{"id":"https://openalex.org/W2002200192","doi":"https://doi.org/10.1007/s10854-014-1909-z","title":"Microstructural and morphological characterizations of nanocrystalline Ni\u2013Cu\u2013Fe thin films electrodeposited from electrolytes with different Fe ion concentrations","display_name":"Microstructural and morphological characterizations of nanocrystalline Ni\u2013Cu\u2013Fe thin films electrodeposited from electrolytes with different Fe ion concentrations","publication_year":2014,"publication_date":"2014-04-03","ids":{"openalex":"https://openalex.org/W2002200192","doi":"https://doi.org/10.1007/s10854-014-1909-z","mag":"2002200192"},"language":"en","primary_location":{"id":"doi:10.1007/s10854-014-1909-z","doi":"https://doi.org/10.1007/s10854-014-1909-z","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10854-014-1909-z","pdf_url":null,"source":{"id":"https://openalex.org/S189509794","display_name":"Journal of Materials Science Materials in Electronics","issn_l":"0957-4522","issn":["0957-4522","1573-482X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Materials Science: Materials in Electronics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5049067660","display_name":"Umut Sara\u00e7","orcid":"https://orcid.org/0000-0001-7657-173X","observed_orcids":["https://orcid.org/0000-0001-7657-173X"]},"institutions":[{"id":"https://openalex.org/I254571519","display_name":"Bartin University","ror":"https://ror.org/03te4vd35","country_code":"TR","type":"education","lineage":["https://openalex.org/I254571519"]}],"countries":["TR"],"is_corresponding":true,"raw_author_name":"Umut Sarac","raw_affiliation_strings":["Department of Elementary Education, Bart\u0131n University, Bart\u0131n, 74100, Turkey","Bartin University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Elementary Education, Bart\u0131n University, Bart\u0131n, 74100, Turkey","institution_ids":["https://openalex.org/I254571519"]},{"raw_affiliation_string":"Bartin University","institution_ids":["https://openalex.org/I254571519"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5057725990","display_name":"Mevlana Celalettin Baykul","orcid":"https://orcid.org/0000-0003-2921-9762","observed_orcids":["https://orcid.org/0000-0003-2921-9762"]},"institutions":[{"id":"https://openalex.org/I51209816","display_name":"Eski\u015fehir Osmangazi University","ror":"https://ror.org/01dzjez04","country_code":"TR","type":"education","lineage":["https://openalex.org/I51209816"]}],"countries":["TR"],"is_corresponding":false,"raw_author_name":"M. Celalettin Baykul","raw_affiliation_strings":["Department of Physics, Eski\u015fehir Osmangazi University, Eskisehir, 26480, Turkey","Eskisehir Osmangazi University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Eski\u015fehir Osmangazi University, Eskisehir, 26480, Turkey","institution_ids":["https://openalex.org/I51209816"]},{"raw_affiliation_string":"Eskisehir Osmangazi University","institution_ids":["https://openalex.org/I51209816"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5049067660"],"corresponding_institution_ids":["https://openalex.org/I254571519"],"apc_list":{"value":3990,"currency":"USD","value_usd":3990},"apc_paid":null,"fwci":0.6908,"has_fulltext":false,"cited_by_count":9,"citation_normalized_percentile":{"value":0.62480899,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"25","issue":"6","first_page":"2554","last_page":"2560"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nanocrystalline-thin-films","display_name":"nanocrystalline films","score":0.871999979019165},{"id":"https://openalex.org/keywords/electrodeposition","display_name":"electrodeposition","score":0.8069999814033508},{"id":"https://openalex.org/keywords/phase-separation","display_name":"phase separation","score":0.7889999747276306},{"id":"https://openalex.org/keywords/galvanostatic-electrodeposition","display_name":"galvanostatic deposition","score":0.7450000047683716},{"id":"https://openalex.org/keywords/indium-tin-oxide-substrate","display_name":"indium tin oxide substrate","score":0.7300000190734863},{"id":"https://openalex.org/keywords/preferred-crystal-orientation","display_name":"crystallographic preferred orientation","score":0.7009999752044678},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.6970000267028809},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.9760000109672546},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.9670000076293945},{"id":"https://openalex.org/keywords/ternary-alloys","display_name":"ternary alloys","score":0.6850000023841858}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7970302700996399},{"id":"https://openalex.org/C140676511","wikidata":"https://www.wikidata.org/wiki/Q6964018","display_name":"Nanocrystalline material","level":2,"score":0.7446497678756714},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.6896141171455383},{"id":"https://openalex.org/C68801617","wikidata":"https://www.wikidata.org/wiki/Q162908","display_name":"Electrolyte","level":3,"score":0.6312511563301086},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5662645101547241},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.48457419872283936},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4585449993610382},{"id":"https://openalex.org/C2781195486","wikidata":"https://www.wikidata.org/wiki/Q289436","display_name":"Texture (cosmology)","level":3,"score":0.4191516935825348},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.12049052119255066},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10497549176216125},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.07657402753829956},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s10854-014-1909-z","doi":"https://doi.org/10.1007/s10854-014-1909-z","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10854-014-1909-z","pdf_url":null,"source":{"id":"https://openalex.org/S189509794","display_name":"Journal of Materials Science Materials in Electronics","issn_l":"0957-4522","issn":["0957-4522","1573-482X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Materials Science: Materials in Electronics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":40,"referenced_works":["https://openalex.org/W149472192","https://openalex.org/W1963845678","https://openalex.org/W1965881715","https://openalex.org/W1966181667","https://openalex.org/W1968291681","https://openalex.org/W1976620402","https://openalex.org/W1981430746","https://openalex.org/W1987914668","https://openalex.org/W1993195431","https://openalex.org/W1994702514","https://openalex.org/W1996584316","https://openalex.org/W2001956486","https://openalex.org/W2003615654","https://openalex.org/W2009875892","https://openalex.org/W2011500139","https://openalex.org/W2012424863","https://openalex.org/W2013299029","https://openalex.org/W2016769883","https://openalex.org/W2021300963","https://openalex.org/W2021513185","https://openalex.org/W2028434858","https://openalex.org/W2029294491","https://openalex.org/W2029466032","https://openalex.org/W2038869195","https://openalex.org/W2049425686","https://openalex.org/W2050580890","https://openalex.org/W2056900338","https://openalex.org/W2058608491","https://openalex.org/W2067528145","https://openalex.org/W2070056848","https://openalex.org/W2087393114","https://openalex.org/W2088167554","https://openalex.org/W2090719980","https://openalex.org/W2094207712","https://openalex.org/W2099550902","https://openalex.org/W2123658654","https://openalex.org/W2124312198","https://openalex.org/W2134833814","https://openalex.org/W2167798739","https://openalex.org/W2168122574"],"related_works":["https://openalex.org/W2088167554","https://openalex.org/W2540600868","https://openalex.org/W2777318367","https://openalex.org/W2143248853","https://openalex.org/W4248649781","https://openalex.org/W2969743859","https://openalex.org/W2001956486","https://openalex.org/W3119440341","https://openalex.org/W2156289143","https://openalex.org/W7135193826"],"abstract_inverted_index":null,"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":3},{"year":2014,"cited_by_count":1}],"updated_date":"2026-10-27T15:51:10.671819","created_date":"2016-06-24T00:00:00"}