{"id":"https://openalex.org/W2004656877","doi":"https://doi.org/10.1016/j.mee.2008.09.046","title":"Impact of particles in ultra pure water on random yield loss in IC production","display_name":"Impact of particles in ultra pure water on random yield loss in IC production","publication_year":2008,"publication_date":"2008-10-19","ids":{"openalex":"https://openalex.org/W2004656877","doi":"https://doi.org/10.1016/j.mee.2008.09.046","mag":"2004656877"},"language":"en","primary_location":{"id":"doi:10.1016/j.mee.2008.09.046","doi":"https://doi.org/10.1016/j.mee.2008.09.046","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2008.09.046","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Faisal Wali","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I94624287","display_name":"University of Twente","ror":"https://ror.org/006hf6230","country_code":"NL","type":"education","lineage":["https://openalex.org/I94624287"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Faisal Wali","raw_affiliation_strings":["University of Twente, Hogekamp 32-46, 7500 AE Enschede, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Twente, Hogekamp 32-46, 7500 AE Enschede, The Netherlands","institution_ids":["https://openalex.org/I94624287"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5087199830","display_name":"D. Martin Knotter","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I109147379","display_name":"NXP (Netherlands)","ror":"https://ror.org/059be4e97","country_code":"NL","type":"company","lineage":["https://openalex.org/I109147379"]}],"countries":["NL"],"is_corresponding":true,"raw_author_name":"D. Martin Knotter","raw_affiliation_strings":["NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands","institution_ids":["https://openalex.org/I109147379"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011617640","display_name":"Auke Mud","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I109147379","display_name":"NXP (Netherlands)","ror":"https://ror.org/059be4e97","country_code":"NL","type":"company","lineage":["https://openalex.org/I109147379"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Auke Mud","raw_affiliation_strings":["NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands","institution_ids":["https://openalex.org/I109147379"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5057061608","display_name":"Fred G. Kuper","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I109147379","display_name":"NXP (Netherlands)","ror":"https://ror.org/059be4e97","country_code":"NL","type":"company","lineage":["https://openalex.org/I109147379"]},{"id":"https://openalex.org/I94624287","display_name":"University of Twente","ror":"https://ror.org/006hf6230","country_code":"NL","type":"education","lineage":["https://openalex.org/I94624287"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Fred G. Kuper","raw_affiliation_strings":["NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands","University of Twente, Hogekamp 32-46, 7500 AE Enschede, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NXP Semiconductors, Gerstweg 2 (FB 0.049D), 6534 AE Nijmegen, The Netherlands","institution_ids":["https://openalex.org/I109147379"]},{"raw_affiliation_string":"University of Twente, Hogekamp 32-46, 7500 AE Enschede, The Netherlands","institution_ids":["https://openalex.org/I94624287"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5087199830"],"corresponding_institution_ids":["https://openalex.org/I109147379"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":3.9925,"has_fulltext":true,"cited_by_count":12,"citation_normalized_percentile":{"value":0.91977587,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"86","issue":"2","first_page":"140","last_page":"144"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.3700999915599823,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.3700999915599823,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.2768999934196472,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.04910000041127205,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/particulate-contamination","display_name":"particulate contamination","score":0.9350000023841858},{"id":"https://openalex.org/keywords/ultrapure-water","display_name":"ultrapure water","score":0.9990000128746033},{"id":"https://openalex.org/keywords/integrated-circuit-yield","display_name":"integrated circuit yield","score":0.7129999995231628},{"id":"https://openalex.org/keywords/random-defects","display_name":"random defects","score":0.699999988079071},{"id":"https://openalex.org/keywords/defect-density","display_name":"defect density","score":0.6190000176429749},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"wafer fabrication","score":0.781000018119812}],"concepts":[{"id":"https://openalex.org/C112570922","wikidata":"https://www.wikidata.org/wiki/Q60528603","display_name":"Contamination","level":2,"score":0.7309494018554688},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.7048002481460571},{"id":"https://openalex.org/C2778517922","wikidata":"https://www.wikidata.org/wiki/Q7140482","display_name":"Particle (ecology)","level":2,"score":0.6782901287078857},{"id":"https://openalex.org/C134121241","wikidata":"https://www.wikidata.org/wiki/Q899301","display_name":"Yield (engineering)","level":2,"score":0.6691902875900269},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4948379397392273},{"id":"https://openalex.org/C187530423","wikidata":"https://www.wikidata.org/wiki/Q7140503","display_name":"Particle size","level":2,"score":0.48804986476898193},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.4687530994415283},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.4479866325855255},{"id":"https://openalex.org/C39432304","wikidata":"https://www.wikidata.org/wiki/Q188847","display_name":"Environmental science","level":0,"score":0.38771864771842957},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3836280107498169},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.24320298433303833},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.20321524143218994},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.19108444452285767},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12086072564125061},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/j.mee.2008.09.046","doi":"https://doi.org/10.1016/j.mee.2008.09.046","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2008.09.046","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},{"id":"pmh:oai:ris.utwente.nl:openaire_cris_publications/830ff293-dea7-48a4-aa78-acb5ec64a60c","doi":null,"is_oa":false,"landing_page_url":"https://research.utwente.nl/en/publications/830ff293-dea7-48a4-aa78-acb5ec64a60c","pdf_url":null,"source":{"id":"https://openalex.org/S4406922991","display_name":"University of Twente Research Information","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Wali, F, Knotter, D M, Mud, A & Kuper, F G 2009, 'Impact of particles in ultra pure water on random yield loss in IC production', Microelectronic engineering, vol. 86, no. 2, pp. 140-144. https://doi.org/10.1016/j.mee.2008.09.046","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:ut:oai:ris.utwente.nl:publications/830ff293-dea7-48a4-aa78-acb5ec64a60c","doi":null,"is_oa":false,"landing_page_url":"https://research.utwente.nl/en/publications/830ff293-dea7-48a4-aa78-acb5ec64a60c","pdf_url":null,"source":{"id":"https://openalex.org/S4406922991","display_name":"University of Twente Research Information","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Microelectronic engineering, 86(2):10.1016/j.mee.2008.09.046, 140 - 144. Elsevier","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1998976901","https://openalex.org/W2069948346","https://openalex.org/W2072045723","https://openalex.org/W2116935750","https://openalex.org/W2129290530","https://openalex.org/W2136942854","https://openalex.org/W2953607564"],"related_works":["https://openalex.org/W1496861005","https://openalex.org/W1606131572","https://openalex.org/W2536797781","https://openalex.org/W1993418684","https://openalex.org/W57059249","https://openalex.org/W2529657341","https://openalex.org/W196993887","https://openalex.org/W98600682","https://openalex.org/W1981454986","https://openalex.org/W2255873596"],"abstract_inverted_index":null,"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}