{"id":"https://openalex.org/W2000571303","doi":"https://doi.org/10.1016/s0022-0248(99)00753-8","title":"Multi-step pulling of GaInSb bulk crystal from ternary solution","display_name":"Multi-step pulling of GaInSb bulk crystal from ternary solution","publication_year":2000,"publication_date":"2000-02-01","ids":{"openalex":"https://openalex.org/W2000571303","doi":"https://doi.org/10.1016/s0022-0248(99)00753-8","mag":"2000571303"},"language":"en","primary_location":{"id":"doi:10.1016/s0022-0248(99)00753-8","doi":"https://doi.org/10.1016/s0022-0248(99)00753-8","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0022-0248(99)00753-8","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111870505","display_name":"Akira Tanaka","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1298590031","display_name":"Shizuoka University","ror":"https://ror.org/01w6wtk13","country_code":"JP","type":"education","lineage":["https://openalex.org/I1298590031"]},{"id":"https://openalex.org/I4405287265","display_name":"Research Institute of Electronics, Shizuoka University","ror":"https://ror.org/04mdx9d04","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Akira Tanaka","raw_affiliation_strings":["Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan","institution_ids":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068141228","display_name":"Jun Shintani","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1298590031","display_name":"Shizuoka University","ror":"https://ror.org/01w6wtk13","country_code":"JP","type":"education","lineage":["https://openalex.org/I1298590031"]},{"id":"https://openalex.org/I4405287265","display_name":"Research Institute of Electronics, Shizuoka University","ror":"https://ror.org/04mdx9d04","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Jun Shintani","raw_affiliation_strings":["Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan","institution_ids":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110170646","display_name":"Masakazu Kimura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1298590031","display_name":"Shizuoka University","ror":"https://ror.org/01w6wtk13","country_code":"JP","type":"education","lineage":["https://openalex.org/I1298590031"]},{"id":"https://openalex.org/I4405287265","display_name":"Research Institute of Electronics, Shizuoka University","ror":"https://ror.org/04mdx9d04","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masakazu Kimura","raw_affiliation_strings":["Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan","institution_ids":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113585817","display_name":"Tokuzo Sukegawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1298590031","display_name":"Shizuoka University","ror":"https://ror.org/01w6wtk13","country_code":"JP","type":"education","lineage":["https://openalex.org/I1298590031"]},{"id":"https://openalex.org/I4405287265","display_name":"Research Institute of Electronics, Shizuoka University","ror":"https://ror.org/04mdx9d04","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tokuzo Sukegawa","raw_affiliation_strings":["Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan","institution_ids":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5111870505"],"corresponding_institution_ids":["https://openalex.org/I1298590031","https://openalex.org/I4405287265"],"apc_list":{"value":3110,"currency":"USD","value_usd":3110},"apc_paid":null,"fwci":0.7957,"has_fulltext":false,"cited_by_count":23,"citation_normalized_percentile":{"value":0.68437555,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"209","issue":"4","first_page":"625","last_page":"629"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11087","display_name":"Solidification and crystal growth phenomena","score":0.8848000168800354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11087","display_name":"Solidification and crystal growth phenomena","score":0.8848000168800354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.07880000025033951,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14128","display_name":"Metallurgical and Alloy Processes","score":0.009399999864399433,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/czochralski-growth","display_name":"Czochralski crystal growth","score":0.7879999876022339},{"id":"https://openalex.org/keywords/ternary-solutions","display_name":"ternary solutions","score":0.7480000257492065},{"id":"https://openalex.org/keywords/single-crystal-growth","display_name":"single crystal growth","score":0.777999997138977},{"id":"https://openalex.org/keywords/etch-pit-density","display_name":"etch pit density","score":0.875},{"id":"https://openalex.org/keywords/bulk-crystal-growth","display_name":"bulk crystal growth","score":0.4410000145435333}],"concepts":[{"id":"https://openalex.org/C36591836","wikidata":"https://www.wikidata.org/wiki/Q125264","display_name":"Mole fraction","level":2,"score":0.8992626667022705},{"id":"https://openalex.org/C2780026712","wikidata":"https://www.wikidata.org/wiki/Q37756","display_name":"Alloy","level":2,"score":0.8322712182998657},{"id":"https://openalex.org/C64452783","wikidata":"https://www.wikidata.org/wiki/Q1524945","display_name":"Ternary operation","level":2,"score":0.6865274906158447},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6030317544937134},{"id":"https://openalex.org/C149629883","wikidata":"https://www.wikidata.org/wiki/Q660926","display_name":"Fraction (chemistry)","level":2,"score":0.5730093121528625},{"id":"https://openalex.org/C2781285689","wikidata":"https://www.wikidata.org/wiki/Q21921428","display_name":"Crystal (programming language)","level":2,"score":0.5440986156463623},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5259727835655212},{"id":"https://openalex.org/C2992786965","wikidata":"https://www.wikidata.org/wiki/Q37756","display_name":"Ternary alloy","level":3,"score":0.4938991665840149},{"id":"https://openalex.org/C26456737","wikidata":"https://www.wikidata.org/wiki/Q185154","display_name":"Crystal growth","level":2,"score":0.4562685191631317},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.44575735926628113},{"id":"https://openalex.org/C104169306","wikidata":"https://www.wikidata.org/wiki/Q899429","display_name":"Seed crystal","level":3,"score":0.44219517707824707},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.42127835750579834},{"id":"https://openalex.org/C73922627","wikidata":"https://www.wikidata.org/wiki/Q754943","display_name":"Single crystal","level":2,"score":0.32509374618530273},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.29765036702156067},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.19898176193237305},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1512594223022461},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.10940933227539062},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.1007881760597229},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0432966947555542},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0022-0248(99)00753-8","doi":"https://doi.org/10.1016/s0022-0248(99)00753-8","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0022-0248(99)00753-8","pdf_url":null,"source":{"id":"https://openalex.org/S10719676","display_name":"Journal of Crystal Growth","issn_l":"0022-0248","issn":["0022-0248","1873-5002"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Crystal Growth","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W2000941066","https://openalex.org/W2016942196","https://openalex.org/W2030268695","https://openalex.org/W2061916674","https://openalex.org/W2078488034","https://openalex.org/W2086983170"],"related_works":["https://openalex.org/W2016942196","https://openalex.org/W2030268695","https://openalex.org/W6886194432","https://openalex.org/W1969088810","https://openalex.org/W2069802416","https://openalex.org/W2061916674","https://openalex.org/W1984988768","https://openalex.org/W1977413001","https://openalex.org/W2009197138","https://openalex.org/W2012301568"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}
