{"id":"https://openalex.org/W2000381128","doi":"https://doi.org/10.1016/j.mee.2004.07.046","title":"Line resistance behaviour in narrow lines patterned by a TiN hard mask spacer for 45 nm node interconnects","display_name":"Line resistance behaviour in narrow lines patterned by a TiN hard mask spacer for 45 nm node interconnects","publication_year":2004,"publication_date":"2004-08-14","ids":{"openalex":"https://openalex.org/W2000381128","doi":"https://doi.org/10.1016/j.mee.2004.07.046","mag":"2000381128"},"language":"en","primary_location":{"id":"doi:10.1016/j.mee.2004.07.046","doi":"https://doi.org/10.1016/j.mee.2004.07.046","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2004.07.046","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5057120881","display_name":"Wim F. A. Besling","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165709","display_name":"Philips (France)","ror":"https://ror.org/05jz46060","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210122849","https://openalex.org/I4210165709"]}],"countries":["FR"],"is_corresponding":true,"raw_author_name":"W.F.A. Besling","raw_affiliation_strings":["Philips Semiconductors Crolles R&D, 860 Rue Jean Monnet, 38920 Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Semiconductors Crolles R&D, 860 Rue Jean Monnet, 38920 Crolles, France","institution_ids":["https://openalex.org/I4210165709"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031148101","display_name":"Marcel Broekaart","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165709","display_name":"Philips (France)","ror":"https://ror.org/05jz46060","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210122849","https://openalex.org/I4210165709"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Broekaart","raw_affiliation_strings":["Philips Semiconductors Crolles R&D, 860 Rue Jean Monnet, 38920 Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Semiconductors Crolles R&D, 860 Rue Jean Monnet, 38920 Crolles, France","institution_ids":["https://openalex.org/I4210165709"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044148491","display_name":"V. Arnal","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"V. Arnal","raw_affiliation_strings":["STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5029897141","display_name":"Jes\u00fas Guzm\u00e1n-Torres","orcid":"https://orcid.org/0000-0002-4838-8492","observed_orcids":["https://orcid.org/0000-0002-4838-8492"]},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Torres","raw_affiliation_strings":["STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5057120881"],"corresponding_institution_ids":["https://openalex.org/I4210165709"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":0.7979,"has_fulltext":false,"cited_by_count":15,"citation_normalized_percentile":{"value":0.67901235,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"76","issue":"1-4","first_page":"167","last_page":"174"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/line-resistance","display_name":"line resistance","score":0.7580000162124634},{"id":"https://openalex.org/keywords/copper-damascene","display_name":"copper damascene","score":0.8209999799728394},{"id":"https://openalex.org/keywords/porous-low-k-dielectrics","display_name":"porous low-k dielectrics","score":0.9139999747276306},{"id":"https://openalex.org/keywords/grain-boundary-scattering","display_name":"grain boundary scattering","score":0.9129999876022339},{"id":"https://openalex.org/keywords/surface-scattering","display_name":"surface scattering","score":0.7020000219345093},{"id":"https://openalex.org/keywords/45-nm-technology-node","display_name":"45 nm node","score":0.75},{"id":"https://openalex.org/keywords/interconnect-metallization","display_name":"interconnect metallization","score":0.5879999995231628}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7971000671386719},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.7231424450874329},{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.6667337417602539},{"id":"https://openalex.org/C116372231","wikidata":"https://www.wikidata.org/wiki/Q605757","display_name":"Copper interconnect","level":3,"score":0.6364437937736511},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.5738083124160767},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.5678842067718506},{"id":"https://openalex.org/C123745756","wikidata":"https://www.wikidata.org/wiki/Q1665949","display_name":"Interconnection","level":2,"score":0.4707620441913605},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.46932289004325867},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.44011321663856506},{"id":"https://openalex.org/C192191005","wikidata":"https://www.wikidata.org/wiki/Q466491","display_name":"Grain size","level":2,"score":0.41952741146087646},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3924503028392792},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3267378807067871},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13689547777175903},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.10210791230201721},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C31258907","wikidata":"https://www.wikidata.org/wiki/Q1301371","display_name":"Computer network","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.mee.2004.07.046","doi":"https://doi.org/10.1016/j.mee.2004.07.046","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.mee.2004.07.046","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1990989521","https://openalex.org/W2069377610","https://openalex.org/W2084762888","https://openalex.org/W2129994575","https://openalex.org/W2142135079"],"related_works":["https://openalex.org/W2091838795","https://openalex.org/W1986433077","https://openalex.org/W1491803091","https://openalex.org/W2127005713","https://openalex.org/W2148052582","https://openalex.org/W2333891276","https://openalex.org/W1539394523","https://openalex.org/W3088011598","https://openalex.org/W1501165253","https://openalex.org/W1993593882"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}