{"id":"https://openalex.org/W1998323276","doi":"https://doi.org/10.1116/1.571265","title":"Twenty-five nm features patterned with trilevel e-beam resist","display_name":"Twenty-five nm features patterned with trilevel e-beam resist","publication_year":1981,"publication_date":"1981-11-01","ids":{"openalex":"https://openalex.org/W1998323276","doi":"https://doi.org/10.1116/1.571265","mag":"1998323276"},"language":"en","primary_location":{"id":"doi:10.1116/1.571265","doi":"https://doi.org/10.1116/1.571265","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.571265","pdf_url":null,"source":{"id":"https://openalex.org/S52593085","display_name":"Journal of Vacuum Science and Technology","issn_l":"0022-5355","issn":["0022-5355","2331-1754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5064846445","display_name":"D. M. Tennant","orcid":"https://orcid.org/0000-0002-9575-3368","observed_orcids":["https://orcid.org/0000-0002-9575-3368"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D. M. Tennant","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003348477","display_name":"L. D. Jackel","orcid":"https://orcid.org/0000-0002-9994-6554","observed_orcids":["https://orcid.org/0000-0002-9994-6554"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"L. D. Jackel","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103114504","display_name":"Richard E. Howard","orcid":"https://orcid.org/0009-0004-0979-4174","observed_orcids":["https://orcid.org/0009-0004-0979-4174"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. E. Howard","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009837711","display_name":"Evelyn L. Hu","orcid":"https://orcid.org/0000-0002-8805-1405","observed_orcids":["https://orcid.org/0000-0002-8805-1405"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. L. Hu","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009407023","display_name":"P. Grabbe","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"P. Grabbe","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059586670","display_name":"R.J. Capik","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. J. Capik","raw_affiliation_strings":["Bell Telephone Laboratories, Holmdel, New Jersey 07733"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Holmdel, New Jersey 07733","institution_ids":[]}]},{"author_position":"last","author":{"id":null,"display_name":"B. S. Schneider","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"B. S. Schneider","raw_affiliation_strings":["Bell Telephone Laboratories, Murray Hill, New Jersey 07974"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Telephone Laboratories, Murray Hill, New Jersey 07974","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.6814,"has_fulltext":false,"cited_by_count":26,"citation_normalized_percentile":{"value":0.81846505,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"19","issue":"4","first_page":"1304","last_page":"1307"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/pmma-resist","display_name":"PMMA resist","score":0.8769999742507935},{"id":"https://openalex.org/keywords/lift-off","display_name":"lift-off","score":0.5640000104904175},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.7820000052452087},{"id":"https://openalex.org/keywords/resist-resolution","display_name":"resist resolution","score":0.4009999930858612}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9835131168365479},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7308693528175354},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.619938313961029},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.49416378140449524},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4569365084171295},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.45646536350250244},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.4564594626426697},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.42583024501800537},{"id":"https://openalex.org/C3020199158","wikidata":"https://www.wikidata.org/wiki/Q210521","display_name":"High resolution","level":2,"score":0.4157271981239319},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.38171619176864624},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3532216548919678},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10548678040504456},{"id":"https://openalex.org/C62649853","wikidata":"https://www.wikidata.org/wiki/Q199687","display_name":"Remote sensing","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.571265","doi":"https://doi.org/10.1116/1.571265","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.571265","pdf_url":null,"source":{"id":"https://openalex.org/S52593085","display_name":"Journal of Vacuum Science and Technology","issn_l":"0022-5355","issn":["0022-5355","2331-1754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science and Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2067099917","https://openalex.org/W1982456357","https://openalex.org/W2022449431","https://openalex.org/W2064179573","https://openalex.org/W2120482152","https://openalex.org/W2012854644","https://openalex.org/W2084661645","https://openalex.org/W2087937929","https://openalex.org/W1982771057","https://openalex.org/W2018469480"],"abstract_inverted_index":{"We":[0,75],"describe":[1],"a":[2,69,83,88],"trilevel":[3,84],"e-beam":[4],"resist":[5,12],"process":[6,15,85],"based":[7,86],"on":[8,26,64,87],"the":[9,78],"high":[10,63],"resolution":[11,79],"PMMA.":[13],"This":[14],"has":[16],"been":[17,39],"used":[18,40],"to":[19],"form":[20],"metal":[21],"features":[22],"25":[23],"nm":[24,58,62,66],"wide":[25,59],"thick":[27],"Si":[28],"substrates":[29],"by":[30],"liftoff.":[31],"Ni\u2013Cr":[32],"films":[33],"patterned":[34],"in":[35,82],"this":[36],"way":[37],"have":[38],"as":[41],"masks":[42],"for":[43],"reactive":[44],"ion":[45],"etching":[46],"of":[47,54,72],"Si.":[48],"The":[49],"resulting":[50],"structures":[51],"were":[52],"arrays":[53],"fins":[55],"\u2220":[56],"30":[57],"and":[60],"330":[61],"95":[65],"centers":[67],"with":[68],"total":[70],"length":[71],"3":[73],"\u03bcm.":[74],"also":[76],"discuss":[77],"improvement":[80],"obtained":[81],"higher":[89],"speed":[90],"resist,":[91],"P":[92],"(MMA/MAA).":[93]},"counts_by_year":[{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}