{"id":"https://openalex.org/W1985115267","doi":"https://doi.org/10.1016/s0257-8972(99)00486-7","title":"Dynamics of a pulsed DC discharge used for plasma-assisted chemical vapor deposition \u2014 a case study for titanium nitride deposition","display_name":"Dynamics of a pulsed DC discharge used for plasma-assisted chemical vapor deposition \u2014 a case study for titanium nitride deposition","publication_year":1999,"publication_date":"1999-11-01","ids":{"openalex":"https://openalex.org/W1985115267","doi":"https://doi.org/10.1016/s0257-8972(99)00486-7","mag":"1985115267"},"language":"en","primary_location":{"id":"doi:10.1016/s0257-8972(99)00486-7","doi":"https://doi.org/10.1016/s0257-8972(99)00486-7","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0257-8972(99)00486-7","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5059294673","display_name":"T.A. Beer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"T.A. Beer","raw_affiliation_strings":["Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria","institution_ids":["https://openalex.org/I145847075"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5074066533","display_name":"J. Laimer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":true,"raw_author_name":"J. Laimer","raw_affiliation_strings":["Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria","institution_ids":["https://openalex.org/I145847075"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5043825977","display_name":"H. St\u00f6ri","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I145847075","display_name":"TU Wien","ror":"https://ror.org/04d836q62","country_code":"AT","type":"education","lineage":["https://openalex.org/I145847075"]}],"countries":["AT"],"is_corresponding":false,"raw_author_name":"H. St\u00f6ri","raw_affiliation_strings":["Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut f\u00fcr Allgemeine Physik, Technische Universit\u00e4t Wien, Wiedner Hauptstra\u00dfe 8-10, A-1040 Wien, Austria","institution_ids":["https://openalex.org/I145847075"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5074066533"],"corresponding_institution_ids":["https://openalex.org/I145847075"],"apc_list":{"value":3880,"currency":"USD","value_usd":3880},"apc_paid":null,"fwci":3.1066,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.90108641,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":null,"biblio":{"volume":"120-121","issue":null,"first_page":"331","last_page":"336"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9667999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9667999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10642","display_name":"Plasma Applications and Diagnostics","score":0.022099999710917473,"subfield":{"id":"https://openalex.org/subfields/2741","display_name":"Radiology, Nuclear Medicine and Imaging"},"field":{"id":"https://openalex.org/fields/27","display_name":"Medicine"},"domain":{"id":"https://openalex.org/domains/4","display_name":"Health Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.00800000037997961,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/pulsed-dc-discharge","display_name":"pulsed DC discharge","score":0.9929999709129333},{"id":"https://openalex.org/keywords/plasma-enhanced-chemical-vapor-deposition","display_name":"plasma-enhanced chemical vapor deposition","score":0.9990000128746033},{"id":"https://openalex.org/keywords/plasma-emission-spectra","display_name":"plasma emission spectra","score":0.6620000004768372},{"id":"https://openalex.org/keywords/plasma-potential","display_name":"plasma electric potential","score":0.8100000023841858},{"id":"https://openalex.org/keywords/ticl4-precursor","display_name":"TiCl4 precursor","score":0.6800000071525574},{"id":"https://openalex.org/keywords/cathode-geometry","display_name":"cathode geometry","score":0.949999988079071},{"id":"https://openalex.org/keywords/plasma-power-density","display_name":"plasma power density","score":0.7649999856948853},{"id":"https://openalex.org/keywords/deposition-uniformity","display_name":"deposition uniformity","score":0.6150000095367432}],"concepts":[{"id":"https://openalex.org/C49110097","wikidata":"https://www.wikidata.org/wiki/Q175233","display_name":"Cathode","level":2,"score":0.7909505367279053},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7728019952774048},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.7219917178153992},{"id":"https://openalex.org/C2781083372","wikidata":"https://www.wikidata.org/wiki/Q7259687","display_name":"Pulsed DC","level":5,"score":0.587608277797699},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5772615075111389},{"id":"https://openalex.org/C176118016","wikidata":"https://www.wikidata.org/wiki/Q903002","display_name":"Langmuir probe","level":4,"score":0.5550572276115417},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.5367160439491272},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.4955059289932251},{"id":"https://openalex.org/C194760766","wikidata":"https://www.wikidata.org/wiki/Q410851","display_name":"Nitride","level":3,"score":0.44643956422805786},{"id":"https://openalex.org/C2778489163","wikidata":"https://www.wikidata.org/wiki/Q415638","display_name":"Titanium nitride","level":4,"score":0.44401827454566956},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.44173792004585266},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.35853466391563416},{"id":"https://openalex.org/C43503373","wikidata":"https://www.wikidata.org/wiki/Q7201771","display_name":"Plasma diagnostics","level":3,"score":0.3142591118812561},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3044632077217102},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.25329023599624634},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.22624745965003967},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.1898198127746582},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.11515209078788757},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.11415964365005493},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.10697105526924133},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0257-8972(99)00486-7","doi":"https://doi.org/10.1016/s0257-8972(99)00486-7","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0257-8972(99)00486-7","pdf_url":null,"source":{"id":"https://openalex.org/S76010543","display_name":"Surface and Coatings Technology","issn_l":"0257-8972","issn":["0257-8972","1879-3347"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-2","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Coatings Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321181","display_name":"Austrian Science Fund","ror":"https://ror.org/013tf3c58"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1973511932","https://openalex.org/W1979117339","https://openalex.org/W1992311466","https://openalex.org/W2005906052","https://openalex.org/W2015396892","https://openalex.org/W2020736865","https://openalex.org/W2025869964","https://openalex.org/W2042067944","https://openalex.org/W2055819396","https://openalex.org/W2068261594","https://openalex.org/W2071232243","https://openalex.org/W2095448186","https://openalex.org/W2129973322"],"related_works":["https://openalex.org/W2022166945","https://openalex.org/W1998292662","https://openalex.org/W1995980874","https://openalex.org/W2050889580","https://openalex.org/W2095448186","https://openalex.org/W1979217515","https://openalex.org/W2042067944","https://openalex.org/W2051490722","https://openalex.org/W2053440016","https://openalex.org/W2068261594"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}