{"id":"https://openalex.org/W2005392027","doi":"https://doi.org/10.1016/j.apsusc.2010.11.138","title":"The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD","display_name":"The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD","publication_year":2010,"publication_date":"2010-11-30","ids":{"openalex":"https://openalex.org/W2005392027","doi":"https://doi.org/10.1016/j.apsusc.2010.11.138","mag":"2005392027"},"language":"en","primary_location":{"id":"doi:10.1016/j.apsusc.2010.11.138","doi":"https://doi.org/10.1016/j.apsusc.2010.11.138","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2010.11.138","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"http://doi.org/10.1016/j.apsusc.2010.11.138","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5057086893","display_name":"Doyoung Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Doyoung Kim","raw_affiliation_strings":["School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101148259","display_name":"Hyemin Kang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyemin Kang","raw_affiliation_strings":["School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5152925964","display_name":"Jae-Min Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jae-Min Kim","raw_affiliation_strings":["School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100388391","display_name":"Hyungjun Kim","orcid":"https://orcid.org/0000-0003-2256-8046","observed_orcids":["https://orcid.org/0000-0003-2256-8046","https://orcid.org/0000-0002-0230-9322"]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Hyungjun Kim","raw_affiliation_strings":["School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-Gu, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5100388391"],"corresponding_institution_ids":["https://openalex.org/I193775966"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":3.3585,"has_fulltext":false,"cited_by_count":133,"citation_normalized_percentile":{"value":0.93261041,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":96,"max":99},"biblio":{"volume":"257","issue":"8","first_page":"3776","last_page":"3779"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9839000105857849,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9839000105857849,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.01140000019222498,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.003100000089034438,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/zno-thin-films","display_name":"ZnO thin films","score":0.9309999942779541},{"id":"https://openalex.org/keywords/plasma-enhanced-atomic-layer-deposition","display_name":"plasma-enhanced atomic layer deposition","score":0.9990000128746033},{"id":"https://openalex.org/keywords/thermal-atomic-layer-deposition","display_name":"thermal atomic layer deposition","score":0.9990000128746033},{"id":"https://openalex.org/keywords/oxygen-plasma","display_name":"oxygen plasma","score":0.8259999752044678},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.7730000019073486},{"id":"https://openalex.org/keywords/interstitial-oxygen","display_name":"interstitial oxygen","score":0.9110000133514404},{"id":"https://openalex.org/keywords/growth-temperature","display_name":"growth temperature","score":0.8569999933242798},{"id":"https://openalex.org/keywords/photoluminescence","display_name":"photoluminescence","score":0.796999990940094},{"id":"https://openalex.org/keywords/thin-film-transistors","display_name":"thin-film transistors","score":0.8989999890327454},{"id":"https://openalex.org/keywords/002-preferred-orientation","display_name":"(002) preferred orientation","score":0.8690000176429749}],"concepts":[{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.9499980211257935},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7465592622756958},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.7093179225921631},{"id":"https://openalex.org/C85080765","wikidata":"https://www.wikidata.org/wiki/Q614893","display_name":"Photoluminescence","level":2,"score":0.5964797139167786},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5619494915008545},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5342696309089661},{"id":"https://openalex.org/C535196362","wikidata":"https://www.wikidata.org/wiki/Q758","display_name":"Zinc","level":2,"score":0.49912166595458984},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.43645572662353516},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4108908772468567},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.35587459802627563},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3530338406562805},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.34171444177627563},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2852160334587097},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1564074158668518},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1562807261943817},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/j.apsusc.2010.11.138","doi":"https://doi.org/10.1016/j.apsusc.2010.11.138","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2010.11.138","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},{"id":"pmh:oai:oak:2014.oak/469","doi":null,"is_oa":true,"landing_page_url":"http://doi.org/10.1016/j.apsusc.2010.11.138","pdf_url":null,"source":{"id":"https://openalex.org/S4306400611","display_name":"Korean Studies Service Information System (Chonbuk National University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I80611190","host_organization_name":"Jeonbuk National University","host_organization_lineage":["https://openalex.org/I80611190"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"\uc5f0\uad6c\ub17c\ubb38"}],"best_oa_location":{"id":"pmh:oai:oak:2014.oak/469","doi":null,"is_oa":true,"landing_page_url":"http://doi.org/10.1016/j.apsusc.2010.11.138","pdf_url":null,"source":{"id":"https://openalex.org/S4306400611","display_name":"Korean Studies Service Information System (Chonbuk National University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I80611190","host_organization_name":"Jeonbuk National University","host_organization_lineage":["https://openalex.org/I80611190"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-nc-nd","license_id":"https://openalex.org/licenses/cc-by-nc-nd","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"\uc5f0\uad6c\ub17c\ubb38"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G240464493","display_name":null,"funder_award_id":"10030519","funder_id":"https://openalex.org/F4320321640","funder_display_name":"Ministry of Knowledge Economy"},{"id":"https://openalex.org/G6766143807","display_name":null,"funder_award_id":"2009-0083749","funder_id":"https://openalex.org/F4320320671","funder_display_name":"National Research Foundation"}],"funders":[{"id":"https://openalex.org/F4320320671","display_name":"National Research Foundation","ror":"https://ror.org/05s0g1g46"},{"id":"https://openalex.org/F4320321038","display_name":"Fonds National de la Recherche Luxembourg","ror":"https://ror.org/039z13y21"},{"id":"https://openalex.org/F4320321314","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96"},{"id":"https://openalex.org/F4320321640","display_name":"Ministry of Knowledge Economy","ror":"https://ror.org/008nkqk13"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1968881618","https://openalex.org/W1969183462","https://openalex.org/W1977517886","https://openalex.org/W1982527126","https://openalex.org/W2035449306","https://openalex.org/W2040226447","https://openalex.org/W2050897202","https://openalex.org/W2053483731","https://openalex.org/W2073998446","https://openalex.org/W2090073355","https://openalex.org/W2129108341","https://openalex.org/W2159437817"],"related_works":["https://openalex.org/W2334500607","https://openalex.org/W2075122000","https://openalex.org/W3128766054","https://openalex.org/W2761462800","https://openalex.org/W2167448657","https://openalex.org/W2018448736","https://openalex.org/W3208039731","https://openalex.org/W2953419883","https://openalex.org/W4411273472","https://openalex.org/W2040226447"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":8},{"year":2024,"cited_by_count":5},{"year":2023,"cited_by_count":6},{"year":2022,"cited_by_count":8},{"year":2021,"cited_by_count":15},{"year":2020,"cited_by_count":11},{"year":2019,"cited_by_count":9},{"year":2018,"cited_by_count":5},{"year":2017,"cited_by_count":11},{"year":2016,"cited_by_count":8},{"year":2015,"cited_by_count":9},{"year":2014,"cited_by_count":11},{"year":2013,"cited_by_count":11},{"year":2012,"cited_by_count":5}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}