{"id":"https://openalex.org/W2005332866","doi":"https://doi.org/10.1016/j.mee.2005.04.057","title":"LaAlO3 films prepared by MBE on LaAlO3(001) and Si(001) substrates","display_name":"LaAlO3 films prepared by MBE on LaAlO3(001) and Si(001) substrates","publication_year":2005,"publication_date":"2005-06-01","ids":{"openalex":"https://openalex.org/W2005332866","doi":"https://doi.org/10.1016/j.mee.2005.04.057","mag":"2005332866"},"language":"en","primary_location":{"id":"doi:10.1016/j.mee.2005.04.057","doi":"https://doi.org/10.1016/j.mee.2005.04.057","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2005.04.057","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5018715103","display_name":"S. Gaillard","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I112936343","display_name":"\u00c9cole Centrale de Lyon","ror":"https://ror.org/05s6rge65","country_code":"FR","type":"education","lineage":["https://openalex.org/I112936343","https://openalex.org/I203339264"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":true,"raw_author_name":"S. Gaillard","raw_affiliation_strings":["Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex, France","LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","ST-CROLLES - STMicroelectronics [Crolles] (850 rue Jean Monnet BP 16 38926 Crolles - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","institution_ids":["https://openalex.org/I112936343","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex, France","institution_ids":["https://openalex.org/I4210104693"]},{"raw_affiliation_string":"LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","institution_ids":[]},{"raw_affiliation_string":"ST-CROLLES - STMicroelectronics [Crolles] (850 rue Jean Monnet BP 16 38926 Crolles - France)","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028733917","display_name":"Yoann Rozier","orcid":"https://orcid.org/0009-0000-0363-3231","observed_orcids":["https://orcid.org/0009-0000-0363-3231"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I48430043","display_name":"Institut National des Sciences Appliqu\u00e9es de Lyon","ror":"https://ror.org/050jn9y42","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I48430043"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Y. Rozier","raw_affiliation_strings":["INSA de Lyon, LPM-UMR CNRS 5511, 69621 Villeurbanne Cedex, France. Tel.: +33 4 72 18 60 49","LPM - Laboratoire de physique de la mati\u00e8re (B\u00e2timent Blaise Pascal 7 avenue Jean Capelle 69621 VILLEURBANNE CEDEX - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"INSA de Lyon, LPM-UMR CNRS 5511, 69621 Villeurbanne Cedex, France. Tel.: +33 4 72 18 60 49","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I48430043"]},{"raw_affiliation_string":"LPM - Laboratoire de physique de la mati\u00e8re (B\u00e2timent Blaise Pascal 7 avenue Jean Capelle 69621 VILLEURBANNE CEDEX - France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016276763","display_name":"Cl\u00e9ment Merckling","orcid":"https://orcid.org/0000-0003-3084-2543","observed_orcids":["https://orcid.org/0000-0003-3084-2543"]},"institutions":[{"id":"https://openalex.org/I112936343","display_name":"\u00c9cole Centrale de Lyon","ror":"https://ror.org/05s6rge65","country_code":"FR","type":"education","lineage":["https://openalex.org/I112936343","https://openalex.org/I203339264"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"C. Merckling","raw_affiliation_strings":["Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex, France","LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","ST-CROLLES - STMicroelectronics [Crolles] (850 rue Jean Monnet BP 16 38926 Crolles - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","institution_ids":["https://openalex.org/I112936343","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex, France","institution_ids":["https://openalex.org/I4210104693"]},{"raw_affiliation_string":"LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","institution_ids":[]},{"raw_affiliation_string":"ST-CROLLES - STMicroelectronics [Crolles] (850 rue Jean Monnet BP 16 38926 Crolles - France)","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066407622","display_name":"F. Ducroquet","orcid":"https://orcid.org/0000-0001-8770-9650","observed_orcids":["https://orcid.org/0000-0001-8770-9650"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I48430043","display_name":"Institut National des Sciences Appliqu\u00e9es de Lyon","ror":"https://ror.org/050jn9y42","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I48430043"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"F. Ducroquet","raw_affiliation_strings":["INSA de Lyon, LPM-UMR CNRS 5511, 69621 Villeurbanne Cedex, France. Tel.: +33 4 72 18 60 49","LPM - Laboratoire de physique de la mati\u00e8re (B\u00e2timent Blaise Pascal 7 avenue Jean Capelle 69621 VILLEURBANNE CEDEX - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"INSA de Lyon, LPM-UMR CNRS 5511, 69621 Villeurbanne Cedex, France. Tel.: +33 4 72 18 60 49","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I48430043"]},{"raw_affiliation_string":"LPM - Laboratoire de physique de la mati\u00e8re (B\u00e2timent Blaise Pascal 7 avenue Jean Capelle 69621 VILLEURBANNE CEDEX - France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072611204","display_name":"M. Gendry","orcid":"https://orcid.org/0000-0003-4237-6164","observed_orcids":["https://orcid.org/0000-0003-4237-6164"]},"institutions":[{"id":"https://openalex.org/I112936343","display_name":"\u00c9cole Centrale de Lyon","ror":"https://ror.org/05s6rge65","country_code":"FR","type":"education","lineage":["https://openalex.org/I112936343","https://openalex.org/I203339264"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Gendry","raw_affiliation_strings":["Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","institution_ids":["https://openalex.org/I112936343","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109932556","display_name":"Guy Hollinger","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I112936343","display_name":"\u00c9cole Centrale de Lyon","ror":"https://ror.org/05s6rge65","country_code":"FR","type":"education","lineage":["https://openalex.org/I112936343","https://openalex.org/I203339264"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"G. Hollinger","raw_affiliation_strings":["Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ecole Centrale de Lyon, LEOM-UMR CNRS 5512, 69134 Ecully Cedex, France","institution_ids":["https://openalex.org/I112936343","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"LEOM - Laboratoire d'\u00e9lectronique, opto\u00e9lectronique et microsyst\u00e8mes (bat. 7 36 Av Guy de Collongue - BP 163 69131 ECULLY CEDEX - France)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5018715103"],"corresponding_institution_ids":["https://openalex.org/I112936343","https://openalex.org/I1294671590","https://openalex.org/I4210104693"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":2.7666,"has_fulltext":false,"cited_by_count":27,"citation_normalized_percentile":{"value":0.89335733,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"80","issue":null,"first_page":"146","last_page":"149"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.004900000058114529,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/laalo3-thin-films","display_name":"LaAlO3 thin films","score":0.968999981880188},{"id":"https://openalex.org/keywords/homoepitaxy","display_name":"homoepitaxy","score":0.8740000128746033},{"id":"https://openalex.org/keywords/high-k-dielectrics","display_name":"high-k dielectrics","score":0.8399999737739563},{"id":"https://openalex.org/keywords/growth-temperature","display_name":"growth temperature","score":0.6230000257492065},{"id":"https://openalex.org/keywords/interfacial-reaction","display_name":"interfacial reaction","score":0.777999997138977},{"id":"https://openalex.org/keywords/leakage-current","display_name":"leakage current","score":0.8669999837875366},{"id":"https://openalex.org/keywords/dielectric-constant","display_name":"dielectric constant","score":0.7279999852180481},{"id":"https://openalex.org/keywords/charge-density","display_name":"charge density","score":0.8600000143051147},{"id":"https://openalex.org/keywords/atomic-oxygen","display_name":"atomic oxygen","score":0.7110000252723694},{"id":"https://openalex.org/keywords/molecular-oxygen","display_name":"molecular oxygen","score":0.9390000104904175},{"id":"https://openalex.org/keywords/single-crystallinity","display_name":"single crystallinity","score":0.4309999942779541}],"concepts":[{"id":"https://openalex.org/C3792809","wikidata":"https://www.wikidata.org/wiki/Q898542","display_name":"Molecular beam epitaxy","level":4,"score":0.7465455532073975},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7205777764320374},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.7160966396331787},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6302943229675293},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.5297242999076843},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.45119497179985046},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.44868576526641846},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.38900241255760193},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3689171075820923},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.30918341875076294},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.20961233973503113},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.20318391919136047},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.05292510986328125},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/j.mee.2005.04.057","doi":"https://doi.org/10.1016/j.mee.2005.04.057","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2005.04.057","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},{"id":"pmh:oai:HAL:hal-02089815v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-02089815","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Microelectronic Engineering, 2005, 80, pp.146-149. ⟨10.1016/j.mee.2005.04.057⟩","raw_type":"info:eu-repo/semantics/article"},{"id":"mag:3141750566","doi":null,"is_oa":false,"landing_page_url":"https://dl.acm.org/doi/10.5555/1101679.1101713","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Microelectronic Engineering","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1487069997","https://openalex.org/W1589517541","https://openalex.org/W1651365901","https://openalex.org/W2003645630","https://openalex.org/W2010741836","https://openalex.org/W2015617493","https://openalex.org/W2041168381","https://openalex.org/W2056097598"],"related_works":["https://openalex.org/W2039079195","https://openalex.org/W2082899104","https://openalex.org/W2051263630","https://openalex.org/W2041912485","https://openalex.org/W2014579843","https://openalex.org/W1965275758","https://openalex.org/W1536862220","https://openalex.org/W2102318520","https://openalex.org/W2089070314","https://openalex.org/W2041088848"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}