{"id":"https://openalex.org/W2000776522","doi":"https://doi.org/10.1364/cleo.2010.jtua1","title":"High Resolution 3-D Laser Direct-Write Patterning","display_name":"High Resolution 3-D Laser Direct-Write Patterning","publication_year":2010,"publication_date":"2010-01-01","ids":{"openalex":"https://openalex.org/W2000776522","doi":"https://doi.org/10.1364/cleo.2010.jtua1","mag":"2000776522"},"language":"en","primary_location":{"id":"doi:10.1364/cleo.2010.jtua1","doi":"https://doi.org/10.1364/cleo.2010.jtua1","is_oa":false,"landing_page_url":"https://doi.org/10.1364/cleo.2010.jtua1","pdf_url":null,"source":{"id":"https://openalex.org/S4306418073","display_name":"Conference on Lasers and Electro-Optics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Conference on Lasers and Electro-Optics 2010","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100657556","display_name":"Linjie Li","orcid":"https://orcid.org/0000-0003-2045-5275","observed_orcids":["https://orcid.org/0000-0003-2045-5275"]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Linjie Li","raw_affiliation_strings":["Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079382200","display_name":"Rafael R. Gattass","orcid":"https://orcid.org/0000-0002-5286-6178","observed_orcids":["https://orcid.org/0000-0002-5286-6178"]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Rafael R. Gattass","raw_affiliation_strings":["Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032977524","display_name":"Michael P. Stocker","orcid":"https://orcid.org/0009-0008-1705-9216","observed_orcids":["https://orcid.org/0009-0008-1705-9216"]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Michael Stocker","raw_affiliation_strings":["Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062104968","display_name":"Erez Gershgoren","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Erez Gershgoren","raw_affiliation_strings":["Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010728974","display_name":"Hana Hwang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Hana Hwang","raw_affiliation_strings":["Department of Physics, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5078311457","display_name":"John T. Fourkas","orcid":"https://orcid.org/0000-0002-4522-9584","observed_orcids":["https://orcid.org/0000-0002-4522-9584"]},"institutions":[{"id":"https://openalex.org/I66946132","display_name":"University of Maryland, College Park","ror":"https://ror.org/047s2c258","country_code":"US","type":"education","lineage":["https://openalex.org/I66946132"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"John T. Fourkas","raw_affiliation_strings":["Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742 USA","Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","Institute for Physical Science and Technology, University of Maryland, College Park, MD 20742 USA","Maryland NanoCenter, University of Maryland, College Park, MD 20742 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]},{"raw_affiliation_string":"Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]},{"raw_affiliation_string":"Institute for Physical Science and Technology, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]},{"raw_affiliation_string":"Maryland NanoCenter, University of Maryland, College Park, MD 20742 USA","institution_ids":["https://openalex.org/I66946132"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5010728974","https://openalex.org/A5032977524","https://openalex.org/A5062104968","https://openalex.org/A5078311457","https://openalex.org/A5079382200","https://openalex.org/A5100657556"],"corresponding_institution_ids":["https://openalex.org/I66946132"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.09121324,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"46","issue":null,"first_page":"JTuA1","last_page":"JTuA1"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8169000148773193,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8169000148773193,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.12600000202655792,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.015300000086426735,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/high-resolution-patterning","display_name":"high-resolution patterning","score":0.5139999985694885}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8373345136642456},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.6191771626472473},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.6070065498352051},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.5905241966247559},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.5412120819091797},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.5326599478721619},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.5215087532997131},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.5190520882606506},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5085560083389282},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5034145712852478},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4896581768989563},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.4831070899963379},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4579751193523407},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.41441670060157776},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3509184718132019},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3370332717895508},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.3150334060192108},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.2645219564437866},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.18867745995521545},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.05474233627319336},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1364/cleo.2010.jtua1","doi":"https://doi.org/10.1364/cleo.2010.jtua1","is_oa":false,"landing_page_url":"https://doi.org/10.1364/cleo.2010.jtua1","pdf_url":null,"source":{"id":"https://openalex.org/S4306418073","display_name":"Conference on Lasers and Electro-Optics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Conference on Lasers and Electro-Optics 2010","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1978249718","https://openalex.org/W1997314456","https://openalex.org/W2031476233","https://openalex.org/W3145160410","https://openalex.org/W4211095184"],"related_works":["https://openalex.org/W2789529243","https://openalex.org/W4394623397","https://openalex.org/W2071847257","https://openalex.org/W2168555737","https://openalex.org/W2162732738","https://openalex.org/W4406870503","https://openalex.org/W1986914626","https://openalex.org/W2099587871","https://openalex.org/W1973813854","https://openalex.org/W95694641"],"abstract_inverted_index":{"Resolution":[0],"Augmentation":[1],"through":[2],"Photo-Induced":[3],"Deactivation":[4],"(RAPID)":[5],"lithography":[6],"makes":[7],"possible":[8],"the":[9,17,27],"creation":[10],"of":[11,19,26],"features":[12],"that":[13],"far":[14],"smaller":[15],"than":[16],"wavelength":[18],"light":[20],"employed.":[21],"We":[22],"will":[23],"present":[24],"some":[25],"latest":[28],"advances":[29],"in":[30],"RAPID":[31],"lithography.":[32]},"counts_by_year":[],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}