{"id":"https://openalex.org/W2000520963","doi":"https://doi.org/10.2494/photopolymer.19.547","title":"Characteristics of ArF Immersion Lithography Using Topcoat","display_name":"Characteristics of ArF Immersion Lithography Using Topcoat","publication_year":2006,"publication_date":"2006-01-01","ids":{"openalex":"https://openalex.org/W2000520963","doi":"https://doi.org/10.2494/photopolymer.19.547","mag":"2000520963"},"language":"en","primary_location":{"id":"doi:10.2494/photopolymer.19.547","doi":"https://doi.org/10.2494/photopolymer.19.547","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.19.547","pdf_url":null,"source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://doi.org/10.2494/photopolymer.19.547","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113560245","display_name":"Takeo Ishibashi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeo Ishibashi","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108207471","display_name":"Tetsuro Hanawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuro Hanawa","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079288633","display_name":"Tsohifumi Suganaga","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tsohifumi Suganaga","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003337370","display_name":"Shinroku Maejima","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinroku Maejima","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059204095","display_name":"Koichiro Narimatsu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Koichiro Narimatsu","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024358490","display_name":"Kazuyuki Suko","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuyuki Suko","raw_affiliation_strings":["Renesas Technology Corp","Renesas Tech. Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Renesas Technology Corp","institution_ids":["https://openalex.org/I4210153176"]},{"raw_affiliation_string":"Renesas Tech. Corp","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031807557","display_name":"Mamoru Terai","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mamoru Terai","raw_affiliation_strings":["Mitsubishi Electric Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mitsubishi Electric Corp","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014248453","display_name":"Teruhiko Kumada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Teruhiko Kumada","raw_affiliation_strings":["Mitsubishi Electric Corp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mitsubishi Electric Corp","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111759211","display_name":"Tomoyuki Ando","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210097131","display_name":"Tokyo Ohka Kogyo (Japan)","ror":"https://ror.org/00zrr9158","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210097131"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tomoyuki Ando","raw_affiliation_strings":["Tokyo Ohka Kogyo Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Ohka Kogyo Co., Ltd","institution_ids":["https://openalex.org/I4210097131"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.3281,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.65748227,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"19","issue":"4","first_page":"547","last_page":"554"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/arf-immersion-lithography","display_name":"ArF immersion lithography","score":0.9980000257492065},{"id":"https://openalex.org/keywords/topcoat","display_name":"top coat","score":0.9470000267028809},{"id":"https://openalex.org/keywords/optical-proximity-effect","display_name":"optical proximity effect","score":0.9739999771118164},{"id":"https://openalex.org/keywords/baking-conditions","display_name":"baking conditions","score":0.7770000100135803},{"id":"https://openalex.org/keywords/exposure-conditions","display_name":"exposure conditions","score":0.6710000038146973}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9403913021087646},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8495128750801086},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.8336789011955261},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8008403182029724},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5547084212303162},{"id":"https://openalex.org/C199068039","wikidata":"https://www.wikidata.org/wiki/Q574523","display_name":"Immersion (mathematics)","level":2,"score":0.458586186170578},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.4529028832912445},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4111037254333496},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3803001344203949},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.31637483835220337},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3161923289299011},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.09959566593170166},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.08721256256103516},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2494/photopolymer.19.547","doi":"https://doi.org/10.2494/photopolymer.19.547","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.19.547","pdf_url":null,"source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2494/photopolymer.19.547","doi":"https://doi.org/10.2494/photopolymer.19.547","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.19.547","pdf_url":null,"source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":4,"referenced_works":["https://openalex.org/W1970734331","https://openalex.org/W2036035074","https://openalex.org/W2058769068","https://openalex.org/W2087233941"],"related_works":["https://openalex.org/W2006403989","https://openalex.org/W1999981161","https://openalex.org/W1984252119","https://openalex.org/W2069615034","https://openalex.org/W1964724028","https://openalex.org/W1973061538","https://openalex.org/W1731524657","https://openalex.org/W2084561585","https://openalex.org/W2083391300","https://openalex.org/W2013368516"],"abstract_inverted_index":{"This":[0],"paper":[1],"is":[2],"intended":[3],"as":[4],"investigations":[5],"of":[6,10,30,35,65,72,83,93,100,141,178],"two":[7],"interesting":[8],"characteristics":[9,92],"ArF":[11],"immersion":[12,59],"lithography":[13,60],"using":[14],"topcoat":[15],"(TC).":[16],"On":[17,45],"the":[18,31,36,46,52,63,81,88,94,98,113,116,139,142,168],"one":[19],"hand,":[20,48],"we":[21,49],"identified":[22],"several":[23],"hundreds":[24],"gel-type":[25,174],"defects":[26],"over":[27],"large":[28],"areas":[29],"unexposed":[32],"top":[33],"surface":[34],"resist":[37,114,143],"in":[38,58,80],"cases":[39],"where":[40],"a":[41],"TC":[42,66,95,117,157],"was":[43,74,118],"used.":[44],"other":[47],"observed":[50],"that":[51],"optical":[53],"proximity":[54],"effect":[55],"(OPE)":[56],"profiles":[57],"varied":[61],"with":[62,125],"type":[64],"materials":[67],"beyond":[68],"expectation.":[69],"The":[70,107,156],"magnitude":[71],"OPE":[73,179],"reduced":[75],"to":[76,167,172],"approximately":[77],"20":[78],"nm":[79],"region":[82],"maximum":[84],"influence.":[85],"We":[86,146],"investigated":[87],"influences":[89],"on":[90,138],"these":[91],"material":[96,158],"and":[97,105,115,132,135,144,153,159,176],"methods":[99],"application":[101],"(i.e.":[102],"baking":[103],"conditions":[104],"exposure).":[106],"chemical":[108,154,169],"interaction":[109,170],"(e.g.,":[110],"mixing)":[111],"between":[112,150],"examined":[119],"by":[120,136],"employing":[121],"time-of-flight":[122],"mass":[123],"spectrometry":[124],"gradient":[126],"shaving":[127],"preparation":[128],"(GSP":[129],"+":[130],"TOF)":[131],"FT-IR":[133],"measurements":[134],"focusing":[137],"interface":[140],"TC.":[145],"confirmed":[147],"consistent":[148],"correlations":[149],"lithographic":[151],"properties":[152],"interaction.":[155],"process":[160],"which":[161],"form":[162],"much":[163],"mixing":[164],"layer":[165],"due":[166],"tended":[171],"cause":[173],"defect":[175],"variation":[177],"profile.":[180]},"counts_by_year":[],"updated_date":"2026-08-01T09:00:35.917206","created_date":"2016-06-24T00:00:00"}