{"id":"https://openalex.org/W1995325786","doi":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","title":"Chemical and nanomechanical properties of plasma-polymerized acetylene on titanium and silicon","display_name":"Chemical and nanomechanical properties of plasma-polymerized acetylene on titanium and silicon","publication_year":2005,"publication_date":"2005-02-01","ids":{"openalex":"https://openalex.org/W1995325786","doi":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","mag":"1995325786"},"language":"en","primary_location":{"id":"doi:10.1016/j.ijadhadh.2004.11.004","doi":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","pdf_url":null,"source":{"id":"https://openalex.org/S86637577","display_name":"International Journal of Adhesion and Adhesives","issn_l":"0143-7496","issn":["0143-7496","1879-0127"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Adhesion and Adhesives","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5083272985","display_name":"R.A. DiFelice","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I859038795","display_name":"Virginia Tech","ror":"https://ror.org/02smfhw86","country_code":"US","type":"education","lineage":["https://openalex.org/I859038795"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R.A. DiFelice","raw_affiliation_strings":["Chemistry Department and the Center for Adhesive and Sealant Science, Virginia Tech, Blacksburg, VA 24061-0201, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemistry Department and the Center for Adhesive and Sealant Science, Virginia Tech, Blacksburg, VA 24061-0201, USA","institution_ids":["https://openalex.org/I859038795"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112793359","display_name":"John G. Dillard","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I859038795","display_name":"Virginia Tech","ror":"https://ror.org/02smfhw86","country_code":"US","type":"education","lineage":["https://openalex.org/I859038795"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"J.G. Dillard","raw_affiliation_strings":["Chemistry Department and the Center for Adhesive and Sealant Science, Virginia Tech, Blacksburg, VA 24061-0201, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemistry Department and the Center for Adhesive and Sealant Science, Virginia Tech, Blacksburg, VA 24061-0201, USA","institution_ids":["https://openalex.org/I859038795"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5042212396","display_name":"Dehua Yang","orcid":"https://orcid.org/0000-0002-0567-9118","observed_orcids":["https://orcid.org/0000-0002-0567-9118"]},"institutions":[{"id":"https://openalex.org/I4210140138","display_name":"Hysitron (United States)","ror":"https://ror.org/043ejs261","country_code":"US","type":"company","lineage":["https://openalex.org/I4210140138"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Yang","raw_affiliation_strings":["Hysitron Incorporated, 10025 Valley View Road, Minneapolis, MN 55344, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hysitron Incorporated, 10025 Valley View Road, Minneapolis, MN 55344, USA","institution_ids":["https://openalex.org/I4210140138"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5112793359"],"corresponding_institution_ids":["https://openalex.org/I859038795"],"apc_list":{"value":3760,"currency":"USD","value_usd":3760},"apc_paid":null,"fwci":1.8539,"has_fulltext":false,"cited_by_count":22,"citation_normalized_percentile":{"value":0.81510095,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"25","issue":"4","first_page":"342","last_page":"351"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9643999934196472,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9643999934196472,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10859","display_name":"Polymer Surface Interaction Studies","score":0.006000000052154064,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13470","display_name":"Surface Treatment and Coatings","score":0.005499999970197678,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/plasma-polymerized-films","display_name":"plasma polymer films","score":0.5789999961853027},{"id":"https://openalex.org/keywords/titanium-substrate","display_name":"titanium substrate","score":0.6069999933242798},{"id":"https://openalex.org/keywords/silicon-substrate","display_name":"silicon substrate","score":0.8399999737739563},{"id":"https://openalex.org/keywords/ti-6al-4v","display_name":"Ti-6Al-4V","score":0.9769999980926514},{"id":"https://openalex.org/keywords/thin-film-adhesion","display_name":"film adhesion","score":0.9100000262260437},{"id":"https://openalex.org/keywords/film-hardness","display_name":"film hardness","score":0.6499999761581421},{"id":"https://openalex.org/keywords/reduced-young-s-modulus","display_name":"reduced Young's modulus","score":0.9269999861717224},{"id":"https://openalex.org/keywords/film-thickness-dependence","display_name":"film thickness dependence","score":0.6299999952316284},{"id":"https://openalex.org/keywords/deposition-power","display_name":"deposition power","score":0.6029999852180481},{"id":"https://openalex.org/keywords/film-composition","display_name":"film composition","score":0.47699999809265137},{"id":"https://openalex.org/keywords/c-o-groups","display_name":"C=O groups","score":0.746999979019165},{"id":"https://openalex.org/keywords/nanomechanical-properties","display_name":"nanomechanical properties","score":0.6840000152587891}],"concepts":[{"id":"https://openalex.org/C49326732","wikidata":"https://www.wikidata.org/wiki/Q1549892","display_name":"Nanoindentation","level":2,"score":0.8322755098342896},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.826322078704834},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.6910412311553955},{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.6216550469398499},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6081114411354065},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.5854453444480896},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.548731803894043},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.49208253622055054},{"id":"https://openalex.org/C2777517455","wikidata":"https://www.wikidata.org/wiki/Q133145","display_name":"Acetylene","level":2,"score":0.4677489101886749},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.458753377199173},{"id":"https://openalex.org/C75937256","wikidata":"https://www.wikidata.org/wiki/Q1440781","display_name":"Carbon film","level":3,"score":0.44053342938423157},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.38635843992233276},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.33357933163642883},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22602161765098572},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1974586546421051},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.11655381321907043},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.08603763580322266},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.ijadhadh.2004.11.004","doi":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ijadhadh.2004.11.004","pdf_url":null,"source":{"id":"https://openalex.org/S86637577","display_name":"International Journal of Adhesion and Adhesives","issn_l":"0143-7496","issn":["0143-7496","1879-0127"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Adhesion and Adhesives","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":38,"referenced_works":["https://openalex.org/W609933390","https://openalex.org/W1501002354","https://openalex.org/W1557681670","https://openalex.org/W1600280553","https://openalex.org/W1968234024","https://openalex.org/W1973656361","https://openalex.org/W1974525533","https://openalex.org/W1982079711","https://openalex.org/W1993402230","https://openalex.org/W2000826659","https://openalex.org/W2012869341","https://openalex.org/W2013630095","https://openalex.org/W2017800811","https://openalex.org/W2023269953","https://openalex.org/W2023340223","https://openalex.org/W2030366240","https://openalex.org/W2032264779","https://openalex.org/W2036379067","https://openalex.org/W2041042893","https://openalex.org/W2041805254","https://openalex.org/W2056351618","https://openalex.org/W2056412841","https://openalex.org/W2056491364","https://openalex.org/W2061741133","https://openalex.org/W2065257499","https://openalex.org/W2066055210","https://openalex.org/W2069911249","https://openalex.org/W2070014859","https://openalex.org/W2075668175","https://openalex.org/W2077932134","https://openalex.org/W2079045111","https://openalex.org/W2086933933","https://openalex.org/W2087698387","https://openalex.org/W2095072929","https://openalex.org/W2109468230","https://openalex.org/W2117831305","https://openalex.org/W2134237309","https://openalex.org/W4210881876"],"related_works":["https://openalex.org/W1979088683","https://openalex.org/W2107601706","https://openalex.org/W11387722","https://openalex.org/W4385836816","https://openalex.org/W2100547513","https://openalex.org/W2018715383","https://openalex.org/W2038164813","https://openalex.org/W7015431621","https://openalex.org/W2346812003","https://openalex.org/W1964077640"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}