{"id":"https://openalex.org/W2000306608","doi":"https://doi.org/10.1016/j.surfcoat.2006.07.197","title":"Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering","display_name":"Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering","publication_year":2006,"publication_date":"2006-08-18","ids":{"openalex":"https://openalex.org/W2000306608","doi":"https://doi.org/10.1016/j.surfcoat.2006.07.197","mag":"2000306608"},"language":"en","primary_location":{"id":"doi:10.1016/j.surfcoat.2006.07.197","doi":"https://doi.org/10.1016/j.surfcoat.2006.07.197","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2006.07.197","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Peng Gao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Peng Gao","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102981658","display_name":"Jun Xu","orcid":"https://orcid.org/0000-0003-0557-6474","observed_orcids":["https://orcid.org/0000-0003-0557-6474"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Jun Xu","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030630982","display_name":"Yong Piao","orcid":"https://orcid.org/0000-0001-8605-0292","observed_orcids":["https://orcid.org/0000-0001-8605-0292"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yong Piao","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044594710","display_name":"Wanyu Ding","orcid":"https://orcid.org/0000-0002-1186-204X","observed_orcids":["https://orcid.org/0000-0002-1186-204X"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wanyu Ding","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040765770","display_name":"Dehe Wang","orcid":"https://orcid.org/0000-0001-6073-2295","observed_orcids":["https://orcid.org/0000-0001-6073-2295"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Dehe Wang","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110734170","display_name":"Xinlu Deng","orcid":"https://orcid.org/0009-0002-3977-7522","observed_orcids":["https://orcid.org/0009-0002-3977-7522"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xinlu Deng","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100319435","display_name":"Chuang Dong","orcid":"https://orcid.org/0000-0001-5631-9641","observed_orcids":["https://orcid.org/0000-0001-5631-9641"]},"institutions":[{"id":"https://openalex.org/I27357992","display_name":"Dalian University of Technology","ror":"https://ror.org/023hj5876","country_code":"CN","type":"education","lineage":["https://openalex.org/I27357992"]},{"id":"https://openalex.org/I4405271909","display_name":"Key Laboratory of Materials Modification by Laser, Ion and Electron Beams","ror":"https://ror.org/038beqt86","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405271909"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Chuang Dong","raw_affiliation_strings":["State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China","institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5102981658"],"corresponding_institution_ids":["https://openalex.org/I27357992","https://openalex.org/I4405271909"],"apc_list":{"value":3880,"currency":"USD","value_usd":3880},"apc_paid":null,"fwci":3.3584,"has_fulltext":false,"cited_by_count":49,"citation_normalized_percentile":{"value":0.89896742,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":99},"biblio":{"volume":"201","issue":"9-11","first_page":"5298","last_page":"5301"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9771000146865845,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9771000146865845,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.006300000008195639,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.003100000089034438,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/unbalanced-magnetron-sputtering","display_name":"unbalanced magnetron sputtering","score":0.9769999980926514},{"id":"https://openalex.org/keywords/optical-transmittance","display_name":"optical transmittance","score":0.8140000104904175},{"id":"https://openalex.org/keywords/optical-band-gap","display_name":"optical band gap","score":0.9890000224113464},{"id":"https://openalex.org/keywords/hardness","display_name":"hardness","score":0.6650000214576721},{"id":"https://openalex.org/keywords/mechanical-properties","display_name":"mechanical properties","score":0.7749999761581421},{"id":"https://openalex.org/keywords/optical-properties","display_name":"optical properties","score":0.6240000128746033}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8617867231369019},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.7604351043701172},{"id":"https://openalex.org/C2777492770","wikidata":"https://www.wikidata.org/wiki/Q5037986","display_name":"Carbon nitride","level":4,"score":0.6987206935882568},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.6636301875114441},{"id":"https://openalex.org/C75937256","wikidata":"https://www.wikidata.org/wiki/Q1440781","display_name":"Carbon film","level":3,"score":0.663208544254303},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.6629699468612671},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5663982629776001},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.5313684940338135},{"id":"https://openalex.org/C2779698641","wikidata":"https://www.wikidata.org/wiki/Q5309","display_name":"Graphite","level":2,"score":0.4841912090778351},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.4292118549346924},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.41128382086753845},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.19780543446540833},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1692071259021759},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.1528591811656952},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.1517810821533203},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.15014714002609253},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.06241607666015625},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.04878756403923035},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.0},{"id":"https://openalex.org/C65165184","wikidata":"https://www.wikidata.org/wiki/Q218831","display_name":"Photocatalysis","level":3,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.surfcoat.2006.07.197","doi":"https://doi.org/10.1016/j.surfcoat.2006.07.197","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2006.07.197","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1556373251","https://openalex.org/W1557681670","https://openalex.org/W1966777716","https://openalex.org/W1970288708","https://openalex.org/W1975852195","https://openalex.org/W1988944904","https://openalex.org/W1993165025","https://openalex.org/W1994059431","https://openalex.org/W1994104052","https://openalex.org/W2006873701","https://openalex.org/W2007665377","https://openalex.org/W2019757775","https://openalex.org/W2035993889","https://openalex.org/W2037162059","https://openalex.org/W2038015091","https://openalex.org/W2046590036","https://openalex.org/W2047305545","https://openalex.org/W2048352079","https://openalex.org/W2053956392","https://openalex.org/W2057287132","https://openalex.org/W2072111910","https://openalex.org/W2092332261","https://openalex.org/W2099067448","https://openalex.org/W2118458820","https://openalex.org/W2222969906"],"related_works":["https://openalex.org/W2349013399","https://openalex.org/W2054870223","https://openalex.org/W2141025632","https://openalex.org/W2089700301","https://openalex.org/W2100082525","https://openalex.org/W1994565424","https://openalex.org/W3023415171","https://openalex.org/W2751057843","https://openalex.org/W1980326898","https://openalex.org/W2325342276"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":5},{"year":2017,"cited_by_count":7},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":4},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}