{"id":"https://openalex.org/W2000326211","doi":"https://doi.org/10.1116/1.590604","title":"Atom-by-atom analysis of microtip emitter surfaces by the scanning atom probe","display_name":"Atom-by-atom analysis of microtip emitter surfaces by the scanning atom probe","publication_year":1999,"publication_date":"1999-03-01","ids":{"openalex":"https://openalex.org/W2000326211","doi":"https://doi.org/10.1116/1.590604","mag":"2000326211"},"language":"en","primary_location":{"id":"doi:10.1116/1.590604","doi":"https://doi.org/10.1116/1.590604","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.590604","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5084119648","display_name":"Osamu Nishikawa","orcid":"https://orcid.org/0000-0002-8062-4993","observed_orcids":["https://orcid.org/0000-0002-8062-4993"]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"O. Nishikawa","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057511184","display_name":"Masafumi Watanabe","orcid":"https://orcid.org/0000-0003-4133-5440","observed_orcids":["https://orcid.org/0000-0003-4133-5440"]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Watanabe","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111463737","display_name":"Yuusuke Ohtani","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Ohtani","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102843208","display_name":"Kazuki Maeda","orcid":"https://orcid.org/0000-0003-4652-1541","observed_orcids":["https://orcid.org/0000-0003-4652-1541"]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Maeda","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025748633","display_name":"Keiji Tanaka","orcid":"https://orcid.org/0000-0002-1910-3427","observed_orcids":["https://orcid.org/0000-0002-1910-3427"]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Tanaka","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055342534","display_name":"Takahiro Sekine","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I125852741","display_name":"Kanazawa Institute of Technology","ror":"https://ror.org/02ws33e43","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Sekine","raw_affiliation_strings":["Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Sciences and Engineering, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa\u2009921-8501, Japan","institution_ids":["https://openalex.org/I125852741"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111805581","display_name":"J. Itoh","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J. Itoh","raw_affiliation_strings":["Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba\u2009305-0045, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba\u2009305-0045, Japan","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":4.9792,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.94053601,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"17","issue":"2","first_page":"608","last_page":"612"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","score":0.9926999807357788,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","score":0.9926999807357788,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.002899999963119626,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cvd-diamond","display_name":"CVD diamond","score":0.8700000047683716},{"id":"https://openalex.org/keywords/surface-composition","display_name":"surface composition","score":0.4449999928474426},{"id":"https://openalex.org/keywords/depth-profiling","display_name":"depth profiling","score":0.6769999861717224},{"id":"https://openalex.org/keywords/carbon-contamination","display_name":"carbon contamination","score":0.6460000276565552},{"id":"https://openalex.org/keywords/dry-etching","display_name":"dry etching","score":0.7379999756813049},{"id":"https://openalex.org/keywords/hydrofluoric-acid-treatment","display_name":"hydrofluoric acid treatment","score":0.8240000009536743},{"id":"https://openalex.org/keywords/hydrogen-desorption","display_name":"hydrogen desorption","score":0.6610000133514404},{"id":"https://openalex.org/keywords/methane-adsorption","display_name":"methane adsorption","score":0.9129999876022339},{"id":"https://openalex.org/keywords/activation-energy","display_name":"activation energy","score":0.7279999852180481}],"concepts":[{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6178116798400879},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6116087436676025},{"id":"https://openalex.org/C140205800","wikidata":"https://www.wikidata.org/wiki/Q5860","display_name":"Carbon fibers","level":3,"score":0.5911466479301453},{"id":"https://openalex.org/C512968161","wikidata":"https://www.wikidata.org/wiki/Q556","display_name":"Hydrogen","level":2,"score":0.5548096895217896},{"id":"https://openalex.org/C150394285","wikidata":"https://www.wikidata.org/wiki/Q180254","display_name":"Adsorption","level":2,"score":0.5454365611076355},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5451414585113525},{"id":"https://openalex.org/C58312451","wikidata":"https://www.wikidata.org/wiki/Q4817200","display_name":"Atom (system on chip)","level":2,"score":0.5321727395057678},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5199131369590759},{"id":"https://openalex.org/C162711632","wikidata":"https://www.wikidata.org/wiki/Q905514","display_name":"Desorption","level":3,"score":0.5155813097953796},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.4698955714702606},{"id":"https://openalex.org/C516920438","wikidata":"https://www.wikidata.org/wiki/Q37129","display_name":"Methane","level":2,"score":0.46479979157447815},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.4462943971157074},{"id":"https://openalex.org/C16876290","wikidata":"https://www.wikidata.org/wiki/Q757649","display_name":"Atom probe","level":3,"score":0.4417332112789154},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.3939242959022522},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3315184414386749},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2696889042854309},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.12228798866271973},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.1134057343006134},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.06696847081184387},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.06512823700904846},{"id":"https://openalex.org/C104779481","wikidata":"https://www.wikidata.org/wiki/Q50707","display_name":"Composite number","level":2,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.590604","doi":"https://doi.org/10.1116/1.590604","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.590604","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1998286181","https://openalex.org/W2020284575","https://openalex.org/W2060918471","https://openalex.org/W2075850162","https://openalex.org/W2082796661","https://openalex.org/W2141851584"],"related_works":["https://openalex.org/W1992900927","https://openalex.org/W1518174937","https://openalex.org/W1995396741","https://openalex.org/W2321929153","https://openalex.org/W2272284099","https://openalex.org/W1988149565","https://openalex.org/W2032107965","https://openalex.org/W2141851584","https://openalex.org/W2044266707","https://openalex.org/W2995505873"],"abstract_inverted_index":{"Unique":[0],"capabilities":[1],"of":[2,25,33,46,63,93,100,113,132],"the":[3,18,22,51,60,64,74,84,90,98,104,108,114,121,130,136,139,149,156,161,165],"scanning":[4],"atom":[5],"probe,":[6],"atomically":[7],"high":[8,70,152],"resolution":[9],"and":[10,30,48,50,57,87,173],"atom-by-atom":[11],"mass":[12],"analysis,":[13],"were":[14],"utilized":[15],"to":[16,79,89,127,160],"investigate":[17],"compositional":[19],"distribution":[20],"in":[21,120,155],"individual":[23],"apexes":[24],"a":[26,43],"silicon":[27,40],"microtip":[28,115],"array":[29],"fine":[31],"grains":[32],"chemical":[34],"vapor":[35],"deposition":[36],"diamonds.":[37],"The":[38,117,151],"dry-etched":[39,75],"tips":[41,53],"contain":[42,54],"large":[44,162],"amount":[45],"carbon":[47,61,105,118],"hydrogen":[49,153,169],"HF-treated":[52,122],"even":[55],"oxygen":[56,140],"fluorine.":[58],"Although":[59],"concentration":[62,92,119,141,154],"uppermost":[65],"surface":[66],"layer":[67,86],"is":[68,158],"as":[69,71],"50%":[72],"for":[73,83,168,174],"tip,":[76],"it":[77],"decreases":[78,124],"less":[80,94],"than":[81,95],"10%":[82],"second":[85],"approaches":[88],"constant":[91,144],"2%":[96],"at":[97,129,145],"depth":[99,131],"20":[101],"nm":[102],"suggesting":[103],"intermixture":[106],"during":[107],"fabrication":[109],"and/or":[110],"etching":[111],"process":[112],"array.":[116],"tip":[123],"from":[125],"18%":[126],"8%":[128],"30":[133],"nm.":[134],"On":[135],"other":[137],"hand,":[138],"stays":[142],"fairly":[143],"around":[146],"25%":[147],"throughout":[148],"analysis.":[150],"diamonds":[157],"attributed":[159],"difference":[163],"between":[164],"activation":[166],"energies":[167],"desorption,":[170],"21":[171],"kcal/mol,":[172],"methane":[175],"adsorption,":[176],"7.3":[177],"kcal/mol.":[178]},"counts_by_year":[{"year":2014,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}