{"id":"https://openalex.org/W2000924555","doi":"https://doi.org/10.1143/jjap.40.576","title":"Characteristics of Superconducting Nb Layer Fabricated Using High-Vacuum Electron Beam Evaporation","display_name":"Characteristics of Superconducting Nb Layer Fabricated Using High-Vacuum Electron Beam Evaporation","publication_year":2001,"publication_date":"2001-02-01","ids":{"openalex":"https://openalex.org/W2000924555","doi":"https://doi.org/10.1143/jjap.40.576","mag":"2000924555"},"language":"en","primary_location":{"id":"doi:10.1143/jjap.40.576","doi":"https://doi.org/10.1143/jjap.40.576","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.40.576","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.40.576/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1143/JJAP.40.576/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113607890","display_name":"S. Morohashi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shin'ichi Morohashi","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Norihisa Takeda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Norihisa Takeda","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024482162","display_name":"Shogo Tsujimura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shogo Tsujimura","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090590477","display_name":"Masanori Kawanishi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masanori Kawanishi","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Keita Harada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Keita Harada","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Shoji Maekawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shoji Maekawa","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110726649","display_name":"Noriaki Nakayama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I173915773","display_name":"Yamaguchi University","ror":"https://ror.org/03cxys317","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Noriaki Nakayama","raw_affiliation_strings":["Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University,","institution_ids":["https://openalex.org/I173915773"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018155454","display_name":"Takashi Noguchi","orcid":"https://orcid.org/0000-0003-0298-5512","observed_orcids":["https://orcid.org/0000-0003-0298-5512"]},"institutions":[{"id":"https://openalex.org/I4405286930","display_name":"Nobeyama Radio Observatory","ror":"https://ror.org/03kpxq070","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1319490839","https://openalex.org/I199525922","https://openalex.org/I4210159940","https://openalex.org/I4405286930"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takashi Noguchi","raw_affiliation_strings":["Nobeyama Radio Observatory, Minamimaki, Minamisaku, Nagano 384-13, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nobeyama Radio Observatory, Minamimaki, Minamisaku, Nagano 384-13, Japan","institution_ids":["https://openalex.org/I4405286930"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":0.4004,"has_fulltext":true,"cited_by_count":10,"citation_normalized_percentile":{"value":0.64303214,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"40","issue":"2R","first_page":"576","last_page":"576"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11803","display_name":"Superconducting and THz Device Technology","score":0.7914999723434448,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11803","display_name":"Superconducting and THz Device Technology","score":0.7914999723434448,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11808","display_name":"Superconducting Materials and Applications","score":0.08320000022649765,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.03350000083446503,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/niobium-thin-films","display_name":"niobium thin films","score":0.902999997138977},{"id":"https://openalex.org/keywords/superconducting-layers","display_name":"superconducting layers","score":0.6899999976158142},{"id":"https://openalex.org/keywords/josephson-junctions","display_name":"Josephson junctions","score":0.8889999985694885},{"id":"https://openalex.org/keywords/electron-beam-evaporation","display_name":"electron beam evaporation","score":0.9210000038146973},{"id":"https://openalex.org/keywords/high-vacuum-deposition","display_name":"high vacuum deposition","score":0.6420000195503235},{"id":"https://openalex.org/keywords/critical-transition-temperature","display_name":"critical transition temperature","score":0.7760000228881836},{"id":"https://openalex.org/keywords/residual-resistivity","display_name":"residual resistivity","score":0.8619999885559082},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.9900000095367432},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":1.0},{"id":"https://openalex.org/keywords/residual-stress","display_name":"residual stress","score":0.7710000276565552},{"id":"https://openalex.org/keywords/tensile-stress","display_name":"tensile stress","score":0.722000002861023},{"id":"https://openalex.org/keywords/substrate-curvature","display_name":"substrate curvature","score":0.5120000243186951}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7268804311752319},{"id":"https://openalex.org/C7770020","wikidata":"https://www.wikidata.org/wiki/Q460616","display_name":"Electron beam physical vapor deposition","level":3,"score":0.6396193504333496},{"id":"https://openalex.org/C507968137","wikidata":"https://www.wikidata.org/wiki/Q1046","display_name":"Niobium","level":2,"score":0.6366057395935059},{"id":"https://openalex.org/C82225425","wikidata":"https://www.wikidata.org/wiki/Q7880334","display_name":"Ultra-high vacuum","level":2,"score":0.620084822177887},{"id":"https://openalex.org/C2779192298","wikidata":"https://www.wikidata.org/wiki/Q7908061","display_name":"Vacuum evaporation","level":3,"score":0.5977312326431274},{"id":"https://openalex.org/C77557913","wikidata":"https://www.wikidata.org/wiki/Q864822","display_name":"Electron diffraction","level":3,"score":0.5971337556838989},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5843056440353394},{"id":"https://openalex.org/C2780911149","wikidata":"https://www.wikidata.org/wiki/Q265305","display_name":"Residual resistivity","level":3,"score":0.5712934732437134},{"id":"https://openalex.org/C200096950","wikidata":"https://www.wikidata.org/wiki/Q455003","display_name":"Reflection high-energy electron diffraction","level":4,"score":0.5603997111320496},{"id":"https://openalex.org/C61441594","wikidata":"https://www.wikidata.org/wiki/Q132814","display_name":"Evaporation","level":2,"score":0.5502200722694397},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5053863525390625},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4599325954914093},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4541161060333252},{"id":"https://openalex.org/C2776873873","wikidata":"https://www.wikidata.org/wiki/Q3044964","display_name":"Vacuum deposition","level":3,"score":0.4407525062561035},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.4345533847808838},{"id":"https://openalex.org/C11665553","wikidata":"https://www.wikidata.org/wiki/Q1136069","display_name":"Radius of curvature","level":5,"score":0.4312707185745239},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4249430298805237},{"id":"https://openalex.org/C54101563","wikidata":"https://www.wikidata.org/wiki/Q124131","display_name":"Superconductivity","level":2,"score":0.34007155895233154},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3041539192199707},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.3027183413505554},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.27038127183914185},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.25607696175575256},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.22976145148277283},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.18671569228172302},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1662106215953827},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16438767313957214},{"id":"https://openalex.org/C195065555","wikidata":"https://www.wikidata.org/wiki/Q214881","display_name":"Curvature","level":2,"score":0.15899577736854553},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1251036822795868},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.06361311674118042},{"id":"https://openalex.org/C175017881","wikidata":"https://www.wikidata.org/wiki/Q1318998","display_name":"Mean curvature","level":3,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C127813850","wikidata":"https://www.wikidata.org/wiki/Q6803617","display_name":"Mean curvature flow","level":4,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1143/jjap.40.576","doi":"https://doi.org/10.1143/jjap.40.576","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.40.576","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.40.576/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1143/jjap.40.576","doi":"https://doi.org/10.1143/jjap.40.576","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.40.576","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.40.576/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2000924555.pdf","grobid_xml":"https://content.openalex.org/works/W2000924555.grobid-xml"},"referenced_works_count":11,"referenced_works":["https://openalex.org/W1994998756","https://openalex.org/W2015947289","https://openalex.org/W2020392740","https://openalex.org/W2022762825","https://openalex.org/W2054357211","https://openalex.org/W2056024284","https://openalex.org/W2059590944","https://openalex.org/W2070681826","https://openalex.org/W2072353486","https://openalex.org/W2072768447","https://openalex.org/W2090544587"],"related_works":["https://openalex.org/W2036904232","https://openalex.org/W2045730347","https://openalex.org/W1600585153","https://openalex.org/W1703524232","https://openalex.org/W2369983510","https://openalex.org/W2315049393","https://openalex.org/W2140351627","https://openalex.org/W2058792072","https://openalex.org/W2005523465","https://openalex.org/W1981719787"],"abstract_inverted_index":{"We":[0],"have":[1,57],"fabricated":[2],"a":[3,8,14,140],"niobium":[4],"(Nb)":[5],"layer":[6,25,86,123,138],"for":[7],"Josephson":[9],"junction":[10],"by":[11,107],"means":[12],"of":[13,32,39,44,52,61,67,70,81,114,116,130],"high-vacuum":[15,22,83,101,135],"electron":[16],"beam":[17],"(EB)":[18],"evaporation":[19],"technique.":[20],"The":[21,74,97,134],"EB-evaporated":[23,84,102,136],"Nb":[24,50,85,103,122,132,137],"is":[26,105],"deposited":[27],"under":[28],"the":[29,36,45,58,65,78,82,100,109,112,117,126,131],"base":[30],"pressure":[31],"4\u00d710-9":[33],"Pa":[34],"and":[35,64,77,93,120,125],"deposition":[37,48],"rate":[38],"1.2":[40],"nm/min.":[41],"In":[42],"spite":[43],"extremely":[46],"low":[47],"rate,":[49],"layers":[51,104],"over":[53],"50":[54],"nm":[55],"thickness":[56],"transition":[59],"temperature":[60],"9.3":[62],"K":[63],"ratio":[66],"residual":[68],"resistivity":[69],"more":[71],"than":[72],"3.":[73],"surface":[75],"roughness":[76],"grain":[79],"size":[80],"are":[87],"studied":[88],"using":[89],"atomic":[90],"force":[91],"microscopy":[92],"X-ray":[94,127],"diffraction":[95,128],"analysis.":[96],"stress":[98],"in":[99,111],"examined":[106],"measuring":[108],"change":[110],"radius":[113],"curvature":[115],"substrate":[118],"before":[119],"after":[121],"deposition,":[124],"patterns":[129],"layers.":[133],"exhibits":[139],"weak":[141],"tensile":[142],"stress.":[143]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}