{"id":"https://openalex.org/W1984615795","doi":"https://doi.org/10.1016/j.msec.2005.09.088","title":"Electronic properties of silicon nanoneedle structure obtained by RIE for nonvolatile memory applications","display_name":"Electronic properties of silicon nanoneedle structure obtained by RIE for nonvolatile memory applications","publication_year":2005,"publication_date":"2005-11-09","ids":{"openalex":"https://openalex.org/W1984615795","doi":"https://doi.org/10.1016/j.msec.2005.09.088","mag":"1984615795"},"language":"en","primary_location":{"id":"doi:10.1016/j.msec.2005.09.088","doi":"https://doi.org/10.1016/j.msec.2005.09.088","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.msec.2005.09.088","pdf_url":null,"source":{"id":"https://openalex.org/S43139658","display_name":"Materials Science and Engineering C","issn_l":"0928-4931","issn":["0928-4931","1873-0191"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","ki-jl-1","poland-20","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science and Engineering: C","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5048187754","display_name":"Sungwook Jung","orcid":"https://orcid.org/0000-0001-8012-190X","observed_orcids":["https://orcid.org/0000-0001-8012-190X"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sungwook Jung","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103429397","display_name":"Jinsu Yoo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jinsu Yoo","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000808264","display_name":"Yungkuk Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yungkuk Kim","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046917879","display_name":"Kyunghae Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyunghae Kim","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089663068","display_name":"Suresh Kumar Dhungel","orcid":"https://orcid.org/0000-0001-8255-9913","observed_orcids":["https://orcid.org/0000-0001-8255-9913"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"S.K. Dhungel","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5026986287","display_name":"Junsin Yi","orcid":"https://orcid.org/0000-0002-6196-0035","observed_orcids":["https://orcid.org/0000-0002-6196-0035"]},"institutions":[{"id":"https://openalex.org/I848706","display_name":"Sungkyunkwan University","ror":"https://ror.org/04q78tk20","country_code":"KR","type":"education","lineage":["https://openalex.org/I848706"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"J. Yi","raw_affiliation_strings":["School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of information and communication Engineering Sungkyunkwan University, 300 Chun chun dong, Jangan gu, Suwon-440746, South Korea","institution_ids":["https://openalex.org/I848706"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5026986287"],"corresponding_institution_ids":["https://openalex.org/I848706"],"apc_list":{"value":3560,"currency":"USD","value_usd":3560},"apc_paid":null,"fwci":0.7314,"has_fulltext":false,"cited_by_count":12,"citation_normalized_percentile":{"value":0.65484825,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"26","issue":"5-7","first_page":"813","last_page":"817"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11169","display_name":"Silicon Nanostructures and Photoluminescence","score":0.6685000061988831,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11169","display_name":"Silicon Nanostructures and Photoluminescence","score":0.6685000061988831,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.07810000330209732,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.0681999996304512,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.972000002861023},{"id":"https://openalex.org/keywords/anisotropic-etching","display_name":"anisotropic etching","score":0.7649999856948853},{"id":"https://openalex.org/keywords/sf6-o2-plasma","display_name":"SF6/O2 plasma","score":0.7549999952316284},{"id":"https://openalex.org/keywords/non-volatile-memory","display_name":"non-volatile memory","score":0.7940000295639038},{"id":"https://openalex.org/keywords/nanocrystalline-silicon","display_name":"nanocrystalline silicon","score":0.8899999856948853},{"id":"https://openalex.org/keywords/columnar-microstructure","display_name":"columnar microstructure","score":0.777999997138977},{"id":"https://openalex.org/keywords/rf-power-effects","display_name":"RF power effects","score":0.6349999904632568},{"id":"https://openalex.org/keywords/photoluminescence","display_name":"photoluminescence","score":0.859000027179718},{"id":"https://openalex.org/keywords/capacitance-voltage-characteristics","display_name":"capacitance-voltage characteristics","score":0.9739999771118164},{"id":"https://openalex.org/keywords/mos-capacitors","display_name":"MOS capacitors","score":0.9729999899864197},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.6330000162124634}],"concepts":[{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.7877087593078613},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7575023174285889},{"id":"https://openalex.org/C2776540687","wikidata":"https://www.wikidata.org/wiki/Q6964081","display_name":"Nanoneedle","level":3,"score":0.7480151653289795},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.73764568567276},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.725464403629303},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6271913051605225},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.5714797973632812},{"id":"https://openalex.org/C172120300","wikidata":"https://www.wikidata.org/wiki/Q1134348","display_name":"Volumetric flow rate","level":2,"score":0.5262134075164795},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.5144720077514648},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.43100807070732117},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.40858370065689087},{"id":"https://openalex.org/C186187911","wikidata":"https://www.wikidata.org/wiki/Q1093894","display_name":"Nanostructure","level":2,"score":0.30176520347595215},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.19008305668830872},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.14178583025932312},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.msec.2005.09.088","doi":"https://doi.org/10.1016/j.msec.2005.09.088","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.msec.2005.09.088","pdf_url":null,"source":{"id":"https://openalex.org/S43139658","display_name":"Materials Science and Engineering C","issn_l":"0928-4931","issn":["0928-4931","1873-0191"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","ki-jl-1","poland-20","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science and Engineering: C","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W1964120731","https://openalex.org/W1966368446","https://openalex.org/W1982030316","https://openalex.org/W1986756585","https://openalex.org/W1987298500","https://openalex.org/W2021122851","https://openalex.org/W2040547851","https://openalex.org/W2044326847","https://openalex.org/W2059694985","https://openalex.org/W2064167001","https://openalex.org/W2067555610","https://openalex.org/W2073292241","https://openalex.org/W2082450466","https://openalex.org/W2142796540","https://openalex.org/W2484221342"],"related_works":["https://openalex.org/W2154899824","https://openalex.org/W4389880040","https://openalex.org/W2062752212","https://openalex.org/W1525899625","https://openalex.org/W872470823","https://openalex.org/W2049335806","https://openalex.org/W2567325910","https://openalex.org/W1983676159","https://openalex.org/W2067605586","https://openalex.org/W2044586127"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-06-21T06:12:48.119943","created_date":"2016-06-24T00:00:00"}