{"id":"https://openalex.org/W1997908024","doi":"https://doi.org/10.1016/j.surfcoat.2005.01.084","title":"Structure and chemical composition of polymer films deposited in a dielectric barrier discharge (DBD) in Ar/fluorocarbon mixtures","display_name":"Structure and chemical composition of polymer films deposited in a dielectric barrier discharge (DBD) in Ar/fluorocarbon mixtures","publication_year":2005,"publication_date":"2005-03-22","ids":{"openalex":"https://openalex.org/W1997908024","doi":"https://doi.org/10.1016/j.surfcoat.2005.01.084","mag":"1997908024"},"language":"en","primary_location":{"id":"doi:10.1016/j.surfcoat.2005.01.084","doi":"https://doi.org/10.1016/j.surfcoat.2005.01.084","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2005.01.084","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113555098","display_name":"I. P. Vinogradov","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I100066346","display_name":"University of Stuttgart","ror":"https://ror.org/04vnq7t77","country_code":"DE","type":"education","lineage":["https://openalex.org/I100066346"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"I.P. Vinogradov","raw_affiliation_strings":["Institut f\u00fcr Plasmaforschung, Universit\u00e4t Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Plasmaforschung, Universit\u00e4t Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart, Germany","institution_ids":["https://openalex.org/I100066346"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5078156155","display_name":"Achim Lunk","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I100066346","display_name":"University of Stuttgart","ror":"https://ror.org/04vnq7t77","country_code":"DE","type":"education","lineage":["https://openalex.org/I100066346"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"A. Lunk","raw_affiliation_strings":["Institut f\u00fcr Plasmaforschung, Universit\u00e4t Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Plasmaforschung, Universit\u00e4t Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart, Germany","institution_ids":["https://openalex.org/I100066346"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5078156155"],"corresponding_institution_ids":["https://openalex.org/I100066346"],"apc_list":{"value":3880,"currency":"USD","value_usd":3880},"apc_paid":null,"fwci":1.2754,"has_fulltext":false,"cited_by_count":26,"citation_normalized_percentile":{"value":0.76232606,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"200","issue":"1-4","first_page":"660","last_page":"663"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.8651999831199646,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.8651999831199646,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.0364999994635582,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.013899999670684338,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dielectric-barrier-discharge","display_name":"dielectric barrier discharge","score":0.9710000157356262},{"id":"https://openalex.org/keywords/atmospheric-pressure-plasma","display_name":"atmospheric pressure plasma","score":0.6449999809265137},{"id":"https://openalex.org/keywords/plasma-polymerization","display_name":"plasma polymerization","score":0.9210000038146973},{"id":"https://openalex.org/keywords/cf4","display_name":"CF4","score":0.6639999747276306},{"id":"https://openalex.org/keywords/c2f6","display_name":"C2F6","score":0.8769999742507935},{"id":"https://openalex.org/keywords/octafluoropropane","display_name":"C3F8","score":0.7089999914169312},{"id":"https://openalex.org/keywords/c4f8","display_name":"C4F8","score":0.8679999709129333},{"id":"https://openalex.org/keywords/f-c-ratio","display_name":"F/C ratio","score":0.7459999918937683},{"id":"https://openalex.org/keywords/film-composition","display_name":"film composition","score":0.6819999814033508},{"id":"https://openalex.org/keywords/film-structure","display_name":"film structure","score":0.8619999885559082},{"id":"https://openalex.org/keywords/amorphous-films","display_name":"amorphous films","score":0.6890000104904175},{"id":"https://openalex.org/keywords/cross-linking","display_name":"crosslinking","score":0.7039999961853027},{"id":"https://openalex.org/keywords/hydrogen-admixture","display_name":"hydrogen admixture","score":0.824999988079071},{"id":"https://openalex.org/keywords/silicon-wafers","display_name":"silicon wafers","score":0.7919999957084656}],"concepts":[{"id":"https://openalex.org/C2776875633","wikidata":"https://www.wikidata.org/wiki/Q425094","display_name":"Fluorocarbon","level":2,"score":0.8781106472015381},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7380677461624146},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.7314882874488831},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.7309498190879822},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6923757791519165},{"id":"https://openalex.org/C89448510","wikidata":"https://www.wikidata.org/wiki/Q58313","display_name":"Dielectric barrier discharge","level":3,"score":0.6341540217399597},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5985422730445862},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.5695515275001526},{"id":"https://openalex.org/C125287762","wikidata":"https://www.wikidata.org/wiki/Q1758948","display_name":"Absorption (acoustics)","level":2,"score":0.5213069319725037},{"id":"https://openalex.org/C115545448","wikidata":"https://www.wikidata.org/wiki/Q1283480","display_name":"Plasma polymerization","level":4,"score":0.5159202814102173},{"id":"https://openalex.org/C119824511","wikidata":"https://www.wikidata.org/wiki/Q13553575","display_name":"Absorption spectroscopy","level":2,"score":0.5112407207489014},{"id":"https://openalex.org/C153642686","wikidata":"https://www.wikidata.org/wiki/Q70906","display_name":"Infrared spectroscopy","level":2,"score":0.4770224094390869},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4222235679626465},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.4054712653160095},{"id":"https://openalex.org/C44228677","wikidata":"https://www.wikidata.org/wiki/Q181898","display_name":"Polymerization","level":3,"score":0.40507087111473083},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.22461768984794617},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16154450178146362},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.12915733456611633},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.08031994104385376},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.07074865698814392},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.06885913014411926},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.surfcoat.2005.01.084","doi":"https://doi.org/10.1016/j.surfcoat.2005.01.084","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2005.01.084","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1561385610","https://openalex.org/W2007149841","https://openalex.org/W2047349977","https://openalex.org/W2083175303","https://openalex.org/W2154015671"],"related_works":["https://openalex.org/W2007195490","https://openalex.org/W2083175303","https://openalex.org/W2979150009","https://openalex.org/W1974027736","https://openalex.org/W2022834554","https://openalex.org/W2150281711","https://openalex.org/W1987658301","https://openalex.org/W2057689817","https://openalex.org/W2061262254","https://openalex.org/W1999729419"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}