{"id":"https://openalex.org/W2000310186","doi":"https://doi.org/10.1016/j.tsf.2004.06.145","title":"Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of \u03b2-FeSi2 optoelectronic devices","display_name":"Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of \u03b2-FeSi2 optoelectronic devices","publication_year":2005,"publication_date":"2005-01-06","ids":{"openalex":"https://openalex.org/W2000310186","doi":"https://doi.org/10.1016/j.tsf.2004.06.145","mag":"2000310186"},"language":"en","primary_location":{"id":"doi:10.1016/j.tsf.2004.06.145","doi":"https://doi.org/10.1016/j.tsf.2004.06.145","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2004.06.145","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5031642679","display_name":"Teruhisa Ootsuka","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Teruhisa Ootsuka","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]},{"raw_affiliation_string":"Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Zhengxin Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Zhengxin Liu","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]},{"raw_affiliation_string":"Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052122123","display_name":"Masato Osamura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masato Osamura","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]},{"raw_affiliation_string":"Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008123459","display_name":"Yasuhiro Fukuzawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuhiro Fukuzawa","raw_affiliation_strings":["Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I4210086780","https://openalex.org/I73613424"]},{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Ryo Kuroda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I95053508","display_name":"Nippon Institute of Technology","ror":"https://ror.org/05h68bp56","country_code":"JP","type":"education","lineage":["https://openalex.org/I95053508"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Ryo Kuroda","raw_affiliation_strings":["Nippon Institute of Technology (NIT), Minami-saitamagun, Saitama 345-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nippon Institute of Technology (NIT), Minami-saitamagun, Saitama 345-8501, Japan","institution_ids":["https://openalex.org/I95053508"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062213262","display_name":"Yasuhito Suzuki","orcid":"https://orcid.org/0000-0002-5177-4079","observed_orcids":["https://orcid.org/0000-0002-5177-4079"]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuhito Suzuki","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]},{"raw_affiliation_string":"Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008833426","display_name":"Naotaka Otogawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Naotaka Otogawa","raw_affiliation_strings":["Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I4210086780","https://openalex.org/I73613424"]},{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007540333","display_name":"Takahiro Mise","orcid":"https://orcid.org/0000-0002-2469-0187","observed_orcids":["https://orcid.org/0000-0002-2469-0187"]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takahiro Mise","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]},{"raw_affiliation_string":"Technology Development, System Engineers' Co., Ltd., AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027851972","display_name":"Shinan Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinan Wang","raw_affiliation_strings":["Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I4210086780","https://openalex.org/I73613424"]},{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056012556","display_name":"Yasushi Hoshino","orcid":"https://orcid.org/0000-0003-1932-6505","observed_orcids":["https://orcid.org/0000-0003-1932-6505"]},"institutions":[{"id":"https://openalex.org/I95053508","display_name":"Nippon Institute of Technology","ror":"https://ror.org/05h68bp56","country_code":"JP","type":"education","lineage":["https://openalex.org/I95053508"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasushi Hoshino","raw_affiliation_strings":["Nippon Institute of Technology (NIT), Minami-saitamagun, Saitama 345-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nippon Institute of Technology (NIT), Minami-saitamagun, Saitama 345-8501, Japan","institution_ids":["https://openalex.org/I95053508"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064409614","display_name":"Yasuhiko Nakayama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuhiko Nakayama","raw_affiliation_strings":["Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I4210086780","https://openalex.org/I73613424"]},{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111598182","display_name":"H. Tanoue","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hisao Tanoue","raw_affiliation_strings":["National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113603768","display_name":"Yunosuke Makita","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yunosuke Makita","raw_affiliation_strings":["Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Japan Science and Technology Corporation (JST), AIST Tsukuba West, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan","institution_ids":["https://openalex.org/I4210086780","https://openalex.org/I73613424"]},{"raw_affiliation_string":"National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, Ibaraki 305-8568, Japan","institution_ids":["https://openalex.org/I73613424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5031642679"],"corresponding_institution_ids":["https://openalex.org/I73613424"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":1.8301,"has_fulltext":false,"cited_by_count":63,"citation_normalized_percentile":{"value":0.83454044,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":"476","issue":"1","first_page":"30","last_page":"34"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9423999786376953,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9423999786376953,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.022199999541044235,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.01889999955892563,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/aluminum-doped-zinc-oxide","display_name":"Al-doped ZnO","score":0.8809999823570251},{"id":"https://openalex.org/keywords/transparent-electrodes","display_name":"transparent electrodes","score":0.7680000066757202},{"id":"https://openalex.org/keywords/antireflection-coatings","display_name":"antireflection coatings","score":0.9829999804496765},{"id":"https://openalex.org/keywords/beta-fesi2","display_name":"\u03b2-FeSi2","score":0.890999972820282},{"id":"https://openalex.org/keywords/thin-films","display_name":"thin films","score":0.5090000033378601},{"id":"https://openalex.org/keywords/optoelectronic-devices","display_name":"optoelectronic devices","score":0.8550000190734863},{"id":"https://openalex.org/keywords/sputtering","display_name":"sputtering","score":0.7179999947547913},{"id":"https://openalex.org/keywords/electrical-conductivity","display_name":"electrical conductivity","score":0.7879999876022339},{"id":"https://openalex.org/keywords/optical-transmittance","display_name":"optical transmittance","score":0.9169999957084656},{"id":"https://openalex.org/keywords/ohmic-contacts","display_name":"ohmic contacts","score":0.7699999809265137},{"id":"https://openalex.org/keywords/substrate-temperature","display_name":"substrate temperature","score":0.6639999747276306},{"id":"https://openalex.org/keywords/sputtering-rate","display_name":"sputtering rate","score":0.7639999985694885},{"id":"https://openalex.org/keywords/antireflection","display_name":"antireflection","score":0.4970000088214874}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.822284460067749},{"id":"https://openalex.org/C138230450","wikidata":"https://www.wikidata.org/wiki/Q2016597","display_name":"Ohmic contact","level":3,"score":0.7038013935089111},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6756229400634766},{"id":"https://openalex.org/C150493377","wikidata":"https://www.wikidata.org/wiki/Q1427863","display_name":"Transmittance","level":2,"score":0.6542381048202515},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.6518692374229431},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6345337629318237},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5911079049110413},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.5455062985420227},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5224705934524536},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5165973901748657},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.4662085473537445},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.4144354462623596},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3967817425727844},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.16981381177902222},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.15362292528152466},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.13518282771110535},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.06590965390205383},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.tsf.2004.06.145","doi":"https://doi.org/10.1016/j.tsf.2004.06.145","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2004.06.145","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W1973006222","https://openalex.org/W1975004576","https://openalex.org/W1983542408","https://openalex.org/W2008602321","https://openalex.org/W2016375629","https://openalex.org/W2040594786","https://openalex.org/W2047496602","https://openalex.org/W2050460433","https://openalex.org/W2074929554","https://openalex.org/W2078247447","https://openalex.org/W2122416328"],"related_works":["https://openalex.org/W4223588802","https://openalex.org/W2083563119","https://openalex.org/W2435430648","https://openalex.org/W2320520245","https://openalex.org/W2047472257","https://openalex.org/W1983183770","https://openalex.org/W2345344803","https://openalex.org/W2795353487","https://openalex.org/W4406264751","https://openalex.org/W2092032334"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":5},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":5},{"year":2017,"cited_by_count":6},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":7},{"year":2013,"cited_by_count":8},{"year":2012,"cited_by_count":5}],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}