{"id":"https://openalex.org/W1994034896","doi":"https://doi.org/10.1117/12.210399","title":"Optimization of dissolution-rate characteristics of chemically amplified positive resist","display_name":"Optimization of dissolution-rate characteristics of chemically amplified positive resist","publication_year":1995,"publication_date":"1995-06-09","ids":{"openalex":"https://openalex.org/W1994034896","doi":"https://doi.org/10.1117/12.210399","mag":"1994034896"},"language":"en","primary_location":{"id":"doi:10.1117/12.210399","doi":"https://doi.org/10.1117/12.210399","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.210399","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5086379728","display_name":"Toshiro Itani","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Toshiro Itani","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082916420","display_name":"Haruo Iwasaki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Haruo Iwasaki","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Hiroshi Yoshino","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Yoshino","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113596756","display_name":"M. Fujimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masashi Fujimoto","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081290321","display_name":"Kunihiko Kasama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118347220","display_name":"NEC (Japan)","ror":"https://ror.org/04jndar25","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kunihiko Kasama","raw_affiliation_strings":["NEC Corp. (Japan)","NEC corporation, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NEC Corp. (Japan)","institution_ids":["https://openalex.org/I118347220"]},{"raw_affiliation_string":"NEC corporation, Japan","institution_ids":["https://openalex.org/I118347220"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I118347220"],"apc_list":null,"apc_paid":null,"fwci":5.5211,"has_fulltext":false,"cited_by_count":8,"citation_normalized_percentile":{"value":0.95206972,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"2438","issue":null,"first_page":"191","last_page":"201"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dissolution-kinetics","display_name":"dissolution kinetics","score":0.8939999938011169},{"id":"https://openalex.org/keywords/dissolution-rate","display_name":"dissolution rate","score":0.46799999475479126},{"id":"https://openalex.org/keywords/dissolution-inhibitors","display_name":"dissolution inhibitors","score":0.781000018119812},{"id":"https://openalex.org/keywords/bisphenol-a","display_name":"bisphenol A","score":0.8920000195503235},{"id":"https://openalex.org/keywords/resist-profile-simulation","display_name":"resist profile simulation","score":0.8669999837875366},{"id":"https://openalex.org/keywords/resolution-capability","display_name":"resolution capability","score":0.5009999871253967}],"concepts":[{"id":"https://openalex.org/C88380143","wikidata":"https://www.wikidata.org/wiki/Q416674","display_name":"Dissolution","level":2,"score":0.9252194166183472},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9027305841445923},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.5683070421218872},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5315202474594116},{"id":"https://openalex.org/C148898269","wikidata":"https://www.wikidata.org/wiki/Q1108792","display_name":"Kinetics","level":2,"score":0.4611746072769165},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4238981604576111},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.38532814383506775},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.34885546565055847},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3129047155380249},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.24640938639640808},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.13388368487358093},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.10419580340385437},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.210399","doi":"https://doi.org/10.1117/12.210399","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.210399","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1997454153","https://openalex.org/W2038386506","https://openalex.org/W2139275192","https://openalex.org/W2045070376","https://openalex.org/W2132539029","https://openalex.org/W2006749583","https://openalex.org/W1983316232","https://openalex.org/W2017061673","https://openalex.org/W1987815610","https://openalex.org/W1991634473"],"abstract_inverted_index":{"The":[0,74],"dissolution":[1,20,36,40,64,75,159,229,254,268,283],"kinetics":[2],"of":[3,34,47,52,84,113,137,167,191,227,241],"a":[4,66,95,101,202,210,216,262],"3-component":[5],"chemically":[6],"amplified":[7],"DUV":[8],"positive":[9],"resist":[10,67,114,129,146,155,204,232],"(base":[11],"resin;":[12],"t-BOC":[13,22,49,138],"protected":[14,23],"polyhydroxystyrene,":[15],"PAG;":[16],"benzenesulfonic":[17],"acid":[18,186,274],"derivative,":[19],"inhibitor;":[21],"bisphenol":[24],"A;)":[25],"was":[26,71,118,151,162,171,189,198,236,258],"investigated":[27],"under":[28],"various":[29],"conditions.":[30],"Particularly,":[31],"the":[32,35,39,45,48,53,81,111,148,158,185,192,225,228,239,242,253],"effects":[33],"inhibitor":[37,92,98,121,247],"on":[38,224],"rate":[41,76,160],"characteristics":[42,230,284],"together":[43],"with":[44,90],"effect":[46,105],"protection":[50,139],"ratio":[51,140],"base":[54,142,243],"resin":[55,244],"were":[56],"studied.":[57],"Moreover,":[58,256],"in":[59,110,127,141],"order":[60],"to":[61,135,145,154,286],"obtain":[62],"ideal":[63,282],"characteristics,":[65],"profile":[68,214,233],"simulation":[69],"analysis":[70,226],"carried":[72],"out.":[73],"contrast":[77,161,269],"as":[78,80],"well":[79],"slope":[82,149,165,264],"N":[83,150],"log(dissolution":[85],"rate)-log(exposure":[86],"dose)":[87],"plots":[88],"increased":[89],"increasing":[91],"concentrations.":[93],"However,":[94],"very":[96],"high":[97],"concentration":[99,122,248],"induced":[100],"severe":[102,211],"standing":[103,212],"wave":[104,213],"and":[106,215,231,246,272],"T-topping":[107],"profile,":[108],"resulting":[109],"deterioration":[112],"performance.":[115],"Therefore,":[116],"it":[117,235,257],"discovered":[119],"that":[120,238,261],"has":[123],"an":[124],"optimum":[125],"value":[126,166],"this":[128],"system.":[130],"These":[131],"results":[132],"are":[133],"similar":[134],"those":[136],"resin.":[143],"According":[144],"simulation,":[147,234],"closely":[152],"related":[153],"performance,":[156],"but":[157],"not.":[163],"A":[164],"more":[168],"than":[169],"15":[170],"necessary":[172],"for":[173,200,251],"0.25":[174,287],"micrometers":[175,181,288],"patterning":[176],"(focus":[177],"margin":[178],">":[179],"1.3":[180],").":[182],"In":[183],"addition,":[184],"diffusion":[187,196,207,218,275],"length":[188,197,208,219,276],"one":[190],"key":[193],"factors:":[194],"suitable":[195],"essential":[199],"achieving":[201],"good":[203],"profile;":[205],"short":[206],"induces":[209],"long":[217],"deteriorates":[220],"resolution":[221],"capability.":[222],"Based":[223],"concluded":[237],"optimization":[240],"structure":[245],"is":[249],"effective":[250],"modifying":[252],"parameter.":[255],"also":[259],"found":[260],"steep":[263],"(>":[265],"15),":[266],"moderate":[267],"(approximately":[270,277],"10,000)":[271],"adequate":[273],"35)":[278],"can":[279],"bring":[280],"about":[281],"leading":[285],"pattern":[289],"formation.":[290]},"counts_by_year":[{"year":2012,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}