{"id":"https://openalex.org/W1991836668","doi":"https://doi.org/10.1088/0268-1242/12/7/026","title":"Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography","display_name":"Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography","publication_year":1997,"publication_date":"1997-07-01","ids":{"openalex":"https://openalex.org/W1991836668","doi":"https://doi.org/10.1088/0268-1242/12/7/026","mag":"1991836668"},"language":"en","primary_location":{"id":"doi:10.1088/0268-1242/12/7/026","doi":"https://doi.org/10.1088/0268-1242/12/7/026","is_oa":false,"landing_page_url":"https://doi.org/10.1088/0268-1242/12/7/026","pdf_url":null,"source":{"id":"https://openalex.org/S106302738","display_name":"Semiconductor Science and Technology","issn_l":"0268-1242","issn":["0268-1242","1361-6641"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Semiconductor Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5056126928","display_name":"Byung\u2010Hyuk Jun","orcid":"https://orcid.org/0000-0001-8566-3548","observed_orcids":["https://orcid.org/0000-0001-8566-3548"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Byung-Hyuk Jun","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102125427","display_name":"Sang\u2010Soo Han","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang-Soo Han","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004954838","display_name":"Joon Sung Lee","orcid":"https://orcid.org/0000-0001-7104-5183","observed_orcids":["https://orcid.org/0000-0001-7104-5183"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Joon Sung Lee","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070039533","display_name":"Yong-Beom Kim","orcid":"https://orcid.org/0000-0001-7191-8001","observed_orcids":["https://orcid.org/0000-0001-7191-8001"]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yong-Beom Kim","raw_affiliation_strings":["Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101183531","display_name":"Hoyoung Kang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ho-Young Kang","raw_affiliation_strings":["Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110034192","display_name":"Young-Bum Koh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Young-Bum Koh","raw_affiliation_strings":["Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor R/D Center, Samsung Electronics Co. Ltd, Yongin, Kyungki-Do, 449-900, Korea","institution_ids":["https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069104909","display_name":"Zhong\u2010Tao Jiang","orcid":"https://orcid.org/0000-0002-4221-6841","observed_orcids":["https://orcid.org/0000-0002-4221-6841"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Zhong-Tao Jiang","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086224005","display_name":"Byeong\u2010Soo Bae","orcid":"https://orcid.org/0000-0001-9424-1830","observed_orcids":["https://orcid.org/0000-0001-9424-1830"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Byeong-Soo Bae","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081861790","display_name":"Kwangsoo No","orcid":"https://orcid.org/0000-0001-6546-8358","observed_orcids":["https://orcid.org/0000-0001-6546-8358"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kwangsoo No","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]},{"raw_affiliation_string":"Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3325,"currency":"USD","value_usd":3325},"apc_paid":null,"fwci":0.962,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.71296253,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":"12","issue":"7","first_page":"921","last_page":"926"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8223000168800354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8223000168800354,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.1388999968767166,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.014000000432133675,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/antireflection-layer","display_name":"antireflection layer","score":0.8809999823570251},{"id":"https://openalex.org/keywords/thin-film-deposition","display_name":"thin film deposition","score":0.5210000276565552},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.5960000157356262}],"concepts":[{"id":"https://openalex.org/C108406538","wikidata":"https://www.wikidata.org/wiki/Q583040","display_name":"Anti-reflective coating","level":3,"score":0.8037799000740051},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7705521583557129},{"id":"https://openalex.org/C2780477314","wikidata":"https://www.wikidata.org/wiki/Q241056","display_name":"Excimer laser","level":3,"score":0.7152985334396362},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.6586387753486633},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.6480212211608887},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.572243332862854},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5002715587615967},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.49687936902046204},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.48493126034736633},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.48070865869522095},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4665180444717407},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.46239766478538513},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.4179554879665375},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.41026195883750916},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.3244272768497467},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22576183080673218},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.1088/0268-1242/12/7/026","doi":"https://doi.org/10.1088/0268-1242/12/7/026","is_oa":false,"landing_page_url":"https://doi.org/10.1088/0268-1242/12/7/026","pdf_url":null,"source":{"id":"https://openalex.org/S106302738","display_name":"Semiconductor Science and Technology","issn_l":"0268-1242","issn":["0268-1242","1361-6641"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Semiconductor Science and Technology","raw_type":"journal-article"},{"id":"pmh:oai:alma.61MUN_INST:11136269870007891","doi":null,"is_oa":false,"landing_page_url":"https://researchportal.murdoch.edu.au/esploro/outputs/journalArticle/Fluorinated-silicon-nitride-film-for-the/991005543983207891","pdf_url":null,"source":{"id":"https://openalex.org/S4306400274","display_name":"Murdoch University Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I176790772","host_organization_name":"Murdoch University","host_organization_lineage":["https://openalex.org/I176790772"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},{"id":"pmh:oai:researchrepository.murdoch.edu.au:5211","doi":null,"is_oa":false,"landing_page_url":"http://researchrepository.murdoch.edu.au/id/eprint/5211/","pdf_url":null,"source":{"id":"https://openalex.org/S4306400274","display_name":"Murdoch University Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I176790772","host_organization_name":"Murdoch University","host_organization_lineage":["https://openalex.org/I176790772"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Jun, B-H, Han, S-S, Lee, J.S., Kim, Y-B, Kang, H-Y, Koh, Y-B, Jiang, Z-T <http://researchrepository.murdoch.edu.au/view/author/Jiang, Zhong-Tao.html>, Bae, B-S and No, K. (1999) Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography. Semiconductor Science and Technology, 12 (7). pp. 921-926.","raw_type":"Journal Article"},{"id":"mag:2515499554","doi":null,"is_oa":false,"landing_page_url":"https://researchrepository.murdoch.edu.au/id/eprint/5211/","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1612968441","https://openalex.org/W1988904294","https://openalex.org/W2051250249","https://openalex.org/W2062674119","https://openalex.org/W2132653674"],"related_works":["https://openalex.org/W2064387433","https://openalex.org/W3026102697","https://openalex.org/W2789615464","https://openalex.org/W2258241029","https://openalex.org/W2011206266","https://openalex.org/W1999706666","https://openalex.org/W1508333727","https://openalex.org/W1988079106","https://openalex.org/W2057247721","https://openalex.org/W2808853552"],"abstract_inverted_index":{"Fluorinated":[0],"silicon":[1],"nitride":[2],"film":[3],"for":[4],"the":[5],"bottom":[6],"antireflective":[7],"layer":[8],"in":[9],"quarter":[10],"micron":[11],"optical":[12],"lithography":[13],",":[14],"Byung-Hyuk":[15],"Jun,":[16],"Sang-Soo":[17],"Han,":[18],"Joon":[19],"Sung":[20],"Lee,":[21],"Yong-Beom":[22],"Kim,":[23],"Ho-Young":[24],"Kang,":[25],"Young-Bum":[26],"Koh,":[27],"Zhong-Tao":[28],"Jiang,":[29],"Byeong-Soo":[30],"Bae,":[31],"Kwangsoo":[32],"No":[33]},"counts_by_year":[{"year":2025,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}