{"id":"https://openalex.org/W1994131925","doi":"https://doi.org/10.1063/1.3548431","title":"Contamination Control in Ion Implantation","display_name":"Contamination Control in Ion Implantation","publication_year":2011,"publication_date":"2011-01-01","ids":{"openalex":"https://openalex.org/W1994131925","doi":"https://doi.org/10.1063/1.3548431","mag":"1994131925"},"language":"en","primary_location":{"id":"doi:10.1063/1.3548431","doi":"https://doi.org/10.1063/1.3548431","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.3548431","pdf_url":null,"source":{"id":"https://openalex.org/S2764696622","display_name":"AIP conference proceedings","issn_l":"0094-243X","issn":["0094-243X","1551-7616","1935-0465"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Conference Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5058398381","display_name":"R.J. Eddy","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"R. Eddy","raw_affiliation_strings":["aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","institution_ids":[]},{"raw_affiliation_string":"bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","institution_ids":[]},{"raw_affiliation_string":"cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109860844","display_name":"Douglas Alan Doi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D. Doi","raw_affiliation_strings":["aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","institution_ids":[]},{"raw_affiliation_string":"bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","institution_ids":[]},{"raw_affiliation_string":"cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024834424","display_name":"Ikaro Arthur Dantas Santos","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"I. Santos","raw_affiliation_strings":["aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","institution_ids":[]},{"raw_affiliation_string":"bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","institution_ids":[]},{"raw_affiliation_string":"cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001287272","display_name":"Walt Wriggins","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"W. Wriggins","raw_affiliation_strings":["aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"aKLE Engineering, 365 High Chaparral Loop, Prescott AZ 86303, USA","institution_ids":[]},{"raw_affiliation_string":"bFastgate Corporation, 1011 Niizo, Toda, Saitama 335\u2010001, Japan","institution_ids":[]},{"raw_affiliation_string":"cCore Systems, 1050 Kifer Rd. Sunnyvale, CA 94086, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018101394","display_name":"Jiro Matsuo","orcid":"https://orcid.org/0000-0003-0684-3677","observed_orcids":["https://orcid.org/0000-0003-0684-3677"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jiro Matsuo","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5074923815","display_name":"Masataka Kase","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masataka Kase","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020399656","display_name":"Takaaki Aoki","orcid":"https://orcid.org/0000-0002-5926-4903","observed_orcids":["https://orcid.org/0000-0002-5926-4903"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Takaaki Aoki","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5073910564","display_name":"Toshio Seki","orcid":"https://orcid.org/0000-0002-0834-1657","observed_orcids":["https://orcid.org/0000-0002-0834-1657"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Toshio Seki","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.587,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.65437188,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":94,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"396","last_page":"399"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.7139000296592712,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.7139000296592712,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.11230000108480453,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.021900000050663948,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ion-implanter","display_name":"ion implanter","score":0.8579999804496765},{"id":"https://openalex.org/keywords/metal-contamination","display_name":"metal contamination","score":0.781000018119812},{"id":"https://openalex.org/keywords/lubricants","display_name":"lubricants","score":0.6639999747276306},{"id":"https://openalex.org/keywords/process-monitoring","display_name":"process monitoring","score":0.36800000071525574}],"concepts":[{"id":"https://openalex.org/C93497512","wikidata":"https://www.wikidata.org/wiki/Q5164919","display_name":"Contamination control","level":3,"score":0.7738910913467407},{"id":"https://openalex.org/C112570922","wikidata":"https://www.wikidata.org/wiki/Q60528603","display_name":"Contamination","level":2,"score":0.7232226133346558},{"id":"https://openalex.org/C136959337","wikidata":"https://www.wikidata.org/wiki/Q3300772","display_name":"Beamline","level":3,"score":0.6807131767272949},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.619394838809967},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6084774732589722},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5472960472106934},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.533519446849823},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.24477460980415344},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23002150654792786},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.22545906901359558},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.19188192486763},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.08447682857513428},{"id":"https://openalex.org/C147176958","wikidata":"https://www.wikidata.org/wiki/Q77590","display_name":"Civil engineering","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.3548431","doi":"https://doi.org/10.1063/1.3548431","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.3548431","pdf_url":null,"source":{"id":"https://openalex.org/S2764696622","display_name":"AIP conference proceedings","issn_l":"0094-243X","issn":["0094-243X","1551-7616","1935-0465"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Conference Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W56475339","https://openalex.org/W1559470834","https://openalex.org/W1981254993"],"related_works":["https://openalex.org/W2735089739","https://openalex.org/W2027723776","https://openalex.org/W90817758","https://openalex.org/W80311236","https://openalex.org/W7162812247","https://openalex.org/W1847746318","https://openalex.org/W2080404441","https://openalex.org/W1842336126","https://openalex.org/W1981254993","https://openalex.org/W3114589195"],"abstract_inverted_index":{"The":[0],"investigation":[1],"and":[2,21,40,46,74,76,121,155,165,193,205],"elimination":[3],"or":[4,66,114,184],"control":[5,35,167],"of":[6,26,34,36,72,86,146,161,168,213],"metallic":[7],"contamination":[8,210],"in":[9,22,31,43,138,148],"ion":[10,139],"implanters":[11],"has":[12,60],"been":[13,30,63],"a":[14],"leading,":[15],"continuous":[16],"effort":[17],"at":[18],"implanter":[19],"OEMs":[20],"fabs/IDMs":[23],"alike.":[24],"Much":[25],"the":[27,32,70,162,166,201,223],"efforts":[28],"have":[29],"area":[33,58,71],"sputtering":[37],"through":[38],"material":[39,79],"geometry":[41],"changes":[42],"apertures,":[44],"beamline":[45],"target":[47],"chamber":[48],"components.":[49,125],"In":[50],"this":[51],"paper,":[52],"we":[53,198],"will":[54,127,143,199],"focus":[55],"on":[56],"an":[57],"that":[59,151,218],"not,":[61],"heretofore,":[62],"fully":[64],"investigated":[65],"controlled.":[67],"This":[68,141],"is":[69],"lubricants":[73,132,150],"internal":[75,92,100],"external":[77,102],"support":[78],"such":[80],"as":[81],"selected":[82,107],"cleaning":[83,203],"media.":[84],"Some":[85],"these":[87,169],"materials":[88],"are":[89,98,111,115,219],"designated":[90,112],"for":[91,99,106,109,113,117,122,174],"use":[93],"(beamline/vacuum)":[94],"only":[95],"while":[96],"others":[97],"and/or":[101],"use.":[103],"Many":[104],"applications":[105],"greases,":[108],"example,":[110],"used":[116,136],"platens,":[118],"implant":[119],"disks/wheels":[120],"wafer":[123],"handling":[124],"We":[126],"present":[128],"data":[129],"from":[130,222],"popular":[131],"(to":[133],"be":[134,153],"unnamed)":[135],"worldwide":[137],"implanters.":[140],"paper":[142],"review":[144,200],"elements":[145,212,217],"concern":[147],"many":[149],"should":[152],"tracked":[154],"monitored":[156],"by":[157,211,215],"all":[158],"fabs.Proper":[159],"understanding":[160],"characteristics,":[163],"risks":[164],"potential":[170],"contaminants":[171],"can":[172],"provide":[173],"rapid":[175],"return":[176],"to":[177,207],"full":[178],"process":[179],"capability":[180],"following":[181],"major":[182],"PMs":[183],"parts":[185],"changes.":[186],"Using":[187],"VPD\u2010ICPMS,":[188],"Glow":[189],"Discharge":[190],"Mass":[191],"Spectrometry":[192],"Ion":[194],"Chromatography":[195],"(IC)":[196],"data,":[197],"typical":[202],"results":[204],"correlation":[206],"\u201con":[208],"wafer\u201d":[209],"concern\u2014and":[214],"some":[216],"otherwise":[220],"barred":[221],"fab.":[224]},"counts_by_year":[{"year":2018,"cited_by_count":2}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}