{"id":"https://openalex.org/W2005275848","doi":"https://doi.org/10.1002/pen.760322012","title":"Acid formation from various sulfonates in a chemical amplification positive resist","display_name":"Acid formation from various sulfonates in a chemical amplification positive resist","publication_year":1992,"publication_date":"1992-10-01","ids":{"openalex":"https://openalex.org/W2005275848","doi":"https://doi.org/10.1002/pen.760322012","mag":"2005275848"},"language":"en","primary_location":{"id":"doi:10.1002/pen.760322012","doi":"https://doi.org/10.1002/pen.760322012","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pen.760322012","pdf_url":null,"source":{"id":"https://openalex.org/S114499311","display_name":"Polymer Engineering and Science","issn_l":"0032-3888","issn":["0032-3888","0096-8129","1548-2634"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Polymer Engineering & Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102085804","display_name":"Takumi Ueno","orcid":"https://orcid.org/0009-0006-8597-7196","observed_orcids":["https://orcid.org/0009-0006-8597-7196"]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takumi Ueno","raw_affiliation_strings":["Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109984925","display_name":"Leo Schlegel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Leo Schlegel","raw_affiliation_strings":["Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111879006","display_name":"Nobuaki Hayashi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Nobuaki Hayashi","raw_affiliation_strings":["Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081810760","display_name":"Hiroshi Shiraishi","orcid":"https://orcid.org/0000-0002-7674-5135","observed_orcids":["https://orcid.org/0000-0002-7674-5135"]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Shiraishi","raw_affiliation_strings":["Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5004628068","display_name":"Takao Iwayanagi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takao Iwayanagi","raw_affiliation_strings":["Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo, 185, Japan","institution_ids":["https://openalex.org/I65143321"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I65143321"],"apc_list":{"value":4270,"currency":"USD","value_usd":4270},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":"32","issue":"20","first_page":"1511","last_page":"1515"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9833999872207642,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9833999872207642,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.01209999993443489,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11708","display_name":"Photochromic and Fluorescence Chemistry","score":0.0007999999797903001,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/acid-production","display_name":"acid production","score":0.746999979019165},{"id":"https://openalex.org/keywords/chemical-amplification","display_name":"chemical amplification","score":0.8019999861717224},{"id":"https://openalex.org/keywords/positive-photoresist","display_name":"positive photoresist","score":0.8109999895095825},{"id":"https://openalex.org/keywords/sulfonates","display_name":"sulfonates","score":0.8009999990463257},{"id":"https://openalex.org/keywords/quantum-yield","display_name":"quantum yield","score":0.8100000023841858},{"id":"https://openalex.org/keywords/novolac-resin","display_name":"novolac resin","score":0.9919999837875366},{"id":"https://openalex.org/keywords/resist-sensitivity","display_name":"resist sensitivity","score":0.722000002861023},{"id":"https://openalex.org/keywords/molecular-size-effects","display_name":"molecular size effects","score":0.4860000014305115},{"id":"https://openalex.org/keywords/phenol-derivatives","display_name":"phenol derivatives","score":0.6880000233650208}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9086270928382874},{"id":"https://openalex.org/C2776792860","wikidata":"https://www.wikidata.org/wiki/Q414168","display_name":"Methanesulfonic acid","level":2,"score":0.8269023895263672},{"id":"https://openalex.org/C2780263894","wikidata":"https://www.wikidata.org/wiki/Q335268","display_name":"Alkyl","level":2,"score":0.6328498125076294},{"id":"https://openalex.org/C2777702071","wikidata":"https://www.wikidata.org/wiki/Q130336","display_name":"Phenol","level":2,"score":0.6068461537361145},{"id":"https://openalex.org/C2778894819","wikidata":"https://www.wikidata.org/wiki/Q922718","display_name":"Sulfonate","level":3,"score":0.5920706391334534},{"id":"https://openalex.org/C134121241","wikidata":"https://www.wikidata.org/wiki/Q899301","display_name":"Yield (engineering)","level":2,"score":0.5854206085205078},{"id":"https://openalex.org/C2778844314","wikidata":"https://www.wikidata.org/wiki/Q191700","display_name":"Benzoic acid","level":2,"score":0.5216003656387329},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.513780415058136},{"id":"https://openalex.org/C188027245","wikidata":"https://www.wikidata.org/wiki/Q750446","display_name":"Polymer chemistry","level":1,"score":0.35995298624038696},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.34414419531822205},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3189009428024292},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1714945137500763},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.062464386224746704},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C537181965","wikidata":"https://www.wikidata.org/wiki/Q658","display_name":"Sodium","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/pen.760322012","doi":"https://doi.org/10.1002/pen.760322012","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pen.760322012","pdf_url":null,"source":{"id":"https://openalex.org/S114499311","display_name":"Polymer Engineering and Science","issn_l":"0032-3888","issn":["0032-3888","0096-8129","1548-2634"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Polymer Engineering & Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W1983995332","https://openalex.org/W1996650218","https://openalex.org/W2016529169","https://openalex.org/W2025206766","https://openalex.org/W2044608485","https://openalex.org/W2062401426","https://openalex.org/W2070429026","https://openalex.org/W2081924092","https://openalex.org/W2086238983","https://openalex.org/W2123933109","https://openalex.org/W2172253633","https://openalex.org/W2503564816","https://openalex.org/W2952519690","https://openalex.org/W2953198311","https://openalex.org/W4234556613"],"related_works":["https://openalex.org/W2029039819","https://openalex.org/W2492066228","https://openalex.org/W2477374640","https://openalex.org/W2021257311","https://openalex.org/W2058225543","https://openalex.org/W2121266181","https://openalex.org/W1978041237","https://openalex.org/W2025230138","https://openalex.org/W2062401426","https://openalex.org/W2031303251"],"abstract_inverted_index":{"Abstract":[0],"The":[1,77,99],"quantum":[2,33],"yield":[3,34],"for":[4],"acid":[5,11,56,75,111],"generation":[6],"from":[7],"alkyl":[8],"and":[9,25],"arylsulfonic":[10],"esters":[12,57],"of":[13,21,40,51,58,68,74,80,89,102,110],"pyrogallol":[14],"was":[15,29],"measured":[16],"in":[17,49],"resist":[18,53],"films":[19],"composed":[20],"a":[22,94,107],"sulfonate,":[23],"tBOC\u2010BA,":[24],"novolak":[26],"resin.":[27],"It":[28],"found":[30],"that":[31,86],"the":[32,41,47,52,66,72,87,103],"increases":[35],"with":[36],"decreasing":[37],"molecular":[38],"size":[39],"sulfonyl":[42],"group,":[43],"which":[44],"can":[45],"explain":[46],"differences":[48],"sensitivity":[50,78],"systems.":[54],"Methanesulfonic":[55],"various":[59],"phenol":[60],"derivatives":[61],"were":[62],"synthesized":[63],"to":[64,93],"see":[65],"effect":[67],"backbone":[69],"structure":[70],"on":[71],"efficiency":[73,109],"generation.":[76,112],"measurement":[79],"resists":[81],"containing":[82],"these":[83],"sulfonates":[84],"indicates":[85],"number":[88,101],"sulfonyloxy":[90,104],"groups":[91,105],"bonded":[92],"benzene":[95],"ring":[96],"is":[97],"important.":[98],"higher":[100,108],"gives":[106]},"counts_by_year":[{"year":2020,"cited_by_count":2},{"year":2016,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}