{"id":"https://openalex.org/W2001790722","doi":"https://doi.org/10.1117/12.557747","title":"Contact hole reticle optimization by using interference mapping lithography (IML)","display_name":"Contact hole reticle optimization by using interference mapping lithography (IML)","publication_year":2004,"publication_date":"2004-08-20","ids":{"openalex":"https://openalex.org/W2001790722","doi":"https://doi.org/10.1117/12.557747","mag":"2001790722"},"language":"en","primary_location":{"id":"doi:10.1117/12.557747","doi":"https://doi.org/10.1117/12.557747","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.557747","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5008225061","display_name":"Robert J. Socha","orcid":"https://orcid.org/0000-0003-2388-1819","observed_orcids":["https://orcid.org/0000-0003-2388-1819"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Robert J. Socha","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073232432","display_name":"Douglas J. Van Den Broeke","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Douglas J. Van Den Broeke","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013622895","display_name":"Stephen Hsu","orcid":"https://orcid.org/0000-0001-5829-5567","observed_orcids":["https://orcid.org/0000-0001-5829-5567"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Stephen D. Hsu","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050954251","display_name":"Jiarui Chen","orcid":"https://orcid.org/0000-0001-8449-2847","observed_orcids":["https://orcid.org/0000-0001-8449-2847"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J. Fung Chen","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059811760","display_name":"Thomas L. Laidig","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Thomas L. Laidig","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052932483","display_name":"Noel P. Corcoran","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Noel P. Corcoran","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014205637","display_name":"Uwe Hollerbach","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Uwe Hollerbach","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043014796","display_name":"Kurt E. Wampler","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kurt E. Wampler","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055283353","display_name":"Xuelong Shi","orcid":"https://orcid.org/0000-0001-9769-2231","observed_orcids":["https://orcid.org/0000-0001-9769-2231"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Xuelong Shi","raw_affiliation_strings":["ASML MaskTools, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML MaskTools, Inc. (United States)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5039771729","display_name":"Willard E. Conley","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1333370159","display_name":"Motorola (United States)","ror":"https://ror.org/01hafxd32","country_code":"US","type":"company","lineage":["https://openalex.org/I1333370159"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Willard E. Conley","raw_affiliation_strings":["Motorola, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Motorola, Inc. (United States)","institution_ids":["https://openalex.org/I1333370159"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.9064,"has_fulltext":false,"cited_by_count":29,"citation_normalized_percentile":{"value":0.91041792,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":"5446","issue":null,"first_page":"516","last_page":"516"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/partially-coherent-sources","display_name":"partially coherent sources","score":0.6460000276565552},{"id":"https://openalex.org/keywords/exposure-latitude","display_name":"exposure latitude","score":0.9769999980926514},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.9959999918937683},{"id":"https://openalex.org/keywords/low-k1-lithography","display_name":"low-k1 lithography","score":0.6959999799728394},{"id":"https://openalex.org/keywords/arf-excimer-laser-lithography","display_name":"ArF excimer laser lithography","score":0.675000011920929}],"concepts":[{"id":"https://openalex.org/C32022120","wikidata":"https://www.wikidata.org/wiki/Q797225","display_name":"Interference (communication)","level":3,"score":0.720444917678833},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.6456810235977173},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6284180879592896},{"id":"https://openalex.org/C146617872","wikidata":"https://www.wikidata.org/wiki/Q1391868","display_name":"Reticle","level":3,"score":0.6046362519264221},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.565848708152771},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5145870447158813},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.4670504629611969},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.43384137749671936},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4076838493347168},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.38270634412765503},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.25693994760513306},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.24020463228225708},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.1862826645374298},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.08499595522880554},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.557747","doi":"https://doi.org/10.1117/12.557747","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.557747","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1995450435","https://openalex.org/W2085364692","https://openalex.org/W1982032357","https://openalex.org/W2055081293","https://openalex.org/W2035964378","https://openalex.org/W2025639589","https://openalex.org/W1997740520","https://openalex.org/W7095828973","https://openalex.org/W2588742964","https://openalex.org/W1985628067"],"abstract_inverted_index":{"The":[0],"theory":[1],"of":[2,51,121,154],"interference":[3,42,59,88],"mapping":[4],"lithography":[5],"(IML)":[6],"is":[7,21,44,77,97],"presented":[8,112],"for":[9,36,65,92,113,132],"low":[10],"k1":[11],"(k1<0.4)":[12],"contact":[13],"hole":[14],"imaging.":[15],"IML":[16,35,76,131,170],"with":[17,128,138,184],"a":[18,31,37,78,84,90,94,104,108,135],"coherent":[19,39],"source":[20],"shown":[22],"to":[23,26,80,102,182],"be":[24],"analogous":[25],"methods":[27],"used":[28],"in":[29,71,173],"creating":[30,93],"Fresnel":[32],"lens.":[33],"With":[34],"partially":[38],"source,":[40],"the":[41,48,52,72,87,115,165],"map":[43],"calculated":[45],"by":[46],"using":[47,152],"first":[49],"eigenfunction":[50],"transmission":[53],"cross":[54],"coefficient":[55],"(TCC).":[56],"From":[57,86],"this":[58],"map,":[60,89],"clear":[61,66],"0\u00b0":[62],"AFs":[63,68,82],"and":[64,144,156],"180\u00b0":[67],"are":[69,111,126],"placed":[70],"optimal":[73],"location.":[74],"Thus,":[75],"method":[79,91],"place":[81],"via":[83],"model.":[85],"CPL":[95,109,136,171],"mask":[96,106,110,137],"demonstrated.":[98],"Using":[99,130],"IML,":[100],"techniques":[101,125],"optimize":[103],"binary":[105],"or":[107,119],"maximizing":[114],"exposure":[116],"latitude":[117],"(EL)":[118],"depth":[120],"focus":[122],"(DOF).":[123],"These":[124],"verified":[127],"simulation.":[129],"maximum":[133],"EL,":[134],"100nm":[139,175],"(k1=0.39)":[140],"contacts":[141,176],"was":[142],"created":[143],"exposed":[145,166],"on":[146,164],"an":[147],"ASML":[148],"/1100":[149],"ArF":[150],"scanner":[151],"NA":[153],"0.75":[155],"Quasar":[157],"illumination":[158],"(\u03c3in=0.72,":[159],"\u03c3out=0.92,":[160],"span":[161],"angle=20\u00b0).":[162],"Measurements":[163],"wafers":[167],"show":[168],"that":[169],"results":[172],"printing":[174],"through":[177],"pitch":[178,181],"(200nm":[179],"minimum":[180],"isolated)":[183],"0.45\u03bcm":[185],"DOF":[186],"at":[187],"10%":[188],"EL.":[189]},"counts_by_year":[{"year":2017,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}