{"id":"https://openalex.org/W1999045362","doi":"https://doi.org/10.1088/0960-1317/19/9/095010","title":"Dry etching of polydimethylsiloxane using microwave plasma","display_name":"Dry etching of polydimethylsiloxane using microwave plasma","publication_year":2009,"publication_date":"2009-08-24","ids":{"openalex":"https://openalex.org/W1999045362","doi":"https://doi.org/10.1088/0960-1317/19/9/095010","mag":"1999045362"},"language":"en","primary_location":{"id":"doi:10.1088/0960-1317/19/9/095010","doi":"https://doi.org/10.1088/0960-1317/19/9/095010","is_oa":true,"landing_page_url":"https://doi.org/10.1088/0960-1317/19/9/095010","pdf_url":"https://iopscience.iop.org/article/10.1088/0960-1317/19/9/095010/pdf","source":{"id":"https://openalex.org/S170809390","display_name":"Journal of Micromechanics and Microengineering","issn_l":"0960-1317","issn":["0960-1317","1361-6439"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micromechanics and Microengineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1088/0960-1317/19/9/095010/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5074753447","display_name":"Sung Jin Hwang","orcid":"https://orcid.org/0000-0002-7571-7650","observed_orcids":["https://orcid.org/0000-0002-7571-7650"]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sung Jin Hwang","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Dong Joon Oh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dong Joon Oh","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113653450","display_name":"Phill Gu Jung","orcid":"https://orcid.org/0000-0002-6789-0859","observed_orcids":["https://orcid.org/0000-0002-6789-0859"]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Phill Gu Jung","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100342108","display_name":"Sang Min Lee","orcid":"https://orcid.org/0000-0002-2173-2193","observed_orcids":["https://orcid.org/0000-0002-2173-2193"]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang Min Lee","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004437636","display_name":"Jeung Sang Go","orcid":"https://orcid.org/0000-0002-5215-1682","observed_orcids":["https://orcid.org/0000-0002-5215-1682"]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jeung Sang Go","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102012952","display_name":"Joonho Kim","orcid":"https://orcid.org/0000-0002-1294-168X","observed_orcids":["https://orcid.org/0000-0002-1294-168X"]},"institutions":[{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":"KR","type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Joon-Ho Kim","raw_affiliation_strings":["Samsung Advanced Institute of Technology (SAIT), Nongseo-dong, Giheung-Gu, Yongin-si, Gyeonggi-do 446-712, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology (SAIT), Nongseo-dong, Giheung-Gu, Yongin-si, Gyeonggi-do 446-712, Korea","institution_ids":["https://openalex.org/I4399598381"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111628673","display_name":"Kyu-Youn Hwang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":"KR","type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyu-Youn Hwang","raw_affiliation_strings":["Samsung Advanced Institute of Technology (SAIT), Nongseo-dong, Giheung-Gu, Yongin-si, Gyeonggi-do 446-712, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology (SAIT), Nongseo-dong, Giheung-Gu, Yongin-si, Gyeonggi-do 446-712, Korea","institution_ids":["https://openalex.org/I4399598381"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101701539","display_name":"Jong Soo Ko","orcid":"https://orcid.org/0000-0002-4707-7772","observed_orcids":["https://orcid.org/0000-0002-4707-7772"]},"institutions":[{"id":"https://openalex.org/I4921948","display_name":"Pusan National University","ror":"https://ror.org/01an57a31","country_code":"KR","type":"education","lineage":["https://openalex.org/I4921948"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong Soo Ko","raw_affiliation_strings":["School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Mechanical Engineering, Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]},{"raw_affiliation_string":"School of Mechanical Eng., Pusan National University, Jangjeon-dong, Geumjeong-gu, Busan 609-735, Korea","institution_ids":["https://openalex.org/I4921948"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5113653450"],"corresponding_institution_ids":["https://openalex.org/I4921948"],"apc_list":{"value":3325,"currency":"USD","value_usd":3325},"apc_paid":null,"fwci":2.0621,"has_fulltext":true,"cited_by_count":49,"citation_normalized_percentile":{"value":0.86214626,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"19","issue":"9","first_page":"095010","last_page":"095010"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.40209999680519104,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.40209999680519104,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.24979999661445618,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10412","display_name":"Microfluidic and Capillary Electrophoresis Applications","score":0.07930000126361847,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/polydimethylsiloxane","display_name":"polydimethylsiloxane","score":0.9879999756813049},{"id":"https://openalex.org/keywords/dry-etching","display_name":"dry etching","score":0.8920000195503235},{"id":"https://openalex.org/keywords/microwave-plasma","display_name":"microwave plasma","score":0.9340000152587891},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.9710000157356262},{"id":"https://openalex.org/keywords/anisotropic-etching","display_name":"anisotropic etching","score":0.8320000171661377},{"id":"https://openalex.org/keywords/superhydrophobic-surfaces","display_name":"superhydrophobic surfaces","score":0.824999988079071},{"id":"https://openalex.org/keywords/contact-angle","display_name":"contact angle","score":0.8240000009536743},{"id":"https://openalex.org/keywords/nickel-microstructures","display_name":"nickel microstructures","score":0.6169999837875366}],"concepts":[{"id":"https://openalex.org/C2779849746","wikidata":"https://www.wikidata.org/wiki/Q411955","display_name":"Polydimethylsiloxane","level":2,"score":0.9730664491653442},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.7029061913490295},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6935718655586243},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6482021808624268},{"id":"https://openalex.org/C44838205","wikidata":"https://www.wikidata.org/wiki/Q127995","display_name":"Microwave","level":2,"score":0.6064294576644897},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.5810874104499817},{"id":"https://openalex.org/C68709404","wikidata":"https://www.wikidata.org/wiki/Q1134475","display_name":"Flux (metallurgy)","level":2,"score":0.5133020281791687},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4940948784351349},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4673127830028534},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.4562654495239258},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.23654809594154358},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.1921781599521637},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.08944645524024963},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1088/0960-1317/19/9/095010","doi":"https://doi.org/10.1088/0960-1317/19/9/095010","is_oa":true,"landing_page_url":"https://doi.org/10.1088/0960-1317/19/9/095010","pdf_url":"https://iopscience.iop.org/article/10.1088/0960-1317/19/9/095010/pdf","source":{"id":"https://openalex.org/S170809390","display_name":"Journal of Micromechanics and Microengineering","issn_l":"0960-1317","issn":["0960-1317","1361-6439"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micromechanics and Microengineering","raw_type":"journal-article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.495.4146","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.495.4146","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://mems.me.pusan.ac.kr/media/paper/paperpdf/int_pdf/33-int.pdf","raw_type":"text"}],"best_oa_location":{"id":"doi:10.1088/0960-1317/19/9/095010","doi":"https://doi.org/10.1088/0960-1317/19/9/095010","is_oa":true,"landing_page_url":"https://doi.org/10.1088/0960-1317/19/9/095010","pdf_url":"https://iopscience.iop.org/article/10.1088/0960-1317/19/9/095010/pdf","source":{"id":"https://openalex.org/S170809390","display_name":"Journal of Micromechanics and Microengineering","issn_l":"0960-1317","issn":["0960-1317","1361-6439"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micromechanics and Microengineering","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320315121","display_name":"Samsung Advanced Institute of Technology","ror":"https://ror.org/04axnyp10"},{"id":"https://openalex.org/F4320332195","display_name":"Samsung","ror":"https://ror.org/04w3jy968"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W1999045362.pdf","grobid_xml":"https://content.openalex.org/works/W1999045362.grobid-xml"},"referenced_works_count":38,"referenced_works":["https://openalex.org/W237356666","https://openalex.org/W1041265346","https://openalex.org/W1966396374","https://openalex.org/W1968250996","https://openalex.org/W1973791641","https://openalex.org/W1978317557","https://openalex.org/W1979530264","https://openalex.org/W1985537766","https://openalex.org/W1993244507","https://openalex.org/W1993356010","https://openalex.org/W2009474219","https://openalex.org/W2034087180","https://openalex.org/W2038734744","https://openalex.org/W2042700724","https://openalex.org/W2043503710","https://openalex.org/W2048242437","https://openalex.org/W2054598075","https://openalex.org/W2056251639","https://openalex.org/W2059657362","https://openalex.org/W2067758445","https://openalex.org/W2071311642","https://openalex.org/W2072592857","https://openalex.org/W2073829503","https://openalex.org/W2083566158","https://openalex.org/W2083822379","https://openalex.org/W2088808316","https://openalex.org/W2104311964","https://openalex.org/W2107542980","https://openalex.org/W2124667074","https://openalex.org/W2127977631","https://openalex.org/W2137950749","https://openalex.org/W2156436431","https://openalex.org/W2161065218","https://openalex.org/W2479193483","https://openalex.org/W4234938960","https://openalex.org/W4240870044","https://openalex.org/W4247419735","https://openalex.org/W4285719527"],"related_works":["https://openalex.org/W7100256532","https://openalex.org/W2242848909","https://openalex.org/W2560373811","https://openalex.org/W2054598075","https://openalex.org/W1996094640","https://openalex.org/W1987224403","https://openalex.org/W2918773014","https://openalex.org/W2764132957","https://openalex.org/W2085620881","https://openalex.org/W2531715055"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"a":[3,101,133,190],"new":[4],"polydimethylsiloxane":[5],"(PDMS)":[6],"dry-etching":[7],"method":[8,17],"that":[9,194],"uses":[10],"microwave":[11,48,117],"plasma.":[12],"The":[13,28,78,108,119,163],"applicability":[14],"of":[15,31,41,60,73,82,121,135,145,148],"the":[16,37,47,51,57,65,70,116,122,127,140,149,180],"for":[18],"fabricating":[19],"microstructures":[20,203],"and":[21,46,95,137,157,179,197],"removing":[22],"residual":[23],"PDMS":[24,32,52,109,151,155,172,177,192,198],"is":[25],"also":[26],"verified.":[27],"etch":[29,53,66,80,110,124,129],"rate":[30,54,67,81,111,125,130],"was":[33,63,76,87,131,166,182,204],"dominantly":[34],"influenced":[35],"by":[36],"gas":[38,141],"flux":[39,58,71],"ratio":[40,59,72,103,120],"CF":[42,61],"4":[43,62,98],"/O":[44],"2":[45,75,93],"power.":[49,107,118],"While":[50],"increased":[55,114,168],"as":[56,69],"increased,":[64],"decreased":[68],"O":[74],"increased.":[77],"maximum":[79],"4.31":[83],"\u00b5m":[84],"min":[85],"\u22121":[86],"achieved":[88],"when":[89],"mixing":[90],"oxygen":[91],"(O":[92],")":[94,99],"tetrafluoromethane":[96],"(CF":[97],"at":[100,104],"1:2":[102],"800":[105],"W":[106],"almost":[112],"linearly":[113],"with":[115,139],"vertical":[123],"to":[126,174,185],"lateral":[128],"in":[132,201],"range":[134],"1.14\u20131.64":[136],"varied":[138],"fluxes.":[142],"In":[143,188],"consideration":[144],"potential":[146],"applications":[147],"proposed":[150],"etching":[152],"method,":[153],"array-type":[154],"microwells":[156],"network-type":[158],"microprotrusion":[159],"structures":[160],"were":[161],"fabricated.":[162],"contact":[164],"angle":[165],"dramatically":[167],"from":[169],"104\u00b0":[170],"(non-etched":[171],"surface)":[173,178],"148\u00b0":[175],"(etched":[176],"surface":[181],"thereby":[183],"modified":[184],"be":[186],"superhydrophobic.":[187],"addition,":[189],"thin":[191],"skin":[193],"blocked":[195],"holes":[196],"residues":[199],"affixed":[200],"nickel":[202],"successively":[205],"removed.":[206]},"counts_by_year":[{"year":2026,"cited_by_count":5},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":3},{"year":2018,"cited_by_count":6},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":4},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}