","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044734732","display_name":"Tsutomu Miyatake","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Miyatake","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]},{"author_position":"middle","author":{"id":null,"display_name":"K. Yamazaki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Yamazaki","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039246815","display_name":"Shiro Hamada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Hamada","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]},{"author_position":"last","author":{"id":null,"display_name":"Y. Tomita","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197507943","display_name":"Sumitomo Heavy Industries (Japan)","ror":"https://ror.org/03yskk486","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Tomita","raw_affiliation_strings":["Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sumitomo Heavy Industries, Ltd. 2-1-1 Yato-cho Tanashi-City, Tokyo 188, Japan","institution_ids":["https://openalex.org/I197507943"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I197507943"],"apc_list":null,"apc_paid":null,"fwci":1.8542,"has_fulltext":false,"cited_by_count":8,"citation_normalized_percentile":{"value":0.82496284,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"10","issue":"6","first_page":"3235","last_page":"3238"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10559","display_name":"Particle Accelerators and Free-Electron Lasers","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/synchrotron-radiation","display_name":"synchrotron radiation","score":0.8679999709129333},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.9520000219345093},{"id":"https://openalex.org/keywords/alignment-system","display_name":"alignment system","score":0.843999981880188},{"id":"https://openalex.org/keywords/overlay-accuracy","display_name":"overlay accuracy","score":0.9670000076293945},{"id":"https://openalex.org/keywords/compact-synchrotron","display_name":"compact synchrotron","score":0.7749999761581421},{"id":"https://openalex.org/keywords/aurora","display_name":"aurora","score":0.7850000262260437},{"id":"https://openalex.org/keywords/line-and-space-patterns","display_name":"line/space patterning","score":0.75},{"id":"https://openalex.org/keywords/high-aspect-ratio-patterning","display_name":"high aspect ratio patterning","score":0.8569999933242798},{"id":"https://openalex.org/keywords/ulsi","display_name":"ULSI","score":0.8790000081062317}],"concepts":[{"id":"https://openalex.org/C187504802","wikidata":"https://www.wikidata.org/wiki/Q1751548","display_name":"Stepper","level":2,"score":0.9227861762046814},{"id":"https://openalex.org/C16332341","wikidata":"https://www.wikidata.org/wiki/Q212871","display_name":"Synchrotron radiation","level":2,"score":0.8388423919677734},{"id":"https://openalex.org/C21368211","wikidata":"https://www.wikidata.org/wiki/Q689863","display_name":"Synchrotron","level":2,"score":0.6999204158782959},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6469550132751465},{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.6365373730659485},{"id":"https://openalex.org/C136959337","wikidata":"https://www.wikidata.org/wiki/Q3300772","display_name":"Beamline","level":3,"score":0.6202723979949951},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5713105201721191},{"id":"https://openalex.org/C2779575624","wikidata":"https://www.wikidata.org/wiki/Q6670851","display_name":"Synchrotron light source","level":4,"score":0.5163606405258179},{"id":"https://openalex.org/C183838350","wikidata":"https://www.wikidata.org/wiki/Q5754517","display_name":"High-energy X-rays","level":4,"score":0.44865697622299194},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.41135311126708984},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.4069312512874603},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3853473365306854},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.2917407155036926},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.099781334400177},{"id":"https://openalex.org/C2776595292","wikidata":"https://www.wikidata.org/wiki/Q919917","display_name":"Storage ring","level":3,"score":0.07781100273132324},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.585920","doi":"https://doi.org/10.1116/1.585920","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.585920","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2082236643","https://openalex.org/W2027669372","https://openalex.org/W204086715","https://openalex.org/W2089201064","https://openalex.org/W2119604888","https://openalex.org/W1991355044","https://openalex.org/W1965417992","https://openalex.org/W2058974251","https://openalex.org/W2015712017","https://openalex.org/W2056792637"],"abstract_inverted_index":{"A":[0,41],"vertical":[1],"stepper":[2],"for":[3,63],"synchrotron":[4,24],"radiation":[5],"(SR)":[6],"x-ray":[7],"lithography":[8],"has":[9],"been":[10,15,57],"developed.":[11],"Evaluation":[12],"tests":[13],"have":[14,56],"done":[16],"with":[17,49],"SR":[18],"light":[19],"from":[20],"the":[21,64],"superconducting":[22],"compact":[23],"\u2018\u2018AURORA\u2019\u2019":[25],"located":[26],"in":[27],"SHI-Tanashi":[28],"Works,":[29],"Tokyo.":[30],"An":[31],"overlay":[32],"accuracy":[33],"of":[34],"less":[35],"than":[36],"0.08":[37],"\u03bcm":[38,43],"was":[39,46],"obtained.":[40],"0.2":[42],"line-and-space":[44],"pattern":[45],"successfully":[47],"resolved":[48],"a":[50],"high-aspect":[51],"ratio.":[52],"The":[53,59],"designed":[54],"specifications":[55],"attained.":[58],"system":[60],"is":[61],"ready":[62],"future":[65],"generation":[66],"ultra-large-scale":[67],"integration":[68],"applications.":[69]},"counts_by_year":[{"year":2022,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}