{"id":"https://openalex.org/W1990388797","doi":"https://doi.org/10.1016/j.surfcoat.2008.06.167","title":"Optimization of convex electrode geometry for surface discharge used for fabrication of the electrode groove on solar cells","display_name":"Optimization of convex electrode geometry for surface discharge used for fabrication of the electrode groove on solar cells","publication_year":2008,"publication_date":"2008-06-26","ids":{"openalex":"https://openalex.org/W1990388797","doi":"https://doi.org/10.1016/j.surfcoat.2008.06.167","mag":"1990388797"},"language":"en","primary_location":{"id":"doi:10.1016/j.surfcoat.2008.06.167","doi":"https://doi.org/10.1016/j.surfcoat.2008.06.167","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2008.06.167","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5010280759","display_name":"Toshiyuki Hamada","orcid":"https://orcid.org/0000-0002-6797-0963","observed_orcids":["https://orcid.org/0000-0002-6797-0963"]},"institutions":[{"id":"https://openalex.org/I118574687","display_name":"University of Miyazaki","ror":"https://ror.org/0447kww10","country_code":"JP","type":"education","lineage":["https://openalex.org/I118574687"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"T. Hamada","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan","institution_ids":["https://openalex.org/I118574687"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056971696","display_name":"Shunichi Arakawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118574687","display_name":"University of Miyazaki","ror":"https://ror.org/0447kww10","country_code":"JP","type":"education","lineage":["https://openalex.org/I118574687"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Arakawa","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan","institution_ids":["https://openalex.org/I118574687"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084490141","display_name":"Tatsuya Sakoda","orcid":"https://orcid.org/0000-0002-2027-926X","observed_orcids":["https://orcid.org/0000-0002-2027-926X"]},"institutions":[{"id":"https://openalex.org/I118574687","display_name":"University of Miyazaki","ror":"https://ror.org/0447kww10","country_code":"JP","type":"education","lineage":["https://openalex.org/I118574687"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Sakoda","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan","institution_ids":["https://openalex.org/I118574687"]}]},{"author_position":"middle","author":{"id":null,"display_name":"M. Otsubo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I118574687","display_name":"University of Miyazaki","ror":"https://ror.org/0447kww10","country_code":"JP","type":"education","lineage":["https://openalex.org/I118574687"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Otsubo","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, University of Miyazaki 1-1 Gakuenkibanadai-Nishi, Miyazaki 889-2192, Japan","institution_ids":["https://openalex.org/I118574687"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053128484","display_name":"Kazuo Matsui","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Matsui","raw_affiliation_strings":["M. SETEK Co.,Ltd., Daiwa Bldg.,3-6-16 Yanaka, Taito-ku, Tokyo 110-0001, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"M. SETEK Co.,Ltd., Daiwa Bldg.,3-6-16 Yanaka, Taito-ku, Tokyo 110-0001, Japan","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5051628470","display_name":"Kazuo Nagasawa","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Nagasawa","raw_affiliation_strings":["M. SETEK Co.,Ltd., Daiwa Bldg.,3-6-16 Yanaka, Taito-ku, Tokyo 110-0001, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"M. SETEK Co.,Ltd., Daiwa Bldg.,3-6-16 Yanaka, Taito-ku, Tokyo 110-0001, Japan","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5010280759"],"corresponding_institution_ids":["https://openalex.org/I118574687"],"apc_list":{"value":3880,"currency":"USD","value_usd":3880},"apc_paid":null,"fwci":0.6703,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.63384206,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"202","issue":"22-23","first_page":"5405","last_page":"5409"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.004000000189989805,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.003100000089034438,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/surface-discharge","display_name":"surface discharge","score":0.734000027179718},{"id":"https://openalex.org/keywords/solar-cells","display_name":"solar cells","score":0.8569999933242798},{"id":"https://openalex.org/keywords/silicon-nitride-films","display_name":"silicon nitride thin films","score":0.8989999890327454},{"id":"https://openalex.org/keywords/groove-width","display_name":"groove width","score":0.5080000162124634},{"id":"https://openalex.org/keywords/radical-diffusion","display_name":"radical diffusion","score":0.6990000009536743},{"id":"https://openalex.org/keywords/streamer-length","display_name":"streamer length","score":0.8949999809265137},{"id":"https://openalex.org/keywords/electrode-shape-optimization","display_name":"electrode geometry optimization","score":0.41999998688697815}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8192800879478455},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.8111064434051514},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6405218839645386},{"id":"https://openalex.org/C2779472054","wikidata":"https://www.wikidata.org/wiki/Q2377973","display_name":"Groove (engineering)","level":2,"score":0.6287273168563843},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6004230976104736},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.5689154863357544},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.5517190098762512},{"id":"https://openalex.org/C2780824857","wikidata":"https://www.wikidata.org/wiki/Q58803","display_name":"Solar cell","level":2,"score":0.48985788226127625},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.44132310152053833},{"id":"https://openalex.org/C89448510","wikidata":"https://www.wikidata.org/wiki/Q58313","display_name":"Dielectric barrier discharge","level":3,"score":0.4308677315711975},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.406552255153656},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3600461483001709},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.30305320024490356},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.1285935938358307},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.08681696653366089},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.07308691740036011},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.surfcoat.2008.06.167","doi":"https://doi.org/10.1016/j.surfcoat.2008.06.167","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2008.06.167","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.5690000057220459}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W1973960224","https://openalex.org/W1982974932","https://openalex.org/W2028253357"],"related_works":["https://openalex.org/W2021357420","https://openalex.org/W2147226699","https://openalex.org/W2092818868","https://openalex.org/W2030305689","https://openalex.org/W1982974932","https://openalex.org/W2037228858","https://openalex.org/W1979245537","https://openalex.org/W3035347779","https://openalex.org/W2056983920","https://openalex.org/W2059879540"],"abstract_inverted_index":null,"counts_by_year":[{"year":2012,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}