{"id":"https://openalex.org/W1982943147","doi":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","title":"Accelerated Degradation Test of Indium Tin Oxide (ITO) Thin Films Deposited by RF Magnetron Sputter","display_name":"Accelerated Degradation Test of Indium Tin Oxide (ITO) Thin Films Deposited by RF Magnetron Sputter","publication_year":2006,"publication_date":"2006-08-01","ids":{"openalex":"https://openalex.org/W1982943147","doi":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","mag":"1982943147"},"language":"en","primary_location":{"id":"doi:10.4028/www.scientific.net/kem.317-318.577","doi":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","pdf_url":null,"source":{"id":"https://openalex.org/S75411654","display_name":"Key engineering materials","issn_l":"1013-9826","issn":["1013-9826","1662-9795","1662-9809"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","vabb-shw"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Key Engineering Materials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"hybrid","oa_url":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5032218864","display_name":"Hyun Gyu Shin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165268","display_name":"Korea Testing Laboratory","ror":"https://ror.org/05aykjy67","country_code":"KR","type":"facility","lineage":["https://openalex.org/I4210165268"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyun Gyu Shin","raw_affiliation_strings":["Korea Testing Laboratory"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Testing Laboratory","institution_ids":["https://openalex.org/I4210165268"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070718387","display_name":"Yong Nam Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165268","display_name":"Korea Testing Laboratory","ror":"https://ror.org/05aykjy67","country_code":"KR","type":"facility","lineage":["https://openalex.org/I4210165268"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yong Nam Kim","raw_affiliation_strings":["Korea Testing Laboratory"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Testing Laboratory","institution_ids":["https://openalex.org/I4210165268"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016427924","display_name":"Jun\u2010Kwang Song","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165268","display_name":"Korea Testing Laboratory","ror":"https://ror.org/05aykjy67","country_code":"KR","type":"facility","lineage":["https://openalex.org/I4210165268"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jun Kwang Song","raw_affiliation_strings":["Korea Testing Laboratory"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Testing Laboratory","institution_ids":["https://openalex.org/I4210165268"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5108408737","display_name":"Hee Soo Lee","orcid":"https://orcid.org/0000-0002-3061-7453","observed_orcids":["https://orcid.org/0000-0002-3061-7453"]},"institutions":[{"id":"https://openalex.org/I4210165268","display_name":"Korea Testing Laboratory","ror":"https://ror.org/05aykjy67","country_code":"KR","type":"facility","lineage":["https://openalex.org/I4210165268"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hee Soo Lee","raw_affiliation_strings":["Korea Testing Laboratory"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Testing Laboratory","institution_ids":["https://openalex.org/I4210165268"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210165268"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.16253661,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":"317-318","issue":null,"first_page":"577","last_page":"580"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.274399995803833,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.274399995803833,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.23180000483989716,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.21400000154972076,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/indium-tin-oxide","display_name":"indium tin oxide","score":0.9879999756813049},{"id":"https://openalex.org/keywords/transparent-conducting-oxide-thin-films","display_name":"transparent conducting oxide thin films","score":0.7059999704360962},{"id":"https://openalex.org/keywords/thermal-degradation","display_name":"thermal degradation","score":0.9459999799728394},{"id":"https://openalex.org/keywords/accelerated-degradation-testing","display_name":"accelerated degradation testing","score":0.9549999833106995},{"id":"https://openalex.org/keywords/lifetime-prediction","display_name":"lifetime prediction","score":0.7149999737739563},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.7879999876022339},{"id":"https://openalex.org/keywords/carrier-concentration","display_name":"carrier concentration","score":0.890999972820282},{"id":"https://openalex.org/keywords/charge-carrier-mobility","display_name":"carrier mobility","score":0.9150000214576721},{"id":"https://openalex.org/keywords/oxygen-diffusion","display_name":"oxygen diffusion","score":0.996999979019165},{"id":"https://openalex.org/keywords/chemisorption","display_name":"chemisorption","score":0.9879999756813049},{"id":"https://openalex.org/keywords/failure-mechanisms","display_name":"failure mechanisms","score":0.7929999828338623},{"id":"https://openalex.org/keywords/rf-magnetron-sputtering","display_name":"RF magnetron sputtering","score":0.8989999890327454}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8430246114730835},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.7030003666877747},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.6476902961730957},{"id":"https://openalex.org/C32737372","wikidata":"https://www.wikidata.org/wiki/Q417718","display_name":"Indium tin oxide","level":3,"score":0.6315796375274658},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.5689222812652588},{"id":"https://openalex.org/C2779679103","wikidata":"https://www.wikidata.org/wiki/Q5251805","display_name":"Degradation (telecommunications)","level":2,"score":0.5457834005355835},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5243699550628662},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5113882422447205},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.46982336044311523},{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.44508126378059387},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.4444112479686737},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.4356543719768524},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.38601207733154297},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.36549848318099976},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3576102554798126},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.32856249809265137},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.20346182584762573},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.13435098528862},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.06572297215461731},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.4028/www.scientific.net/kem.317-318.577","doi":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","pdf_url":null,"source":{"id":"https://openalex.org/S75411654","display_name":"Key engineering materials","issn_l":"1013-9826","issn":["1013-9826","1662-9795","1662-9809"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","vabb-shw"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Key Engineering Materials","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.4028/www.scientific.net/kem.317-318.577","doi":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/kem.317-318.577","pdf_url":null,"source":{"id":"https://openalex.org/S75411654","display_name":"Key engineering materials","issn_l":"1013-9826","issn":["1013-9826","1662-9795","1662-9809"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","vabb-shw"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Key Engineering Materials","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W2001344233","https://openalex.org/W2003863340","https://openalex.org/W2007397798","https://openalex.org/W2035222544","https://openalex.org/W2043634789","https://openalex.org/W2074040725","https://openalex.org/W2074564025"],"related_works":["https://openalex.org/W2069583384","https://openalex.org/W2147737028","https://openalex.org/W1968631785","https://openalex.org/W2036371979","https://openalex.org/W2002404930","https://openalex.org/W2035873290","https://openalex.org/W2045354259","https://openalex.org/W2019341200","https://openalex.org/W7220465550","https://openalex.org/W2568944836"],"abstract_inverted_index":{"Thermal":[0],"degradation":[1,79],"of":[2,29,88,106,111],"indium":[3],"tin":[4],"oxide":[5],"(ITO)":[6],"thin":[7,13,90],"film":[8,14,31],"has":[9],"been":[10],"investigated.":[11],"ITO":[12,89],"was":[15,25,33,42,47,63,82],"fabricated":[16],"on":[17],"glass":[18],"substrate":[19],"using":[20,49],"RF":[21],"magnetron":[22],"sputtering":[23],"and":[24,51,70,76,104],"characterized.":[26],"The":[27,92],"resistivity":[28],"the":[30,64,86],"which":[32],"thermally":[34],"degraded":[35],"at":[36],"high":[37],"temperatures":[38],"in":[39,66],"air":[40],"atmosphere":[41],"increased":[43],"highly.":[44],"Thermally-degraded":[45],"specimen":[46],"analyzed":[48],"XPS":[50],"Hall":[52],"measurement":[53],"to":[54,73,84],"reveal":[55],"failure":[56,61],"mechanism.":[57],"Result":[58],"showed":[59],"that":[60],"mechanism":[62],"decrease":[65],"charge":[67],"carrier":[68],"concentration":[69],"mobility":[71],"due":[72],"oxygen":[74],"diffusion":[75],"chemisorption.":[77],"Accelerated":[78],"test":[80],"(ADT)":[81],"performed":[83],"predict":[85],"lifetime":[87,93],"film.":[91],"under":[94],"normal":[95],"operating":[96],"condition":[97],"could":[98],"be":[99],"predicted":[100],"via":[101],"statistical":[102],"analysis":[103],"modeling":[105],"data":[107],"acquired":[108],"from":[109],"ADT":[110],"a":[112],"short":[113],"period.":[114]},"counts_by_year":[{"year":2017,"cited_by_count":1}],"updated_date":"2026-09-25T08:18:29.962427","created_date":"2016-06-24T00:00:00"}