{"id":"https://openalex.org/W1986210010","doi":"https://doi.org/10.1016/j.apsusc.2006.06.054","title":"Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair","display_name":"Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair","publication_year":2006,"publication_date":"2006-08-01","ids":{"openalex":"https://openalex.org/W1986210010","doi":"https://doi.org/10.1016/j.apsusc.2006.06.054","mag":"1986210010"},"language":"en","primary_location":{"id":"doi:10.1016/j.apsusc.2006.06.054","doi":"https://doi.org/10.1016/j.apsusc.2006.06.054","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2006.06.054","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W1986210010"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5088978762","display_name":"J.B. Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I39534123","display_name":"Gwangju Institute of Science and Technology","ror":"https://ror.org/024kbgz78","country_code":"KR","type":"education","lineage":["https://openalex.org/I39534123"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"J.B. Park","raw_affiliation_strings":["Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-dong Buk-gu, Gwangju 500-712, Republic of Korea","Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-Dong, Buk-Gu, Gwangju 500-712, Republic of Korea#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-dong Buk-gu, Gwangju 500-712, Republic of Korea","institution_ids":["https://openalex.org/I39534123"]},{"raw_affiliation_string":"Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-Dong, Buk-Gu, Gwangju 500-712, Republic of Korea#TAB#","institution_ids":["https://openalex.org/I39534123"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022944492","display_name":"C.J. Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"C.J. Kim","raw_affiliation_strings":["LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073312365","display_name":"P.E. Shin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"P.E. Shin","raw_affiliation_strings":["LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030918070","display_name":"Sehyun Park","orcid":"https://orcid.org/0009-0004-2061-0540","observed_orcids":["https://orcid.org/0009-0004-2061-0540"]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"S.H. Park","raw_affiliation_strings":["LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024615743","display_name":"Hee\u2010Jin Kang","orcid":"https://orcid.org/0000-0002-7194-9307","observed_orcids":["https://orcid.org/0000-0002-7194-9307","https://orcid.org/0009-0005-9707-726X"]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"H.S. Kang","raw_affiliation_strings":["LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Production Engineering Research Center, Pyungtaek Kyunggido 451-713, Republic of Korea","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5030378654","display_name":"Sungho Jeong","orcid":"https://orcid.org/0000-0001-9374-118X","observed_orcids":["https://orcid.org/0000-0001-9374-118X"]},"institutions":[{"id":"https://openalex.org/I39534123","display_name":"Gwangju Institute of Science and Technology","ror":"https://ror.org/024kbgz78","country_code":"KR","type":"education","lineage":["https://openalex.org/I39534123"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"S.H. Jeong","raw_affiliation_strings":["Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-dong Buk-gu, Gwangju 500-712, Republic of Korea","Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-Dong, Buk-Gu, Gwangju 500-712, Republic of Korea#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-dong Buk-gu, Gwangju 500-712, Republic of Korea","institution_ids":["https://openalex.org/I39534123"]},{"raw_affiliation_string":"Department of Mechatronics, Gwangju Institute of Science and Technology, 1 Oryong-Dong, Buk-Gu, Gwangju 500-712, Republic of Korea#TAB#","institution_ids":["https://openalex.org/I39534123"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5030378654"],"corresponding_institution_ids":["https://openalex.org/I39534123"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":2.5568,"has_fulltext":false,"cited_by_count":17,"citation_normalized_percentile":{"value":0.88560148,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"253","issue":"2","first_page":"1029","last_page":"1035"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.635699987411499,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.635699987411499,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.08829999715089798,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.07880000025033951,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/laser-chemical-vapor-deposition","display_name":"laser chemical vapor deposition","score":0.9959999918937683},{"id":"https://openalex.org/keywords/tungsten-interconnects","display_name":"tungsten interconnects","score":0.7979999780654907},{"id":"https://openalex.org/keywords/glass-substrates","display_name":"glass substrates","score":0.4020000100135803},{"id":"https://openalex.org/keywords/tungsten-hexacarbonyl","display_name":"tungsten hexacarbonyl","score":0.843999981880188},{"id":"https://openalex.org/keywords/nd-ylf-laser","display_name":"Nd:YLF laser","score":0.7910000085830688},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.7900000214576721}],"concepts":[{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.7798589468002319},{"id":"https://openalex.org/C128019096","wikidata":"https://www.wikidata.org/wiki/Q83341","display_name":"Liquid-crystal display","level":2,"score":0.5759739875793457},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5370202660560608},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.5076159238815308},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.46768882870674133},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3964288830757141},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3428226709365845},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3095191717147827},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.24211865663528442},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.18158769607543945},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.apsusc.2006.06.054","doi":"https://doi.org/10.1016/j.apsusc.2006.06.054","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2006.06.054","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W655150850","https://openalex.org/W1543784908","https://openalex.org/W1965697194","https://openalex.org/W1980471807","https://openalex.org/W1984903492","https://openalex.org/W2001022972","https://openalex.org/W2008787854","https://openalex.org/W2009938630","https://openalex.org/W2019214186","https://openalex.org/W2032885042","https://openalex.org/W2040106263","https://openalex.org/W2040637314","https://openalex.org/W2043007350","https://openalex.org/W2046874171","https://openalex.org/W2049282791","https://openalex.org/W2053818660","https://openalex.org/W2063966916","https://openalex.org/W2076843295","https://openalex.org/W2089490405","https://openalex.org/W2091701841","https://openalex.org/W4205128711"],"related_works":["https://openalex.org/W1496247155","https://openalex.org/W827140089","https://openalex.org/W2087956612","https://openalex.org/W2980213912","https://openalex.org/W2068889299","https://openalex.org/W2001022972","https://openalex.org/W2949632704","https://openalex.org/W1976033940"],"abstract_inverted_index":null,"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":3},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":1}],"updated_date":"2026-11-14T11:04:58.165337","created_date":"2016-06-24T00:00:00"}
