{"id":"https://openalex.org/W1991648464","doi":"https://doi.org/10.1117/12.59772","title":"Limitation of removal particles in positive photoresist","display_name":"Limitation of removal particles in positive photoresist","publication_year":1992,"publication_date":"1992-06-01","ids":{"openalex":"https://openalex.org/W1991648464","doi":"https://doi.org/10.1117/12.59772","mag":"1991648464"},"language":"en","primary_location":{"id":"doi:10.1117/12.59772","doi":"https://doi.org/10.1117/12.59772","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.59772","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5070465477","display_name":"Shingo Asaumi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210097131","display_name":"Tokyo Ohka Kogyo (Japan)","ror":"https://ror.org/00zrr9158","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210097131"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shingo Asaumi","raw_affiliation_strings":["Tokyo Ohka Kogyo Co., Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Ohka Kogyo Co., Ltd. (Japan)","institution_ids":["https://openalex.org/I4210097131"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039648784","display_name":"Mitsuhiro Furuta","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210097131","display_name":"Tokyo Ohka Kogyo (Japan)","ror":"https://ror.org/00zrr9158","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210097131"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mitsuhiro Furuta","raw_affiliation_strings":["Tokyo Ohka Kogyo Co., Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Ohka Kogyo Co., Ltd. (Japan)","institution_ids":["https://openalex.org/I4210097131"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073984471","display_name":"Akira Yokota","orcid":"https://orcid.org/0000-0002-4722-527X","observed_orcids":["https://orcid.org/0000-0002-4722-527X","https://orcid.org/0000-0001-7488-1371"]},"institutions":[{"id":"https://openalex.org/I4210097131","display_name":"Tokyo Ohka Kogyo (Japan)","ror":"https://ror.org/00zrr9158","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210097131"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akira Yokota","raw_affiliation_strings":["Tokyo Ohka Kogyo Co., Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Ohka Kogyo Co., Ltd. (Japan)","institution_ids":["https://openalex.org/I4210097131"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210097131"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.12435847,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"1672","issue":null,"first_page":"616","last_page":"616"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9901999831199646,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9901999831199646,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10197","display_name":"Membrane Separation Technologies","score":0.00419999985024333,"subfield":{"id":"https://openalex.org/subfields/2312","display_name":"Water Science and Technology"},"field":{"id":"https://openalex.org/fields/23","display_name":"Environmental Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11708","display_name":"Photochromic and Fluorescence Chemistry","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/positive-photoresist","display_name":"positive photoresist","score":0.9879999756813049},{"id":"https://openalex.org/keywords/filter-pore-size","display_name":"filter pore size","score":0.843999981880188},{"id":"https://openalex.org/keywords/particle-size-distribution","display_name":"particle size distribution","score":0.5509999990463257},{"id":"https://openalex.org/keywords/ultrafiltration","display_name":"ultrafiltration","score":0.8109999895095825},{"id":"https://openalex.org/keywords/dynamic-light-scattering","display_name":"dynamic light scattering","score":0.828000009059906},{"id":"https://openalex.org/keywords/novolac-resin","display_name":"novolac resin","score":0.9629999995231628},{"id":"https://openalex.org/keywords/polymer-solutions","display_name":"polymer solutions","score":0.3240000009536743},{"id":"https://openalex.org/keywords/ulsi-manufacturing","display_name":"ULSI manufacturing","score":0.7509999871253967}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.9885600805282593},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7215481996536255},{"id":"https://openalex.org/C128489963","wikidata":"https://www.wikidata.org/wiki/Q1187724","display_name":"Filtration (mathematics)","level":2,"score":0.7007720470428467},{"id":"https://openalex.org/C187530423","wikidata":"https://www.wikidata.org/wiki/Q7140503","display_name":"Particle size","level":2,"score":0.6830813884735107},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.6086587905883789},{"id":"https://openalex.org/C2778517922","wikidata":"https://www.wikidata.org/wiki/Q7140482","display_name":"Particle (ecology)","level":2,"score":0.4861257076263428},{"id":"https://openalex.org/C106131492","wikidata":"https://www.wikidata.org/wiki/Q3072260","display_name":"Filter (signal processing)","level":2,"score":0.4636553227901459},{"id":"https://openalex.org/C14631669","wikidata":"https://www.wikidata.org/wiki/Q896108","display_name":"Dynamic light scattering","level":3,"score":0.41255974769592285},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.34743374586105347},{"id":"https://openalex.org/C155672457","wikidata":"https://www.wikidata.org/wiki/Q61231","display_name":"Nanoparticle","level":2,"score":0.3317108154296875},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.32517915964126587},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.31383898854255676},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3100350499153137},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.17421013116836548},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.16232255101203918},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.047047823667526245},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.59772","doi":"https://doi.org/10.1117/12.59772","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.59772","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2022657159","https://openalex.org/W2037393883","https://openalex.org/W1958298428","https://openalex.org/W2935185484","https://openalex.org/W2925639375","https://openalex.org/W7130729894","https://openalex.org/W2025708481","https://openalex.org/W4292794092","https://openalex.org/W2084317502","https://openalex.org/W3131900262"],"abstract_inverted_index":{"The":[0,126],"pore":[1,35,53,79,210],"size":[2,40,54,80,89,129,148,211,225],"of":[3,10,41,51,63,68,71,76,99,103,130,170,197,207],"membrane":[4],"filter":[5,34,57,78,209,214],"used":[6],"in":[7,90,114],"the":[8,25,39,49,52,58,61,72,74,77,82,86,91,96,115,145,195,205,208,222],"filtering":[9],"photoresist":[11,26,83,92,102,163,217],"for":[12,30,81],"ULSI":[13],"manufacturing":[14],"is":[15,45,164,218,226],"now":[16],"shifting":[17],"from":[18,194],"200":[19],"nm":[20,113,124,143,185,220],"to":[21,47,56,191],"100":[22,227],"nm,":[23],"but":[24],"end-users":[27],"are":[28,186],"asking":[29],"a":[31,122,161,165,215],"much":[32],"finer":[33],"size.":[36],"By":[37],"knowing":[38],"its":[42],"polymer":[43,168,188],"it":[44,175],"possible":[46],"know":[48],"limit":[50,206],"required":[55],"photoresist.":[59],"From":[60],"results":[62],"ultra":[64,97],"filtration":[65,84,98],"and":[66,85,144,221],"measurement":[67],"light":[69,138],"scattering":[70,139],"photoresist,":[73],"limitation":[75],"detectable":[87,223],"particle":[88,128,147,224],"were":[93,154],"determined.":[94],"In":[95],"OFPR-800":[100,131],"(positive":[101],"Tokyo":[104],"Ohka":[105],"Kogyo":[106],"Co.,":[107],"Ltd.)":[108],"molecules":[109,134],"larger":[110,156,182],"than":[111,157,183],"13.5":[112,123],"original":[116],"solution":[117,169],"have":[118],"been":[119,177,202],"removed":[120],"using":[121],"filter.":[125],"maximum":[127],"novolak":[132,198],"resin":[133],"measured":[135],"by":[136],"dynamic":[137],"spectrophotometer":[140],"was":[141,149],"32":[142,158,184],"average":[146],"5.4":[150],"nm.":[151,159,228],"Furthermore,":[152],"particles":[153,181],"observed":[155],"Because":[160],"positive":[162,216],"highly":[166],"concentrated":[167],"20":[171],"-":[172],"30":[173],"wt%":[174],"has":[176,201],"determined":[178,203],"that":[179,204,212],"those":[180],"large":[187],"groups":[189],"similar":[190],"macro-molecules":[192],"resulting":[193],"intertwisting":[196],"resin.":[199],"It":[200],"can":[213],"50":[219]},"counts_by_year":[{"year":2020,"cited_by_count":1}],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}