{"id":"https://openalex.org/W2005138205","doi":"https://doi.org/10.1117/12.711997","title":"Development of optical component for EUV phase-shift microscopes","display_name":"Development of optical component for EUV phase-shift microscopes","publication_year":2007,"publication_date":"2007-03-16","ids":{"openalex":"https://openalex.org/W2005138205","doi":"https://doi.org/10.1117/12.711997","mag":"2005138205"},"language":"en","primary_location":{"id":"doi:10.1117/12.711997","doi":"https://doi.org/10.1117/12.711997","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.711997","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113476084","display_name":"Yoshio Mizuta","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshio Mizuta","raw_affiliation_strings":["CREST-JST (Japan)","Univ. of Hyogo (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054656591","display_name":"Masafumi Osugi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masafumi Osugi","raw_affiliation_strings":["CREST-JST (Japan)","Univ. of Hyogo (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047109752","display_name":"J. Kishimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Jyunki Kishimoto","raw_affiliation_strings":["CREST-JST (Japan)","Univ. of Hyogo (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048859087","display_name":"Noriyuki Sakaya","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I68926175","display_name":"Hoya (Japan)","ror":"https://ror.org/049vpfq31","country_code":"JP","type":"company","lineage":["https://openalex.org/I68926175"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Noriyuki Sakaya","raw_affiliation_strings":["CREST-JST (Japan)","HOYA Corp. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"HOYA Corp. (Japan)","institution_ids":["https://openalex.org/I68926175"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111573723","display_name":"Kazuhiro Hamamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I68926175","display_name":"Hoya (Japan)","ror":"https://ror.org/049vpfq31","country_code":"JP","type":"company","lineage":["https://openalex.org/I68926175"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuhiro Hamamoto","raw_affiliation_strings":["CREST-JST (Japan)","HOYA Corp. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"HOYA Corp. (Japan)","institution_ids":["https://openalex.org/I68926175"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102018588","display_name":"Takeo Watanabe","orcid":"https://orcid.org/0000-0003-1202-0431","observed_orcids":["https://orcid.org/0000-0003-1202-0431"]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeo Watanabe","raw_affiliation_strings":["CREST-JST (Japan)","Univ. of Hyogo (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111582318","display_name":"Hiroo Kinoshita","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroo Kinoshita","raw_affiliation_strings":["CREST-JST (Japan)","Univ. of Hyogo (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CREST-JST (Japan)","institution_ids":["https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.0042,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.68946027,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":95},"biblio":{"volume":"6517","issue":null,"first_page":"651733","last_page":"651733"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6348000168800354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6348000168800354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.21969999372959137,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.07840000092983246,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/multilayer-films","display_name":"multilayer films","score":0.7710000276565552},{"id":"https://openalex.org/keywords/intrinsic-stress","display_name":"intrinsic stress","score":0.6650000214576721},{"id":"https://openalex.org/keywords/argon-pressure","display_name":"argon pressure","score":0.6940000057220459},{"id":"https://openalex.org/keywords/rf-sputtering-power","display_name":"RF sputtering power","score":0.9480000138282776},{"id":"https://openalex.org/keywords/molybdenum-thin-films","display_name":"molybdenum thin films","score":0.878000020980835},{"id":"https://openalex.org/keywords/silicon-films","display_name":"silicon films","score":0.9980000257492065},{"id":"https://openalex.org/keywords/stress-management","display_name":"stress management","score":0.6060000061988831}],"concepts":[{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.8270997405052185},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8190509080886841},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5528540015220642},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5329711437225342},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5295119285583496},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.5256848335266113},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4886927902698517},{"id":"https://openalex.org/C112950240","wikidata":"https://www.wikidata.org/wiki/Q76005","display_name":"Ultimate tensile strength","level":2,"score":0.4831406772136688},{"id":"https://openalex.org/C549387045","wikidata":"https://www.wikidata.org/wiki/Q1053","display_name":"Molybdenum","level":2,"score":0.4624170958995819},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4533970355987549},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.4468459188938141},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.43727290630340576},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.413252592086792},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1817871630191803},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.14242130517959595},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0894642174243927},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.711997","doi":"https://doi.org/10.1117/12.711997","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.711997","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2058848599","https://openalex.org/W2076895950","https://openalex.org/W2752787815","https://openalex.org/W2070000466","https://openalex.org/W2790653047","https://openalex.org/W1491919058","https://openalex.org/W1969352504","https://openalex.org/W4252686827","https://openalex.org/W2422087119","https://openalex.org/W2044182052"],"abstract_inverted_index":{"This":[0,17],"paper":[1],"is":[2,31,35],"described":[3],"about":[4],"fabrication":[5],"and":[6,50,66,82,89,112,134],"evaluation":[7],"of":[8,29,40,124,136,142],"the":[9,38,41,55,61,76,80,109,140],"beam":[10,18],"splitter":[11,19],"used":[12],"in":[13],"an":[14,51],"EUV":[15,143],"region.":[16,144],"has":[20],"to":[21,98],"be":[22],"as":[23],"a":[24,45,100,119],"free":[25],"standing,":[26],"stress":[27,43,88,106],"control":[28],"multilayer":[30,101,122],"main":[32],"subject.":[33],"It":[34,130],"investigated":[36],"that":[37],"dependence":[39],"intrinsic":[42],"between":[44],"RF":[46,114],"(DC)":[47],"sputtering":[48],"power":[49,115],"argon":[52,63,78,110],"pressure":[53,111],"during":[54,116],"thin":[56],"film":[57,123],"deposition":[58],"processes.":[59],"At":[60],"low":[62,86,90,104],"pressure,":[64,79],"molybdenum":[65,81],"silicon":[67,83],"films":[68,84,102],"showed":[69,85],"both":[70],"high":[71,77,132],"compressive":[72,91],"stress.":[73],"However,":[74],"at":[75,139],"tensile":[87,105],"stress,":[92],"respectively.":[93],"Therefore,":[94],"it":[95],"was":[96,128],"possible":[97],"fabricate":[99],"with":[103],"by":[107],"optimizing":[108],"applied":[113],"deposition.":[117],"Conclusively,":[118],"free-standing":[120],"semitrasparent":[121],"8x22":[125],"mm":[126],"area":[127],"fabricated.":[129],"shows":[131],"reflectance":[133],"transmission":[135],"near":[137],"25%":[138],"wavelength":[141]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2021,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}