{"id":"https://openalex.org/W1985303633","doi":"https://doi.org/10.1016/s0043-1648(98)00394-9","title":"Structure and tribological behaviour of carbon nitride films","display_name":"Structure and tribological behaviour of carbon nitride films","publication_year":1999,"publication_date":"1999-04-01","ids":{"openalex":"https://openalex.org/W1985303633","doi":"https://doi.org/10.1016/s0043-1648(98)00394-9","mag":"1985303633"},"language":"en","primary_location":{"id":"doi:10.1016/s0043-1648(98)00394-9","doi":"https://doi.org/10.1016/s0043-1648(98)00394-9","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0043-1648(98)00394-9","pdf_url":null,"source":{"id":"https://openalex.org/S16737290","display_name":"Wear","issn_l":"0043-1648","issn":["0043-1648","1873-2577"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-3","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Wear","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101584602","display_name":"Jun Wei","orcid":"https://orcid.org/0000-0002-6726-1972","observed_orcids":["https://orcid.org/0000-0002-6726-1972","https://orcid.org/0000-0002-9583-1346","https://orcid.org/0009-0001-2274-8824","https://orcid.org/0009-0003-8096-2137","https://orcid.org/0009-0006-4796-1660"]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"J Wei","raw_affiliation_strings":["Gintic Institute of Manufacturing Technology, 71 Nanyang Drive, Singapore 638075, Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Gintic Institute of Manufacturing Technology, 71 Nanyang Drive, Singapore 638075, Singapore","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055957920","display_name":"Peter Hing","orcid":"https://orcid.org/0000-0003-0292-7291","observed_orcids":["https://orcid.org/0000-0003-0292-7291"]},"institutions":[{"id":"https://openalex.org/I172675005","display_name":"Nanyang Technological University","ror":"https://ror.org/02e7b5302","country_code":"SG","type":"education","lineage":["https://openalex.org/I172675005"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"P Hing","raw_affiliation_strings":["School of Applied Science, AMRC, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Applied Science, AMRC, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore","institution_ids":["https://openalex.org/I172675005"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103112364","display_name":"Z. Q. Mo","orcid":"https://orcid.org/0009-0009-4771-539X","observed_orcids":["https://orcid.org/0009-0009-4771-539X"]},"institutions":[{"id":"https://openalex.org/I2801096481","display_name":"Standards, Productivity and Innovation Board","ror":"https://ror.org/02capbb49","country_code":"SG","type":"government","lineage":["https://openalex.org/I2801096481"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Z.Q Mo","raw_affiliation_strings":["Material Processing Centre, Singapore Productivity and Standards Board, PSB Building, 2 Bukit Merah Central, Singapore 159835, Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Material Processing Centre, Singapore Productivity and Standards Board, PSB Building, 2 Bukit Merah Central, Singapore 159835, Singapore","institution_ids":["https://openalex.org/I2801096481"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5101584602"],"corresponding_institution_ids":[],"apc_list":{"value":4370,"currency":"EUR","value_usd":5394},"apc_paid":null,"fwci":6.684,"has_fulltext":false,"cited_by_count":41,"citation_normalized_percentile":{"value":0.97391994,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"225-229","issue":null,"first_page":"1141","last_page":"1147"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13470","display_name":"Surface Treatment and Coatings","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12362","display_name":"Tribology and Wear Analysis","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/carbon-nitride-films","display_name":"carbon nitride films","score":0.9330000281333923},{"id":"https://openalex.org/keywords/beta-c3n4","display_name":"\u03b2-C3N4","score":0.9789999723434448},{"id":"https://openalex.org/keywords/unbalanced-magnetron-sputtering","display_name":"unbalanced magnetron sputtering","score":0.925000011920929},{"id":"https://openalex.org/keywords/reactive-deposition","display_name":"reactive deposition","score":0.7329999804496765},{"id":"https://openalex.org/keywords/graphite-target","display_name":"graphite target","score":0.7509999871253967},{"id":"https://openalex.org/keywords/si-100-substrate","display_name":"Si(100) substrate","score":0.7540000081062317},{"id":"https://openalex.org/keywords/single-crystal-growth","display_name":"single crystal growth","score":0.4690000116825104},{"id":"https://openalex.org/keywords/nuclear-to-cytoplasmic-ratio","display_name":"nuclear-cytoplasmic ratio","score":0.8119999766349792},{"id":"https://openalex.org/keywords/friction-coefficient","display_name":"friction coefficient","score":0.6359999775886536},{"id":"https://openalex.org/keywords/wear-resistance","display_name":"wear resistance","score":0.9850000143051147},{"id":"https://openalex.org/keywords/wear-mechanisms","display_name":"wear mechanisms","score":0.8399999737739563},{"id":"https://openalex.org/keywords/ball-on-disc-wear-testing","display_name":"ball-on-disc wear testing","score":0.8149999976158142},{"id":"https://openalex.org/keywords/normal-load","display_name":"normal load","score":0.3619999885559082},{"id":"https://openalex.org/keywords/sliding-velocity","display_name":"sliding velocity","score":0.9290000200271606}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8765921592712402},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.8292652368545532},{"id":"https://openalex.org/C2777492770","wikidata":"https://www.wikidata.org/wiki/Q5037986","display_name":"Carbon nitride","level":4,"score":0.7198019623756409},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.6922731399536133},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.5808067321777344},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5671990513801575},{"id":"https://openalex.org/C194760766","wikidata":"https://www.wikidata.org/wiki/Q410851","display_name":"Nitride","level":3,"score":0.5630450248718262},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5277652740478516},{"id":"https://openalex.org/C167310744","wikidata":"https://www.wikidata.org/wiki/Q193870","display_name":"Tribology","level":2,"score":0.5225341320037842},{"id":"https://openalex.org/C2779698641","wikidata":"https://www.wikidata.org/wiki/Q5309","display_name":"Graphite","level":2,"score":0.4742397665977478},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.46810388565063477},{"id":"https://openalex.org/C75937256","wikidata":"https://www.wikidata.org/wiki/Q1440781","display_name":"Carbon film","level":3,"score":0.45937028527259827},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4553353190422058},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.44268521666526794},{"id":"https://openalex.org/C140205800","wikidata":"https://www.wikidata.org/wiki/Q5860","display_name":"Carbon fibers","level":3,"score":0.4254198968410492},{"id":"https://openalex.org/C140721634","wikidata":"https://www.wikidata.org/wiki/Q1363437","display_name":"Dry lubricant","level":3,"score":0.42408353090286255},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.360288143157959},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.2648642659187317},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.18681055307388306},{"id":"https://openalex.org/C104779481","wikidata":"https://www.wikidata.org/wiki/Q50707","display_name":"Composite number","level":2,"score":0.08519026637077332},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.07958704233169556},{"id":"https://openalex.org/C65165184","wikidata":"https://www.wikidata.org/wiki/Q218831","display_name":"Photocatalysis","level":3,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0043-1648(98)00394-9","doi":"https://doi.org/10.1016/s0043-1648(98)00394-9","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0043-1648(98)00394-9","pdf_url":null,"source":{"id":"https://openalex.org/S16737290","display_name":"Wear","issn_l":"0043-1648","issn":["0043-1648","1873-2577"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-3","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Wear","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320332265","display_name":"National Science Board","ror":"https://ror.org/00apvva27"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":26,"referenced_works":["https://openalex.org/W1578608441","https://openalex.org/W1601817229","https://openalex.org/W1975993919","https://openalex.org/W1989101453","https://openalex.org/W1992425008","https://openalex.org/W2004450287","https://openalex.org/W2014437286","https://openalex.org/W2017121008","https://openalex.org/W2019757775","https://openalex.org/W2027548111","https://openalex.org/W2033512877","https://openalex.org/W2034425361","https://openalex.org/W2038015091","https://openalex.org/W2041301890","https://openalex.org/W2047267249","https://openalex.org/W2052698364","https://openalex.org/W2053739081","https://openalex.org/W2054223305","https://openalex.org/W2062402920","https://openalex.org/W2069498392","https://openalex.org/W2082100931","https://openalex.org/W2083228798","https://openalex.org/W2091374392","https://openalex.org/W2092332261","https://openalex.org/W2117636701","https://openalex.org/W2768306939"],"related_works":["https://openalex.org/W2382256841","https://openalex.org/W2068771813","https://openalex.org/W2067852434","https://openalex.org/W2019575593","https://openalex.org/W3034667311","https://openalex.org/W2016506821","https://openalex.org/W2048010466","https://openalex.org/W2043129891","https://openalex.org/W1989486909","https://openalex.org/W2000975460"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}