{"id":"https://openalex.org/W2005161726","doi":"https://doi.org/10.1116/1.3570818","title":"Effects of vacuum ultraviolet radiation on deposited and ultraviolet-cured low-k porous organosilicate glass","display_name":"Effects of vacuum ultraviolet radiation on deposited and ultraviolet-cured low-k porous organosilicate glass","publication_year":2011,"publication_date":"2011-03-28","ids":{"openalex":"https://openalex.org/W2005161726","doi":"https://doi.org/10.1116/1.3570818","mag":"2005161726"},"language":"en","primary_location":{"id":"doi:10.1116/1.3570818","doi":"https://doi.org/10.1116/1.3570818","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3570818","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5026564064","display_name":"Harsh Sinha","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"H. Sinha","raw_affiliation_strings":["University of Wisconsin\u2013Madison Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, , Madison, Wisconsin 53706"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Wisconsin\u2013Madison Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, , Madison, Wisconsin 53706","institution_ids":["https://openalex.org/I135310074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045344070","display_name":"G. A. Antonelli","orcid":"https://orcid.org/0000-0002-8536-2750","observed_orcids":["https://orcid.org/0000-0002-8536-2750"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"G. A. Antonelli","raw_affiliation_strings":["Novellus Systems , Albany, New York 12203"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Novellus Systems , Albany, New York 12203","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"G. Jiang","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"G. Jiang","raw_affiliation_strings":["Novellus Systems , Tualatin, Oregon 97062"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Novellus Systems , Tualatin, Oregon 97062","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085831106","display_name":"Yoshio Nishi","orcid":"https://orcid.org/0000-0002-2651-0952","observed_orcids":["https://orcid.org/0000-0002-2651-0952"]},"institutions":[{"id":"https://openalex.org/I97018004","display_name":"Stanford University","ror":"https://ror.org/00f54p054","country_code":"US","type":"education","lineage":["https://openalex.org/I97018004"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Y. Nishi","raw_affiliation_strings":["Stanford University , Stanford, California 94305"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Stanford University , Stanford, California 94305","institution_ids":["https://openalex.org/I97018004"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5028052021","display_name":"J. L. Shohet","orcid":"https://orcid.org/0000-0003-0983-4629","observed_orcids":["https://orcid.org/0000-0003-0983-4629"]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. L. Shohet","raw_affiliation_strings":["University of Wisconsin\u2013Madison Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, , Madison, Wisconsin 53706"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Wisconsin\u2013Madison Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, , Madison, Wisconsin 53706","institution_ids":["https://openalex.org/I135310074"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.1218,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":{"value":0.75562884,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"29","issue":"3","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.33399999141693115,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.33399999141693115,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.1648000031709671,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10544","display_name":"Glass properties and applications","score":0.10859999805688858,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/vacuum-ultraviolet","display_name":"vacuum ultraviolet","score":0.9190000295639038},{"id":"https://openalex.org/keywords/sioch","display_name":"SiOCH","score":0.9010000228881836},{"id":"https://openalex.org/keywords/low-k-dielectrics","display_name":"low-k dielectrics","score":0.8500000238418579},{"id":"https://openalex.org/keywords/uv-curing","display_name":"UV curing","score":0.9700000286102295},{"id":"https://openalex.org/keywords/trapped-charge","display_name":"trapped charge","score":0.800000011920929},{"id":"https://openalex.org/keywords/defect-states","display_name":"defect states","score":0.9259999990463257},{"id":"https://openalex.org/keywords/photoconductivity","display_name":"photoconductivity","score":0.9169999957084656},{"id":"https://openalex.org/keywords/intrinsic-conductivity","display_name":"intrinsic conductivity","score":0.902999997138977},{"id":"https://openalex.org/keywords/charge-trapping","display_name":"charge trapping","score":0.46299999952316284}],"concepts":[{"id":"https://openalex.org/C2776798109","wikidata":"https://www.wikidata.org/wiki/Q11391","display_name":"Ultraviolet","level":2,"score":0.763850212097168},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7054906487464905},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.6510873436927795},{"id":"https://openalex.org/C132976073","wikidata":"https://www.wikidata.org/wiki/Q2991861","display_name":"Curing (chemistry)","level":2,"score":0.6138373613357544},{"id":"https://openalex.org/C32891209","wikidata":"https://www.wikidata.org/wiki/Q483666","display_name":"Spectroscopy","level":2,"score":0.5649343132972717},{"id":"https://openalex.org/C6648577","wikidata":"https://www.wikidata.org/wiki/Q622669","display_name":"Porosity","level":2,"score":0.5489674806594849},{"id":"https://openalex.org/C2777682490","wikidata":"https://www.wikidata.org/wiki/Q18355911","display_name":"UV curing","level":3,"score":0.5429316759109497},{"id":"https://openalex.org/C153385146","wikidata":"https://www.wikidata.org/wiki/Q18335","display_name":"Radiation","level":2,"score":0.47400081157684326},{"id":"https://openalex.org/C2987742019","wikidata":"https://www.wikidata.org/wiki/Q11391","display_name":"Ultraviolet radiation","level":2,"score":0.47143688797950745},{"id":"https://openalex.org/C66075629","wikidata":"https://www.wikidata.org/wiki/Q898426","display_name":"Ultraviolet visible spectroscopy","level":2,"score":0.46443209052085876},{"id":"https://openalex.org/C201999631","wikidata":"https://www.wikidata.org/wiki/Q2601129","display_name":"Photoconductivity","level":2,"score":0.46183228492736816},{"id":"https://openalex.org/C2992916681","wikidata":"https://www.wikidata.org/wiki/Q11391","display_name":"Vacuum ultraviolet","level":2,"score":0.46163225173950195},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3634774386882782},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3418152630329132},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.29065319895744324},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.22793859243392944},{"id":"https://openalex.org/C177322064","wikidata":"https://www.wikidata.org/wiki/Q750955","display_name":"Radiochemistry","level":1,"score":0.1912131905555725},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.1572856903076172},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.06849417090415955},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.3570818","doi":"https://doi.org/10.1116/1.3570818","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3570818","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W111040871","https://openalex.org/W1574736035","https://openalex.org/W1968137519","https://openalex.org/W1976611780","https://openalex.org/W1981163042","https://openalex.org/W1985968040","https://openalex.org/W1993031801","https://openalex.org/W1994521839","https://openalex.org/W2001303528","https://openalex.org/W2021234451","https://openalex.org/W2021298518","https://openalex.org/W2027712824","https://openalex.org/W2045363985","https://openalex.org/W2054176533","https://openalex.org/W2054370363","https://openalex.org/W2079886269","https://openalex.org/W2080101814","https://openalex.org/W2088349807","https://openalex.org/W2093913249","https://openalex.org/W2098039371","https://openalex.org/W2143392186","https://openalex.org/W2147215590","https://openalex.org/W2163500195"],"related_works":["https://openalex.org/W2125824014","https://openalex.org/W2045483728","https://openalex.org/W2079886269","https://openalex.org/W2147215590","https://openalex.org/W2519925115","https://openalex.org/W2026266171","https://openalex.org/W2431986009","https://openalex.org/W2019922369","https://openalex.org/W2912895072","https://openalex.org/W2093187561"],"abstract_inverted_index":{"The":[0,19,78],"authors":[1,20,65,79],"compare":[2],"the":[3,61,64,71],"effects":[4,48],"of":[5,49,54,60,73],"vacuum":[6],"ultraviolet":[7],"(VUV)":[8],"irradiation":[9],"on":[10],"pristine":[11,37],"and":[12,57,88,94],"UV-cured":[13,32,83],"low-k":[14],"porous":[15],"organosilicate":[16],"glass":[17],"(SiCOH).":[18],"find":[21,66,81],"that":[22,67,82],"during":[23],"VUV":[24,39,55,92],"irradiation,":[25],"more":[26],"trapped":[27],"charges":[28],"are":[29],"generated":[30],"in":[31,76],"SiCOH":[33,84],"as":[34,43],"compared":[35],"to":[36,46],"SiCOH.":[38,77],"is":[40],"also":[41,80],"used":[42],"a":[44],"tool":[45],"investigate":[47],"UV":[50,68],"curing.":[51],"From":[52],"comparison":[53],"spectroscopy":[56,93],"photoinjection":[58],"current":[59],"two":[62],"samples,":[63],"curing":[69],"reduces":[70],"number":[72],"defect":[74],"states":[75],"has":[85],"higher":[86],"photoconductivity":[87],"intrinsic":[89],"conductivity":[90],"from":[91],"trapped-charge":[95],"decay":[96],"rate,":[97],"respectively.":[98]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":4}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}