{"id":"https://openalex.org/W2002203827","doi":"https://doi.org/10.1016/j.apsusc.2012.10.128","title":"Advancing and receding angles \u2013 Dynamic contact angle measurements on mixed alkyl monolayers","display_name":"Advancing and receding angles \u2013 Dynamic contact angle measurements on mixed alkyl monolayers","publication_year":2012,"publication_date":"2012-11-09","ids":{"openalex":"https://openalex.org/W2002203827","doi":"https://doi.org/10.1016/j.apsusc.2012.10.128","mag":"2002203827"},"language":"en","primary_location":{"id":"doi:10.1016/j.apsusc.2012.10.128","doi":"https://doi.org/10.1016/j.apsusc.2012.10.128","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2012.10.128","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5057288278","display_name":"David Polster","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"David Polster","raw_affiliation_strings":["Institute of Physics and NanoMA (Center for Nanostructured Materials and Analytics), Chemnitz University of Technology, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics and NanoMA (Center for Nanostructured Materials and Analytics), Chemnitz University of Technology, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5036905611","display_name":"Harald Graaf","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Harald Graaf","raw_affiliation_strings":["Institute of Physics and NanoMA (Center for Nanostructured Materials and Analytics), Chemnitz University of Technology, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics and NanoMA (Center for Nanostructured Materials and Analytics), Chemnitz University of Technology, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5036905611"],"corresponding_institution_ids":["https://openalex.org/I2610724"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":0.4233,"has_fulltext":false,"cited_by_count":12,"citation_normalized_percentile":{"value":0.56179116,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"265","issue":null,"first_page":"88","last_page":"93"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10313","display_name":"Surface Modification and Superhydrophobicity","score":0.961899995803833,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10313","display_name":"Surface Modification and Superhydrophobicity","score":0.961899995803833,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12141","display_name":"Fluid Dynamics and Thin Films","score":0.007899999618530273,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11401","display_name":"Minerals Flotation and Separation Techniques","score":0.00430000014603138,"subfield":{"id":"https://openalex.org/subfields/2312","display_name":"Water Science and Technology"},"field":{"id":"https://openalex.org/fields/23","display_name":"Environmental Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dynamic-contact-angle","display_name":"dynamic contact angle","score":0.7990000247955322},{"id":"https://openalex.org/keywords/advancing-and-receding-contact-angle","display_name":"advancing and receding contact angle","score":0.8159999847412109},{"id":"https://openalex.org/keywords/contact-angle-hysteresis","display_name":"contact angle hysteresis","score":0.9539999961853027},{"id":"https://openalex.org/keywords/1-decene","display_name":"1-decene","score":0.9129999876022339},{"id":"https://openalex.org/keywords/methyl-10-undecenoate","display_name":"methyl 10-undecenoate","score":0.9850000143051147},{"id":"https://openalex.org/keywords/silicon-100-surface","display_name":"silicon (100) surface","score":0.828000009059906},{"id":"https://openalex.org/keywords/dispersion-interactions","display_name":"dispersion interactions","score":0.7559999823570251},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.7080000042915344},{"id":"https://openalex.org/keywords/surface-heterogeneity","display_name":"surface heterogeneity","score":0.6259999871253967}],"concepts":[{"id":"https://openalex.org/C6556556","wikidata":"https://www.wikidata.org/wiki/Q899239","display_name":"Contact angle","level":2,"score":0.9411584734916687},{"id":"https://openalex.org/C134514944","wikidata":"https://www.wikidata.org/wiki/Q817136","display_name":"Wetting","level":2,"score":0.8755849599838257},{"id":"https://openalex.org/C87525152","wikidata":"https://www.wikidata.org/wiki/Q5268149","display_name":"Dewetting","level":3,"score":0.8335361480712891},{"id":"https://openalex.org/C123299182","wikidata":"https://www.wikidata.org/wiki/Q190837","display_name":"Hysteresis","level":2,"score":0.7154775857925415},{"id":"https://openalex.org/C54517805","wikidata":"https://www.wikidata.org/wiki/Q7456118","display_name":"Sessile drop technique","level":3,"score":0.7080716490745544},{"id":"https://openalex.org/C7070889","wikidata":"https://www.wikidata.org/wiki/Q902488","display_name":"Monolayer","level":2,"score":0.6666377186775208},{"id":"https://openalex.org/C195839","wikidata":"https://www.wikidata.org/wiki/Q901959","display_name":"Surface energy","level":2,"score":0.6620075702667236},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.633671760559082},{"id":"https://openalex.org/C157107126","wikidata":"https://www.wikidata.org/wiki/Q7990179","display_name":"Wetting transition","level":3,"score":0.5983415246009827},{"id":"https://openalex.org/C36591836","wikidata":"https://www.wikidata.org/wiki/Q125264","display_name":"Mole fraction","level":2,"score":0.5681526064872742},{"id":"https://openalex.org/C2780263894","wikidata":"https://www.wikidata.org/wiki/Q335268","display_name":"Alkyl","level":2,"score":0.5194268226623535},{"id":"https://openalex.org/C2781345722","wikidata":"https://www.wikidata.org/wiki/Q5308388","display_name":"Drop (telecommunication)","level":2,"score":0.5072190761566162},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.4790583550930023},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4716208279132843},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.47139957547187805},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36661165952682495},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3286024332046509},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.26390570402145386},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.20068901777267456},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.13341638445854187},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.12251743674278259},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.11660909652709961},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.10803917050361633},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.06956902146339417},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.apsusc.2012.10.128","doi":"https://doi.org/10.1016/j.apsusc.2012.10.128","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2012.10.128","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[{"score":0.41999998688697815,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"study_designs":[],"awards":[{"id":"https://openalex.org/G4705360205","display_name":null,"funder_award_id":"GR 2659/4-1","funder_id":"https://openalex.org/F4320320879","funder_display_name":"Deutsche Forschungsgemeinschaft"}],"funders":[{"id":"https://openalex.org/F4320311647","display_name":"Merck KGaA","ror":"https://ror.org/04b2dty93"},{"id":"https://openalex.org/F4320320879","display_name":"Deutsche Forschungsgemeinschaft","ror":"https://ror.org/018mejw64"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":49,"referenced_works":["https://openalex.org/W278757837","https://openalex.org/W616702878","https://openalex.org/W1968749087","https://openalex.org/W1973902558","https://openalex.org/W1984428359","https://openalex.org/W1984796926","https://openalex.org/W1985376675","https://openalex.org/W1985494660","https://openalex.org/W1990904262","https://openalex.org/W1991615398","https://openalex.org/W2004200115","https://openalex.org/W2006796452","https://openalex.org/W2007229514","https://openalex.org/W2014028298","https://openalex.org/W2022265330","https://openalex.org/W2022546681","https://openalex.org/W2022729543","https://openalex.org/W2024977515","https://openalex.org/W2025265170","https://openalex.org/W2030025613","https://openalex.org/W2035520241","https://openalex.org/W2039848803","https://openalex.org/W2046661573","https://openalex.org/W2059995274","https://openalex.org/W2060177593","https://openalex.org/W2063628295","https://openalex.org/W2069234725","https://openalex.org/W2073550994","https://openalex.org/W2077569545","https://openalex.org/W2078302139","https://openalex.org/W2078415882","https://openalex.org/W2081002069","https://openalex.org/W2082315081","https://openalex.org/W2083327521","https://openalex.org/W2085341282","https://openalex.org/W2093225947","https://openalex.org/W2117290756","https://openalex.org/W2124614417","https://openalex.org/W2136056392","https://openalex.org/W2150553242","https://openalex.org/W2165704116","https://openalex.org/W2312814017","https://openalex.org/W2317114237","https://openalex.org/W2504447084","https://openalex.org/W2739616593","https://openalex.org/W2950475732","https://openalex.org/W4230846739","https://openalex.org/W4241026414","https://openalex.org/W4246001927"],"related_works":["https://openalex.org/W2007143098","https://openalex.org/W2023841216","https://openalex.org/W2088517598","https://openalex.org/W2080959690","https://openalex.org/W2048249828","https://openalex.org/W1968749087","https://openalex.org/W2077775281","https://openalex.org/W1989717181","https://openalex.org/W1983725254","https://openalex.org/W2062570850"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}