{"id":"https://openalex.org/W2000742597","doi":"https://doi.org/10.1016/j.optmat.2004.08.005","title":"UHV-CVD growth and annealing of thin fully relaxed Ge films on (001)Si","display_name":"UHV-CVD growth and annealing of thin fully relaxed Ge films on (001)Si","publication_year":2004,"publication_date":"2004-10-13","ids":{"openalex":"https://openalex.org/W2000742597","doi":"https://doi.org/10.1016/j.optmat.2004.08.005","mag":"2000742597"},"language":"en","primary_location":{"id":"doi:10.1016/j.optmat.2004.08.005","doi":"https://doi.org/10.1016/j.optmat.2004.08.005","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.optmat.2004.08.005","pdf_url":null,"source":{"id":"https://openalex.org/S199247034","display_name":"Optical Materials","issn_l":"0925-3467","issn":["0925-3467","1873-1252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optical Materials","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5079432599","display_name":"Mathieu Halbwax","orcid":"https://orcid.org/0000-0002-2978-3913","observed_orcids":["https://orcid.org/0000-0002-2978-3913"]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":true,"raw_author_name":"M. Halbwax","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041868727","display_name":"Mathieu Rouvi\u00e8re","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Rouviere","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","STMicroelectronics, 850 rue Jean Monnet, 38826 Crolles, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]},{"raw_affiliation_string":"STMicroelectronics, 850 rue Jean Monnet, 38826 Crolles, Cedex, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011671996","display_name":"Yunlin Jacques Zheng","orcid":"https://orcid.org/0000-0001-8964-5603","observed_orcids":["https://orcid.org/0000-0001-8964-5603"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210145605","display_name":"Institut de min\u00e9ralogie, de physique des mat\u00e9riaux et de cosmochimie","ror":"https://ror.org/05abgg682","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I2802818602","https://openalex.org/I39804081","https://openalex.org/I4210090127","https://openalex.org/I4210098836","https://openalex.org/I4210123595","https://openalex.org/I4210131494","https://openalex.org/I4210145605","https://openalex.org/I4210166444"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Y. Zheng","raw_affiliation_strings":["Laboratoire de Mineralogie-Cristallographie, Universit\u00e9s Paris VI et Paris VII, CNRS UMR 7590,4 place Jussieu, 75252 Paris, Cedex 05, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Mineralogie-Cristallographie, Universit\u00e9s Paris VI et Paris VII, CNRS UMR 7590,4 place Jussieu, 75252 Paris, Cedex 05, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I4210145605"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109360711","display_name":"D. D\u00e9barre","orcid":"https://orcid.org/0009-0006-9868-5950","observed_orcids":["https://orcid.org/0009-0006-9868-5950"]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"D. Debarre","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056093927","display_name":"Nguy\u1ec5n H\u1eefu L\u00e2m","orcid":"https://orcid.org/0009-0002-7101-6627","observed_orcids":["https://orcid.org/0009-0002-7101-6627","https://orcid.org/0000-0001-6483-167X"]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Lam H. Nguyen","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111932597","display_name":"Jean-Luc Cercus","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J-L. Cercus","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110093018","display_name":"Catherine Clerc","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I4387152095","display_name":"Centre de Spectrom\u00e9trie Nucl\u00e9aire et de Spectrom\u00e9trie de Masse","ror":"https://ror.org/007wh4e50","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I204730241","https://openalex.org/I277688954","https://openalex.org/I4210133362","https://openalex.org/I4210134832","https://openalex.org/I4387152095"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"C. Clerc","raw_affiliation_strings":["Centre de Spectrometrie nucleaire et Spectrometrie de masse, B\u00e2t 108, Universite Paris-Sud, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre de Spectrometrie nucleaire et Spectrometrie de masse, B\u00e2t 108, Universite Paris-Sud, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I4387152095"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111201168","display_name":"Vy Yam","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"V. Yam","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5107857940","display_name":"S. Laval","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"S. Laval","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025923506","display_name":"\u00c9ric Cassan","orcid":"https://orcid.org/0000-0003-2802-7689","observed_orcids":["https://orcid.org/0000-0003-2802-7689"]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"E. Cassan","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110173869","display_name":"D. Bouchier","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102197404","display_name":"Universit\u00e9 Paris-Sud","ror":"https://ror.org/028rypz17","country_code":"FR","type":"education","lineage":["https://openalex.org/I102197404","https://openalex.org/I277688954"]},{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"D. Bouchier","raw_affiliation_strings":["Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut d\u2019Electronique Fondamentale, B\u00e2t 220, Universite Paris-Sud, CNRS UMR 8622, 91405 Orsay, Cedex, France","institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5079432599"],"corresponding_institution_ids":["https://openalex.org/I102197404","https://openalex.org/I1294671590"],"apc_list":{"value":2610,"currency":"USD","value_usd":2610},"apc_paid":null,"fwci":1.2244,"has_fulltext":false,"cited_by_count":30,"citation_normalized_percentile":{"value":0.76832215,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"27","issue":"5","first_page":"822","last_page":"826"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7080000042915344,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7080000042915344,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.17440000176429749,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.03400000184774399,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/germanium-thin-films","display_name":"germanium thin films","score":0.7350000143051147},{"id":"https://openalex.org/keywords/si-100-substrate","display_name":"Si(100) substrate","score":0.9139999747276306},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.8700000047683716},{"id":"https://openalex.org/keywords/cyclic-annealing","display_name":"cyclic annealing","score":0.8930000066757202},{"id":"https://openalex.org/keywords/threading-dislocation-density","display_name":"threading dislocation density","score":0.8569999933242798},{"id":"https://openalex.org/keywords/interdiffusion","display_name":"interdiffusion","score":0.8980000019073486},{"id":"https://openalex.org/keywords/near-infrared-absorption","display_name":"near-infrared absorption","score":0.7390000224113464},{"id":"https://openalex.org/keywords/epitaxial-growth","display_name":"epitaxial growth","score":0.5580000281333923}],"concepts":[{"id":"https://openalex.org/C2781028716","wikidata":"https://www.wikidata.org/wiki/Q900607","display_name":"Channelling","level":3,"score":0.7723182439804077},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.7290034890174866},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7228129506111145},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6932543516159058},{"id":"https://openalex.org/C550623735","wikidata":"https://www.wikidata.org/wiki/Q867","display_name":"Germanium","level":3,"score":0.5553339719772339},{"id":"https://openalex.org/C2780547777","wikidata":"https://www.wikidata.org/wiki/Q368967","display_name":"Rutherford backscattering spectrometry","level":3,"score":0.5130628347396851},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.4886084198951721},{"id":"https://openalex.org/C32891209","wikidata":"https://www.wikidata.org/wiki/Q483666","display_name":"Spectroscopy","level":2,"score":0.48784685134887695},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.4653381407260895},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.46244603395462036},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.4538886845111847},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.410749614238739},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.30311864614486694},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2548103630542755},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2082333266735077},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.20749154686927795},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11876064538955688},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/j.optmat.2004.08.005","doi":"https://doi.org/10.1016/j.optmat.2004.08.005","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.optmat.2004.08.005","pdf_url":null,"source":{"id":"https://openalex.org/S199247034","display_name":"Optical Materials","issn_l":"0925-3467","issn":["0925-3467","1873-1252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optical Materials","raw_type":"journal-article"},{"id":"pmh:oai:HAL:hal-00020246v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-00020246","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Optical Materials, 2005, 27, pp.822-826. &#x27E8;10.1016/j.optmat.2004.08.005&#x27E9;","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1966846689","https://openalex.org/W1969950458","https://openalex.org/W1978816453","https://openalex.org/W2000999566","https://openalex.org/W2004589402","https://openalex.org/W2023839365","https://openalex.org/W2031976209","https://openalex.org/W2040575594","https://openalex.org/W2043419975","https://openalex.org/W2050978306","https://openalex.org/W2052679694","https://openalex.org/W2072600974","https://openalex.org/W2085878235","https://openalex.org/W2138643547","https://openalex.org/W2153141682","https://openalex.org/W4320805313"],"related_works":["https://openalex.org/W2894750139","https://openalex.org/W2364591967","https://openalex.org/W2060894388","https://openalex.org/W2983175610","https://openalex.org/W1987726999","https://openalex.org/W2293790389","https://openalex.org/W1964899215","https://openalex.org/W2099396591","https://openalex.org/W2000999566","https://openalex.org/W2044795334"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}
