{"id":"https://openalex.org/W2000870181","doi":"https://doi.org/10.2494/photopolymer.18.737","title":"Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone","display_name":"Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone","publication_year":2005,"publication_date":"2005-01-01","ids":{"openalex":"https://openalex.org/W2000870181","doi":"https://doi.org/10.2494/photopolymer.18.737","mag":"2000870181"},"language":"en","primary_location":{"id":"doi:10.2494/photopolymer.18.737","doi":"https://doi.org/10.2494/photopolymer.18.737","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.18.737","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/18/6/18_6_737/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/photopolymer/18/6/18_6_737/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5087626430","display_name":"Muthiah Thiyagarajan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114027177","display_name":"University of North Carolina at Chapel Hill","ror":"https://ror.org/0130frc33","country_code":"US","type":"education","lineage":["https://openalex.org/I114027177"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Muthiah Thiyagarajan","raw_affiliation_strings":["Polymer Chemistry Nanotechnology Laboratory, Cameron Applied Research Center, University of North Carolina"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Polymer Chemistry Nanotechnology Laboratory, Cameron Applied Research Center, University of North Carolina","institution_ids":["https://openalex.org/I114027177"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111741148","display_name":"Kim Dean","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kim Dean","raw_affiliation_strings":["Department of Chemistry, Center for Optoelectronics and Optical Communications, University of North Carolina,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemistry, Center for Optoelectronics and Optical Communications, University of North Carolina,","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5000454572","display_name":"Kenneth E. Consalves","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114027177","display_name":"University of North Carolina at Chapel Hill","ror":"https://ror.org/0130frc33","country_code":"US","type":"education","lineage":["https://openalex.org/I114027177"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kenneth E. Consalves","raw_affiliation_strings":["Polymer Chemistry Nanotechnology Laboratory, Cameron Applied Research Center, University of North Carolina"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Polymer Chemistry Nanotechnology Laboratory, Cameron Applied Research Center, University of North Carolina","institution_ids":["https://openalex.org/I114027177"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":5.2258,"has_fulltext":false,"cited_by_count":60,"citation_normalized_percentile":{"value":0.951887,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"18","issue":"6","first_page":"737","last_page":"741"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-resist","display_name":"EUV resist","score":0.8569999933242798},{"id":"https://openalex.org/keywords/photoacid-generator","display_name":"photoacid generator","score":0.7250000238418579},{"id":"https://openalex.org/keywords/photospeed","display_name":"photospeed","score":0.7599999904632568},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.9990000128746033},{"id":"https://openalex.org/keywords/triflate","display_name":"trifluoromethanesulfonate","score":0.5460000038146973},{"id":"https://openalex.org/keywords/counterion-effects","display_name":"counterion effects","score":0.7900000214576721},{"id":"https://openalex.org/keywords/sub-100-nm-patterning","display_name":"sub-100 nm patterning","score":0.7960000038146973}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9602829813957214},{"id":"https://openalex.org/C21774173","wikidata":"https://www.wikidata.org/wiki/Q2462024","display_name":"Trifluoromethanesulfonate","level":3,"score":0.7918338179588318},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7878338098526001},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.7832812070846558},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7633661031723022},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.6335422396659851},{"id":"https://openalex.org/C15920480","wikidata":"https://www.wikidata.org/wiki/Q421281","display_name":"Copolymer","level":3,"score":0.6176691651344299},{"id":"https://openalex.org/C132050475","wikidata":"https://www.wikidata.org/wiki/Q736232","display_name":"Methacrylate","level":4,"score":0.5993726849555969},{"id":"https://openalex.org/C188027245","wikidata":"https://www.wikidata.org/wiki/Q750446","display_name":"Polymer chemistry","level":1,"score":0.49354684352874756},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.46805045008659363},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2913099527359009},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2655943036079407},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1437627673149109},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.13603425025939941},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.12160462141036987},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.07953044772148132},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2494/photopolymer.18.737","doi":"https://doi.org/10.2494/photopolymer.18.737","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.18.737","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/18/6/18_6_737/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2494/photopolymer.18.737","doi":"https://doi.org/10.2494/photopolymer.18.737","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.18.737","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/18/6/18_6_737/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2000870181.pdf"},"referenced_works_count":18,"referenced_works":["https://openalex.org/W1975739461","https://openalex.org/W1981577823","https://openalex.org/W1990207942","https://openalex.org/W1995160048","https://openalex.org/W1998363590","https://openalex.org/W2006588090","https://openalex.org/W2008378699","https://openalex.org/W2008667009","https://openalex.org/W2009169613","https://openalex.org/W2013446260","https://openalex.org/W2023226661","https://openalex.org/W2026582442","https://openalex.org/W2035864323","https://openalex.org/W2061498592","https://openalex.org/W2061963067","https://openalex.org/W2063912605","https://openalex.org/W2094690566","https://openalex.org/W2111615952"],"related_works":["https://openalex.org/W2328303694","https://openalex.org/W2001528277","https://openalex.org/W2011677790","https://openalex.org/W1983853302","https://openalex.org/W2026672365","https://openalex.org/W2036988869","https://openalex.org/W1974276038","https://openalex.org/W2325910234","https://openalex.org/W2010528874","https://openalex.org/W2030706476"],"abstract_inverted_index":{"Polymer":[0],"bound":[1,37],"PAG":[2,38],"resists,":[3,56],"poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl":[4,8],"methacrylate-co-PAG1)":[5],"[poly(HOST-co-EAMA-co-PAG1)]":[6],"and":[7,14,30,43,54,62,82,101,119],"methacrylate-co-PAG2)":[9],"[poly(HOST-co-EAMA-co-PAG2)]":[10],"have":[11],"been":[12],"synthesized":[13],"evaluated":[15],"as":[16,28,99,117],"potential":[17,77],"components":[18],"of":[19,50,94],"EUV":[20,90,122],"resist":[21,39,74],"materials":[22],"with":[23,58,65,112],"enhanced":[24],"lithographic":[25,105,114],"properties":[26],"such":[27,98,116],"photospeed":[29,42,118],"Line":[31],"Edge":[32],"Roughness":[33],"(LER).":[34],"The":[35],"polymer":[36],"exhibited":[40],"faster":[41],"lower":[44],"LER":[45,120],"than":[46],"the":[47,104],"corresponding":[48],"blend":[49,59,64],"photoacid":[51],"generator":[52],"(PAG)":[53],"copolymer":[55],"poly(HOST-co-EAMA)":[57,63],"PAG3":[60],"(Triflate)":[61],"PAG4":[66],"(Nonaflate).":[67],"These":[68],"results":[69],"imply":[70],"that":[71],"this":[72],"novel":[73],"system":[75],"has":[76],"advantages":[78],"over":[79],"conventional":[80],"resists":[81],"should":[83],"be":[84],"further":[85],"explored":[86],"for":[87],"application":[88],"in":[89],"lithography.":[91],"Furthermore,":[92],"use":[93],"different":[95],"counter":[96],"anions":[97],"triflate":[100],"nonaflate":[102],"influenced":[103],"performance.":[106],"Sub-100":[107],"nm":[108],"features":[109],"were":[110],"obtained":[111],"improved":[113],"performance":[115],"using":[121],"exposure.":[123]},"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2025,"cited_by_count":5},{"year":2024,"cited_by_count":4},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":3}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}