{"id":"https://openalex.org/W2004649456","doi":"https://doi.org/10.1117/12.276002","title":"Performance of a step-and-scan system for DUV lithography","display_name":"Performance of a step-and-scan system for DUV lithography","publication_year":1997,"publication_date":"1997-07-07","ids":{"openalex":"https://openalex.org/W2004649456","doi":"https://doi.org/10.1117/12.276002","mag":"2004649456"},"language":"en","primary_location":{"id":"doi:10.1117/12.276002","doi":"https://doi.org/10.1117/12.276002","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.276002","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5070369697","display_name":"Gerard de Zwart","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Gerard de Zwart","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023571364","display_name":"Martin A. van den Brink","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Martin A. van den Brink","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Richard A. George","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Richard A. George","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056785901","display_name":"Danu Satriasaputra","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Danu Satriasaputra","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015202066","display_name":"Jan Baselmans","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jan Baselmans","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060272451","display_name":"Hans Butler","orcid":"https://orcid.org/0000-0002-2650-4798","observed_orcids":["https://orcid.org/0000-0002-2650-4798"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"H. Butler","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110045272","display_name":"Jan B. van Schoot","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jan B. van Schoot","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5079984636","display_name":"Jos de Klerk","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jos de Klerk","raw_affiliation_strings":["ASM Lithography BV (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM Lithography BV (Netherlands)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":9.0979,"has_fulltext":false,"cited_by_count":24,"citation_normalized_percentile":{"value":0.98196976,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"3051","issue":null,"first_page":"817","last_page":"817"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.006099999882280827,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/step-and-scan-lithography","display_name":"step-and-scan lithography","score":0.9679999947547913},{"id":"https://openalex.org/keywords/deep-ultraviolet-lithography","display_name":"deep ultraviolet lithography","score":0.9760000109672546},{"id":"https://openalex.org/keywords/248-nm-excimer-laser","display_name":"248 nm excimer laser","score":0.9010000228881836},{"id":"https://openalex.org/keywords/field-flatness","display_name":"field flatness","score":0.9800000190734863},{"id":"https://openalex.org/keywords/overlay-accuracy","display_name":"overlay accuracy","score":0.9700000286102295},{"id":"https://openalex.org/keywords/dose-accuracy","display_name":"dose accuracy","score":0.9549999833106995}],"concepts":[{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6778639554977417},{"id":"https://openalex.org/C187504802","wikidata":"https://www.wikidata.org/wiki/Q1751548","display_name":"Stepper","level":2,"score":0.6606991291046143},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6096566915512085},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.607828676700592},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5685021281242371},{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.5352896451950073},{"id":"https://openalex.org/C159108749","wikidata":"https://www.wikidata.org/wiki/Q898896","display_name":"Numerical aperture","level":3,"score":0.4777349829673767},{"id":"https://openalex.org/C126780896","wikidata":"https://www.wikidata.org/wiki/Q899871","display_name":"Distortion (music)","level":4,"score":0.46101370453834534},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.452680766582489},{"id":"https://openalex.org/C183072630","wikidata":"https://www.wikidata.org/wiki/Q215932","display_name":"Depth of field","level":2,"score":0.4415154457092285},{"id":"https://openalex.org/C2781181686","wikidata":"https://www.wikidata.org/wiki/Q4226068","display_name":"Coherence (philosophical gambling strategy)","level":2,"score":0.41147226095199585},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.37267065048217773},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1334417462348938},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.0},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.0},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2776257435","wikidata":"https://www.wikidata.org/wiki/Q1576430","display_name":"Bandwidth (computing)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.276002","doi":"https://doi.org/10.1117/12.276002","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.276002","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2142543453","https://openalex.org/W2057263253","https://openalex.org/W2080394468","https://openalex.org/W2370974144","https://openalex.org/W2082920713","https://openalex.org/W2081426041","https://openalex.org/W2106673805","https://openalex.org/W1990579567","https://openalex.org/W1985758447","https://openalex.org/W1993335762"],"abstract_inverted_index":{"To":[0],"meet":[1],"the":[2,13,68,109],"high":[3,20,116,135],"productivity":[4],"standards,":[5],"set":[6],"by":[7],"current":[8],"top-":[9],"end":[10],"stepper":[11],"systems,":[12],"use":[14,133],"of":[15,36,53,108],"excimer":[16],"laser":[17],"sources":[18],"and":[19,73,103,112],"scanning":[21,117],"speeds":[22,118],"are":[23,95],"essential.":[24],"This":[25],"paper":[26],"reports":[27],"on":[28,76,97],"a":[29,44,49,77,129],"new":[30],"Step":[31,121],"&":[32,122],"Scan":[33,123],"system":[34,58],"capable":[35],"exposing":[37],"26":[38],"X":[39],"33":[40],"mm":[41],"fields,":[42],"using":[43],"248":[45],"nm":[46],"DUV-lens":[47],"with":[48,61,86],"variable":[50],"Numerical":[51],"Aperture":[52],"0.40":[54],"to":[55,70,89,128],"0.63.":[56],"The":[57,80],"is":[59,84,125],"equipped":[60,85],"an":[62],"advanced":[63],"AERIALTM":[64],"illuminator":[65],"which":[66],"allows":[67],"user":[69],"choose":[71],"coherence":[72],"illumination":[74],"modes":[75],"job-by-job":[78],"basis.":[79],"double":[81],"telecentric":[82],"lens":[83,87],"manipulators":[88],"allow":[90],"on-site":[91],"aberration":[92],"control.":[93],"Results":[94],"presented":[96],"dynamic":[98,104],"image":[99],"distortion,":[100],"field":[101],"flatness":[102],"imaging":[105],"performance.":[106],"Performance":[107],"overlay":[110],"accuracy":[111,114],"dose":[113],"at":[115],"proves":[119],"that":[120],"technology":[124],"now":[126],"developed":[127],"level":[130],"suitable":[131],"for":[132],"in":[134],"volume":[136],"sub":[137],"0.25":[138],"micrometers":[139],"manufacturing.":[140]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2013,"cited_by_count":3}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}