{"id":"https://openalex.org/W2003643102","doi":"https://doi.org/10.1002/pssc.201200074","title":"Defect generation by argon implantation: microscopy characterization and electrical properties","display_name":"Defect generation by argon implantation: microscopy characterization and electrical properties","publication_year":2012,"publication_date":"2012-08-27","ids":{"openalex":"https://openalex.org/W2003643102","doi":"https://doi.org/10.1002/pssc.201200074","mag":"2003643102"},"language":"en","primary_location":{"id":"doi:10.1002/pssc.201200074","doi":"https://doi.org/10.1002/pssc.201200074","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pssc.201200074","pdf_url":null,"source":{"id":"https://openalex.org/S4210174949","display_name":"Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics","issn_l":"1610-1634","issn":["1610-1634","1610-1642","1862-6351"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-40"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"physica status solidi c","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5060873655","display_name":"Isabella Mica","orcid":"https://orcid.org/0000-0003-3695-1134","observed_orcids":["https://orcid.org/0000-0003-3695-1134"]},"institutions":[{"id":"https://openalex.org/I4210130962","display_name":"Micron (Italy)","ror":"https://ror.org/039m3s961","country_code":"IT","type":"company","lineage":["https://openalex.org/I11912373","https://openalex.org/I4210130962"]}],"countries":["IT"],"is_corresponding":true,"raw_author_name":"Isabella Mica","raw_affiliation_strings":["Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","institution_ids":["https://openalex.org/I4210130962"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029398783","display_name":"Maria Luisa Polignano","orcid":"https://orcid.org/0000-0001-5441-1022","observed_orcids":["https://orcid.org/0000-0001-5441-1022"]},"institutions":[{"id":"https://openalex.org/I4210130962","display_name":"Micron (Italy)","ror":"https://ror.org/039m3s961","country_code":"IT","type":"company","lineage":["https://openalex.org/I11912373","https://openalex.org/I4210130962"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Maria Luisa Polignano","raw_affiliation_strings":["Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","Phone: +39 039 637 5593,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","institution_ids":["https://openalex.org/I4210130962"]},{"raw_affiliation_string":"Phone: +39 039 637 5593,","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005604987","display_name":"Davide Codegoni","orcid":"https://orcid.org/0009-0005-6995-9310","observed_orcids":["https://orcid.org/0009-0005-6995-9310"]},"institutions":[{"id":"https://openalex.org/I4210130962","display_name":"Micron (Italy)","ror":"https://ror.org/039m3s961","country_code":"IT","type":"company","lineage":["https://openalex.org/I11912373","https://openalex.org/I4210130962"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Davide Codegoni","raw_affiliation_strings":["Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","institution_ids":["https://openalex.org/I4210130962"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079766506","display_name":"Aurelio Giancarlo Mauri","orcid":"https://orcid.org/0000-0002-7590-2872","observed_orcids":["https://orcid.org/0000-0002-7590-2872"]},"institutions":[{"id":"https://openalex.org/I4210130962","display_name":"Micron (Italy)","ror":"https://ror.org/039m3s961","country_code":"IT","type":"company","lineage":["https://openalex.org/I11912373","https://openalex.org/I4210130962"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Aurelio Mauri","raw_affiliation_strings":["Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","institution_ids":["https://openalex.org/I4210130962"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5037684383","display_name":"Valter Soncini","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130962","display_name":"Micron (Italy)","ror":"https://ror.org/039m3s961","country_code":"IT","type":"company","lineage":["https://openalex.org/I11912373","https://openalex.org/I4210130962"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"Valter Soncini","raw_affiliation_strings":["Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Micron Technology Italy, Via Olivetti, 2, 20864 Agrate Brianza (MB), Italy","institution_ids":["https://openalex.org/I4210130962"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5060873655"],"corresponding_institution_ids":["https://openalex.org/I4210130962"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.14413833,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"9","issue":"10-11","first_page":"2005","last_page":"2008"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.6913999915122986,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.6913999915122986,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.1932000070810318,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.07370000332593918,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/argon-ion-implantation","display_name":"argon ion implantation","score":0.9160000085830688},{"id":"https://openalex.org/keywords/implantation-induced-defects","display_name":"implantation-induced defects","score":0.8339999914169312},{"id":"https://openalex.org/keywords/oxide-silicon-interface","display_name":"oxide-silicon interface","score":0.8080000281333923},{"id":"https://openalex.org/keywords/interface-states","display_name":"interface states","score":0.7630000114440918},{"id":"https://openalex.org/keywords/stacking-faults","display_name":"stacking faults","score":0.890999972820282},{"id":"https://openalex.org/keywords/deep-level-defects","display_name":"deep levels","score":0.6069999933242798},{"id":"https://openalex.org/keywords/extended-defects","display_name":"extended defects","score":0.8149999976158142},{"id":"https://openalex.org/keywords/defect-annealing","display_name":"defect annealing","score":0.5509999990463257},{"id":"https://openalex.org/keywords/kinetic-monte-carlo","display_name":"kinetic Monte Carlo","score":0.8109999895095825}],"concepts":[{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.8741359114646912},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.662144124507904},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.636918306350708},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5800760984420776},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.46031591296195984},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.45767825841903687},{"id":"https://openalex.org/C164675345","wikidata":"https://www.wikidata.org/wiki/Q898226","display_name":"Crystallographic defect","level":2,"score":0.4182499349117279},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3885813355445862},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.2544112801551819},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.24402156472206116},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.21664837002754211},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.17839479446411133},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16043078899383545},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.12070930004119873},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.08491930365562439},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/pssc.201200074","doi":"https://doi.org/10.1002/pssc.201200074","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pssc.201200074","pdf_url":null,"source":{"id":"https://openalex.org/S4210174949","display_name":"Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics","issn_l":"1610-1634","issn":["1610-1634","1610-1642","1862-6351"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-40"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"physica status solidi c","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2021196189","https://openalex.org/W1998565058","https://openalex.org/W2034944538","https://openalex.org/W1991317384","https://openalex.org/W2058873969","https://openalex.org/W2124014459","https://openalex.org/W1998572787","https://openalex.org/W2018915411","https://openalex.org/W2047837041","https://openalex.org/W2017562874"],"abstract_inverted_index":{"Abstract":[0],"In":[1,99],"this":[2],"work":[3],"defects":[4,37,130,183],"generated":[5],"by":[6,12,19,132],"argon":[7,43,79,97,113,121,178],"implantation":[8,172],"were":[9,91],"studied":[10],"both":[11],"Transmission":[13],"Electron":[14],"Microscopy":[15],"(TEM)":[16],"inspections":[17],"and":[18,30,50,84,123,154,173,184],"measurements":[20],"of":[21,88,143,170,188],"the":[22,27,32,40,54,77,108,120,129,144,148,158,171,186],"defect":[23,63],"electrical":[24],"activity":[25],"at":[26],"oxide\u2010silicon":[28],"interface":[29,89],"in":[31,53],"bulk.":[33],"TEM":[34],"analyses":[35],"showed":[36,155],"close":[38],"to":[39,93,96,136,163],"surface":[41],"for":[42],"doses":[44],"equal":[45],"or":[46],"larger":[47],"than":[48,128],"1013cm\u20102,":[49],"stacking":[51],"faults":[52],"sample":[55],"implanted":[56,110],"with":[57,76,107,111,118,181],"1015":[58],"cm\u20102":[59],"dose.":[60,80,114],"The":[61,69,141],"maximum":[62],"depth":[64],"was":[65,72,152],"about":[66],"50":[67],"nm.":[68],"generation":[70],"lifetime":[71],"heavily":[73],"degraded":[74],"even":[75],"lowest":[78],"Besides,":[81],"positive":[82],"charge":[83],"a":[85,137],"relevant":[86],"population":[87],"states":[90],"found":[92],"be":[94],"related":[95,162],"implantation.":[98],"addition,":[100],"DLTS":[101],"revealed":[102,131],"four":[103],"deep":[104],"levels":[105,116,160],"starting":[106],"samples":[109],"1013cm\u20102":[112],"These":[115],"evolve":[117],"increasing":[119],"dose":[122],"are":[124,161],"located":[125],"much":[126],"deeper":[127],"TEM,":[133],"i.e.":[134],"down":[135],"few":[138],"micron":[139],"depth.":[140],"dependence":[142],"signal":[145],"amplitude":[146],"on":[147],"filling":[149],"pulse":[150],"width":[151],"analyzed,":[153],"that":[156,177],"all":[157],"observed":[159],"extended":[164,189],"defects.":[165,190],"Kinetic":[166],"Monte":[167],"Carlo":[168],"simulations":[169],"annealing":[174],"process":[175],"indicate":[176],"atoms":[179],"interact":[180],"implantation\u2010induced":[182],"enhance":[185],"formation":[187],"(\u00a9":[191],"2012":[192],"WILEY\u2010VCH":[193],"Verlag":[194],"GmbH":[195],"&":[196],"Co.":[197],"KGaA,":[198],"Weinheim)":[199]},"counts_by_year":[{"year":2016,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}