{"id":"https://openalex.org/W1998302214","doi":"https://doi.org/10.1117/12.2082883","title":"Study of Dill's B parameter measurement of EUV resist","display_name":"Study of Dill's B parameter measurement of EUV resist","publication_year":2015,"publication_date":"2015-03-13","ids":{"openalex":"https://openalex.org/W1998302214","doi":"https://doi.org/10.1117/12.2082883","mag":"1998302214"},"language":"en","primary_location":{"id":"doi:10.1117/12.2082883","doi":"https://doi.org/10.1117/12.2082883","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2082883","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113735830","display_name":"Atsushi Sekiguchi","orcid":"https://orcid.org/0000-0002-0270-797X","observed_orcids":["https://orcid.org/0000-0002-0270-797X"]},"institutions":[{"id":"https://openalex.org/I4405265534","display_name":"Litho Tech Japan Corporation (Japan)","ror":"https://ror.org/053ey8h98","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405265534"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Atsushi Sekiguchi","raw_affiliation_strings":["Litho Tech Japan Co., Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Litho Tech Japan Co., Ltd. (Japan)","institution_ids":["https://openalex.org/I4405265534"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Yoko Matsumoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405265534","display_name":"Litho Tech Japan Corporation (Japan)","ror":"https://ror.org/053ey8h98","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405265534"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoko Matsumoto","raw_affiliation_strings":["Litho Tech Japan Co., Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Litho Tech Japan Co., Ltd. (Japan)","institution_ids":["https://openalex.org/I4405265534"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083543360","display_name":"Tetsuo Harada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuo Harada","raw_affiliation_strings":["Univ. of Hyogo (Japan)","University of Hyogo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]},{"raw_affiliation_string":"University of Hyogo, Japan","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102018588","display_name":"Takeo Watanabe","orcid":"https://orcid.org/0000-0003-1202-0431","observed_orcids":["https://orcid.org/0000-0003-1202-0431"]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeo Watanabe","raw_affiliation_strings":["Univ. of Hyogo (Japan)","University of Hyogo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]},{"raw_affiliation_string":"University of Hyogo, Japan","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111582318","display_name":"Hiroo Kinoshita","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroo Kinoshita","raw_affiliation_strings":["Univ. of Hyogo (Japan)","University of Hyogo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Hyogo (Japan)","institution_ids":["https://openalex.org/I180941496"]},{"raw_affiliation_string":"University of Hyogo, Japan","institution_ids":["https://openalex.org/I180941496"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.9142,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.91643706,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"9422","issue":null,"first_page":"94222L","last_page":"94222L"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-resist","display_name":"EUV resist","score":0.8159999847412109},{"id":"https://openalex.org/keywords/chemically-amplified-resists","display_name":"chemically amplified resists","score":0.949999988079071},{"id":"https://openalex.org/keywords/periaqueductal-gray","display_name":"periaqueductal gray","score":0.5619999766349792},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.8539999723434448},{"id":"https://openalex.org/keywords/resolution","display_name":"resolution","score":0.4950000047683716},{"id":"https://openalex.org/keywords/resist-sensitivity","display_name":"resist sensitivity","score":0.8870000243186951}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9145052433013916},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.774092972278595},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.38820868730545044},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3549078404903412},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.33229729533195496},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2605522572994232},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.24671870470046997},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16797327995300293},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2082883","doi":"https://doi.org/10.1117/12.2082883","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2082883","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W1963891305","https://openalex.org/W1990153848","https://openalex.org/W2013814921","https://openalex.org/W2018626984","https://openalex.org/W2029874476","https://openalex.org/W2051434277","https://openalex.org/W2052720003","https://openalex.org/W2054981045","https://openalex.org/W2058787905","https://openalex.org/W2062714502","https://openalex.org/W2064289422","https://openalex.org/W2078396250","https://openalex.org/W2079272529","https://openalex.org/W2091669237","https://openalex.org/W2914595912"],"related_works":["https://openalex.org/W3216252342","https://openalex.org/W4297024773","https://openalex.org/W2517376078","https://openalex.org/W1967233919","https://openalex.org/W3138682823","https://openalex.org/W2012169868","https://openalex.org/W1991872585","https://openalex.org/W2020593533","https://openalex.org/W2309323734","https://openalex.org/W2002009684"],"abstract_inverted_index":{"Our":[0],"group":[1],"previously":[2],"explored":[3],"methods":[4],"for":[5,9,55,66],"measuring":[6,67],"simulation":[7],"parameter":[8,21],"advanced":[10],"chemically":[11],"amplified":[12],"(CA)":[13],"resists,":[14],"including":[15],"development":[16],"parameters":[17,34],"[1].":[18],"Dill\u2019s":[19,69],"C":[20],"[2-3]":[22],",":[23],"acid":[24],"diffusion":[25],"length":[26],"generated":[27],"from":[28],"PAG":[29],"[4],":[30],"and":[31,58],"de-protection":[32],"reaction":[33],"[5-6].":[35],"We":[36,81],"performed":[37],"simulations":[38],"of":[39,47,98],"EUV":[40,89],"resists":[41],"using":[42],"these":[43],"parameters,":[44],"the":[45,53,68,86,96,99],"results":[46],"which":[48,72],"allowed":[49],"us":[50],"to":[51,76],"examine":[52],"conditions":[54],"reducing":[56],"LER":[57],"improving":[59,95],"resolution.":[60],"This":[61],"paper":[62],"discusses":[63],"a":[64],"method":[65],"B":[70],"parameter,":[71],"had":[73],"been":[74],"difficult":[75],"measure":[77],"with":[78],"conventional":[79],"methods.":[80],"also":[82],"confirmed":[83],"that":[84],"enhancing":[85],"resist":[87],"polymer\u2019s":[88],"light":[90],"absorption":[91],"is":[92],"effective":[93],"in":[94],"sensitivity":[97],"CA":[100],"resist.":[101]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2018,"cited_by_count":3},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":1}],"updated_date":"2026-10-17T09:40:24.721904","created_date":"2016-06-24T00:00:00"}