{"id":"https://openalex.org/W1989999686","doi":"https://doi.org/10.1016/j.surfcoat.2009.09.034","title":"Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons","display_name":"Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons","publication_year":2009,"publication_date":"2009-10-05","ids":{"openalex":"https://openalex.org/W1989999686","doi":"https://doi.org/10.1016/j.surfcoat.2009.09.034","mag":"1989999686"},"language":"en","primary_location":{"id":"doi:10.1016/j.surfcoat.2009.09.034","doi":"https://doi.org/10.1016/j.surfcoat.2009.09.034","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2009.09.034","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5019359896","display_name":"Frank Richter","orcid":"https://orcid.org/0000-0003-2547-7676","observed_orcids":["https://orcid.org/0000-0003-2547-7676"]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"F. Richter","raw_affiliation_strings":["Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":null,"display_name":"T. Welzel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"T. Welzel","raw_affiliation_strings":["Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030916616","display_name":"Ronny Kleinhempel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"R. Kleinhempel","raw_affiliation_strings":["Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110162016","display_name":"Th. Dunger","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"T. Dunger","raw_affiliation_strings":["Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemnitz University of Technology, Institute of Physics, D-09107, Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034800522","display_name":"T. Knoth","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"T. Knoth","raw_affiliation_strings":["Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089045456","display_name":"M. Dimer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"M. Dimer","raw_affiliation_strings":["Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5067728242","display_name":"F. Milde","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"F. Milde","raw_affiliation_strings":["Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Von Ardenne Anlagentechnik GmbH, Plattleite 19/29, D-01324 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5019359896"],"corresponding_institution_ids":["https://openalex.org/I2610724"],"apc_list":{"value":3880,"currency":"USD","value_usd":3880},"apc_paid":null,"fwci":4.4908,"has_fulltext":false,"cited_by_count":34,"citation_normalized_percentile":{"value":0.94068741,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"204","issue":"6-7","first_page":"845","last_page":"849"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9208999872207642,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9208999872207642,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.014100000262260437,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.01080000028014183,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ion-energy-distribution-function","display_name":"ion energy distribution function","score":0.8330000042915344},{"id":"https://openalex.org/keywords/aluminum-doped-zinc-oxide","display_name":"Al-doped ZnO","score":0.8930000066757202},{"id":"https://openalex.org/keywords/magnetron-sputtering","display_name":"magnetron sputtering","score":0.9049999713897705},{"id":"https://openalex.org/keywords/planar-magnetron","display_name":"planar magnetron","score":0.9919999837875366},{"id":"https://openalex.org/keywords/anions","display_name":"negative ions","score":0.4880000054836273},{"id":"https://openalex.org/keywords/cations","display_name":"cations","score":0.765999972820282},{"id":"https://openalex.org/keywords/discharge-power-dependence","display_name":"discharge power dependence","score":0.6119999885559082},{"id":"https://openalex.org/keywords/target-voltage","display_name":"target voltage","score":0.37299999594688416}],"concepts":[{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.743620753288269},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7120274901390076},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.6715890169143677},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.6234111189842224},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.5739666819572449},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5659039616584778},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5187292695045471},{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.5187066197395325},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4873989224433899},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.45816949009895325},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.44716203212738037},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.17435261607170105},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.16971713304519653},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10648536682128906},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09963718056678772},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.surfcoat.2009.09.034","doi":"https://doi.org/10.1016/j.surfcoat.2009.09.034","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.surfcoat.2009.09.034","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320300","display_name":"European Commission","ror":"https://ror.org/00k4n6c32"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1972528599","https://openalex.org/W1981966175","https://openalex.org/W1988669945","https://openalex.org/W1993020011","https://openalex.org/W1996566222","https://openalex.org/W1997000695","https://openalex.org/W2003262087","https://openalex.org/W2006124169","https://openalex.org/W2050199135","https://openalex.org/W2051955688","https://openalex.org/W2057004806","https://openalex.org/W2060525630","https://openalex.org/W2061587639","https://openalex.org/W2065170440","https://openalex.org/W2065701669","https://openalex.org/W2071306715","https://openalex.org/W2080147784","https://openalex.org/W2117608580","https://openalex.org/W4211093388","https://openalex.org/W4404711402"],"related_works":["https://openalex.org/W2050199135","https://openalex.org/W4380446512","https://openalex.org/W1993176620","https://openalex.org/W2032654226","https://openalex.org/W2035386725","https://openalex.org/W2051526822","https://openalex.org/W2051397890","https://openalex.org/W2071974251","https://openalex.org/W2096277584","https://openalex.org/W2075726738"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2019,"cited_by_count":3},{"year":2017,"cited_by_count":3},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":5}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}