{"id":"https://openalex.org/W2003751422","doi":"https://doi.org/10.1016/0925-9635(92)90018-j","title":"Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique","display_name":"Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique","publication_year":1992,"publication_date":"1992-03-01","ids":{"openalex":"https://openalex.org/W2003751422","doi":"https://doi.org/10.1016/0925-9635(92)90018-j","mag":"2003751422"},"language":"en","primary_location":{"id":"doi:10.1016/0925-9635(92)90018-j","doi":"https://doi.org/10.1016/0925-9635(92)90018-j","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0925-9635(92)90018-j","pdf_url":null,"source":{"id":"https://openalex.org/S124577123","display_name":"Diamond and Related Materials","issn_l":"0925-9635","issn":["0925-9635","1879-0062"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Diamond and Related Materials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113499801","display_name":"R. Beckmann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106157433","display_name":"University of Kassel","ror":"https://ror.org/04zc7p361","country_code":"DE","type":"education","lineage":["https://openalex.org/I106157433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"R. Beckmann","raw_affiliation_strings":["Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG","institution_ids":["https://openalex.org/I106157433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010672968","display_name":"Wilhelm A. M. Kulisch","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106157433","display_name":"University of Kassel","ror":"https://ror.org/04zc7p361","country_code":"DE","type":"education","lineage":["https://openalex.org/I106157433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"W. Kulisch","raw_affiliation_strings":["Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG","institution_ids":["https://openalex.org/I106157433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016657255","display_name":"H.J. Frenck","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106157433","display_name":"University of Kassel","ror":"https://ror.org/04zc7p361","country_code":"DE","type":"education","lineage":["https://openalex.org/I106157433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H.J. Frenck","raw_affiliation_strings":["Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG","institution_ids":["https://openalex.org/I106157433"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5088036604","display_name":"Rainer Kassing","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106157433","display_name":"University of Kassel","ror":"https://ror.org/04zc7p361","country_code":"DE","type":"education","lineage":["https://openalex.org/I106157433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"R. Kassing","raw_affiliation_strings":["Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Technical Physics, University of Kassel, Heinrich-Plett-Str. 40, D-3500 Kassel FRG","institution_ids":["https://openalex.org/I106157433"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I106157433"],"apc_list":{"value":2690,"currency":"USD","value_usd":2690},"apc_paid":null,"fwci":1.4065,"has_fulltext":false,"cited_by_count":24,"citation_normalized_percentile":{"value":0.78496426,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"1","issue":"2-4","first_page":"164","last_page":"167"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/diamond-films","display_name":"diamond films","score":0.8339999914169312},{"id":"https://openalex.org/keywords/hot-filament-chemical-vapor-deposition","display_name":"hot filament chemical vapor deposition","score":0.8370000123977661},{"id":"https://openalex.org/keywords/microwave-chemical-vapor-deposition","display_name":"microwave chemical vapor deposition","score":0.9470000267028809},{"id":"https://openalex.org/keywords/deposition-kinetics","display_name":"deposition kinetics","score":0.9760000109672546},{"id":"https://openalex.org/keywords/film-morphology","display_name":"film morphology","score":0.9179999828338623},{"id":"https://openalex.org/keywords/c-o-ratio","display_name":"C/O ratio","score":0.7440000176429749},{"id":"https://openalex.org/keywords/methanol","display_name":"methanol","score":0.9679999947547913},{"id":"https://openalex.org/keywords/acetone","display_name":"acetone","score":0.9819999933242798},{"id":"https://openalex.org/keywords/dmp","display_name":"DMP","score":0.6420000195503235},{"id":"https://openalex.org/keywords/low-substrate-temperature-deposition","display_name":"low substrate temperature deposition","score":0.7070000171661377},{"id":"https://openalex.org/keywords/hydrogen-free-deposition","display_name":"hydrogen-free deposition","score":0.6859999895095825},{"id":"https://openalex.org/keywords/high-rate-deposition","display_name":"high deposition rate","score":0.6430000066757202}],"concepts":[{"id":"https://openalex.org/C148898269","wikidata":"https://www.wikidata.org/wiki/Q1108792","display_name":"Kinetics","level":2,"score":0.7129136323928833},{"id":"https://openalex.org/C2776921476","wikidata":"https://www.wikidata.org/wiki/Q5283","display_name":"Diamond","level":2,"score":0.7112587690353394},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.6543973088264465},{"id":"https://openalex.org/C499950583","wikidata":"https://www.wikidata.org/wiki/Q183252","display_name":"Morphology (biology)","level":2,"score":0.6532392501831055},{"id":"https://openalex.org/C3020013744","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Gas phase","level":2,"score":0.6192097663879395},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6117763519287109},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.5532525777816772},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5432319641113281},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4451330900192261},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4059249460697174},{"id":"https://openalex.org/C199289684","wikidata":"https://www.wikidata.org/wiki/Q83353","display_name":"Mineralogy","level":1,"score":0.36214160919189453},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3132854104042053},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.27586525678634644},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.1470186710357666},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.14238086342811584},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.10248628258705139},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10192269086837769},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.05437701940536499},{"id":"https://openalex.org/C114793014","wikidata":"https://www.wikidata.org/wiki/Q52109","display_name":"Geomorphology","level":1,"score":0.04944050312042236},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0925-9635(92)90018-j","doi":"https://doi.org/10.1016/0925-9635(92)90018-j","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0925-9635(92)90018-j","pdf_url":null,"source":{"id":"https://openalex.org/S124577123","display_name":"Diamond and Related Materials","issn_l":"0925-9635","issn":["0925-9635","1879-0062"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Diamond and Related Materials","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W92215021","https://openalex.org/W1967845619","https://openalex.org/W1976972281","https://openalex.org/W1997866198","https://openalex.org/W2021715883","https://openalex.org/W2083261175","https://openalex.org/W2132597039"],"related_works":["https://openalex.org/W305057834","https://openalex.org/W2013051624","https://openalex.org/W2073746715","https://openalex.org/W2018337868","https://openalex.org/W1975238028","https://openalex.org/W2374056065","https://openalex.org/W2529592930","https://openalex.org/W1538162830","https://openalex.org/W837697926","https://openalex.org/W1988250210"],"abstract_inverted_index":null,"counts_by_year":[{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2026-10-02T10:15:12.560889","created_date":"2016-06-24T00:00:00"}