{"id":"https://openalex.org/W1994141237","doi":"https://doi.org/10.1016/0039-6028(93)91099-b","title":"Growth of Si on Si(111) \u00d7 -In surfaces studied by UHV-REM","display_name":"Growth of Si on Si(111) \u00d7 -In surfaces studied by UHV-REM","publication_year":1993,"publication_date":"1993-05-01","ids":{"openalex":"https://openalex.org/W1994141237","doi":"https://doi.org/10.1016/0039-6028(93)91099-b","mag":"1994141237"},"language":"en","primary_location":{"id":"doi:10.1016/0039-6028(93)91099-b","doi":"https://doi.org/10.1016/0039-6028(93)91099-b","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(93)91099-b","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5000229235","display_name":"Hiroki Minoda","orcid":"https://orcid.org/0000-0002-1769-6222","observed_orcids":["https://orcid.org/0000-0002-1769-6222"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroki Minoda","raw_affiliation_strings":["Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069512933","display_name":"Y. Tanishiro","orcid":"https://orcid.org/0000-0003-1916-3961","observed_orcids":["https://orcid.org/0000-0003-1916-3961"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasumasa Tanishiro","raw_affiliation_strings":["Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069214597","display_name":"Naoki Yamamoto","orcid":"https://orcid.org/0000-0002-5055-2052","observed_orcids":["https://orcid.org/0000-0002-5055-2052"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Naoki Yamamoto","raw_affiliation_strings":["Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111753812","display_name":"Katsumichi Yagi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Katsumichi Yagi","raw_affiliation_strings":["Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Physics Department, Tokyo Institute of Technology, Oh-okayama, Meguro, Tokyo 152, Japan","institution_ids":["https://openalex.org/I114531698"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I114531698"],"apc_list":{"value":3340,"currency":"USD","value_usd":3340},"apc_paid":null,"fwci":2.4529,"has_fulltext":false,"cited_by_count":21,"citation_normalized_percentile":{"value":0.8911871,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"287-288","issue":null,"first_page":"915","last_page":"920"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.9580000042915344,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.9580000042915344,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.03889999911189079,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-growth","display_name":"silicon growth","score":0.5249999761581421},{"id":"https://openalex.org/keywords/indium-segregation","display_name":"indium segregation","score":0.7979999780654907},{"id":"https://openalex.org/keywords/two-dimensional-nucleation","display_name":"two-dimensional nucleation","score":0.7649999856948853},{"id":"https://openalex.org/keywords/rheed-oscillations","display_name":"RHEED intensity oscillations","score":0.7200000286102295},{"id":"https://openalex.org/keywords/surface-reconstruction","display_name":"surface reconstruction","score":0.41200000047683716},{"id":"https://openalex.org/keywords/surface-terraces","display_name":"surface terraces","score":0.3959999978542328}],"concepts":[{"id":"https://openalex.org/C200096950","wikidata":"https://www.wikidata.org/wiki/Q455003","display_name":"Reflection high-energy electron diffraction","level":4,"score":0.9508644342422485},{"id":"https://openalex.org/C77557913","wikidata":"https://www.wikidata.org/wiki/Q864822","display_name":"Electron diffraction","level":3,"score":0.8004354238510132},{"id":"https://openalex.org/C61048295","wikidata":"https://www.wikidata.org/wiki/Q909022","display_name":"Nucleation","level":2,"score":0.7702579498291016},{"id":"https://openalex.org/C65682993","wikidata":"https://www.wikidata.org/wiki/Q1056451","display_name":"Reflection (computer programming)","level":2,"score":0.6465530395507812},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.565710186958313},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5560431480407715},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.485421746969223},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.44927653670310974},{"id":"https://openalex.org/C93877712","wikidata":"https://www.wikidata.org/wiki/Q132560","display_name":"Electron microscope","level":2,"score":0.441353440284729},{"id":"https://openalex.org/C2778439541","wikidata":"https://www.wikidata.org/wiki/Q7106412","display_name":"Oscillation (cell signaling)","level":2,"score":0.4313500225543976},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.3427736759185791},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.21190312504768372},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0788000226020813},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.05960923433303833},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/0039-6028(93)91099-b","doi":"https://doi.org/10.1016/0039-6028(93)91099-b","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(93)91099-b","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"},{"id":"pmh:oai:irdb.nii.ac.jp:00897:0003874154","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100428814","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Surface Sci.","raw_type":"journal article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1965201575","https://openalex.org/W1973473207","https://openalex.org/W1978545211","https://openalex.org/W2039450211","https://openalex.org/W2051045101","https://openalex.org/W2083673104","https://openalex.org/W2090880834"],"related_works":["https://openalex.org/W1967760439","https://openalex.org/W1982202564","https://openalex.org/W2053406289","https://openalex.org/W4210499544","https://openalex.org/W7144826965","https://openalex.org/W2032506568","https://openalex.org/W2018492083","https://openalex.org/W2059705833","https://openalex.org/W1998209267","https://openalex.org/W2035816327"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}