{"id":"https://openalex.org/W1981304472","doi":"https://doi.org/10.1117/12.681825","title":"The study of contact hole for 65nm node with KrF","display_name":"The study of contact hole for 65nm node with KrF","publication_year":2006,"publication_date":"2006-05-04","ids":{"openalex":"https://openalex.org/W1981304472","doi":"https://doi.org/10.1117/12.681825","mag":"1981304472"},"language":"en","primary_location":{"id":"doi:10.1117/12.681825","doi":"https://doi.org/10.1117/12.681825","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.681825","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5017698337","display_name":"Taejun You","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Tae-Jun You","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049911256","display_name":"Sungwoo Ko","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sung-Woo Ko","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":null,"display_name":"James Moon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"James Moon","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031350129","display_name":"Yeong-Bae Ahn","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yeong-Bae Ahn","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042867486","display_name":"Byung-Ho Nam","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Byung-Ho Nam","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112705896","display_name":"Donggyu Yim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Dong-Gyu Yim","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4405272917"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"6283","issue":null,"first_page":"628336","last_page":"628336"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/contact-hole-patterning","display_name":"contact hole patterning","score":0.9990000128746033},{"id":"https://openalex.org/keywords/krf-excimer-laser-lithography","display_name":"KrF excimer laser lithography","score":0.8349999785423279},{"id":"https://openalex.org/keywords/65-nm-technology-node","display_name":"65 nm technology","score":0.925000011920929},{"id":"https://openalex.org/keywords/off-axis-illumination","display_name":"off-axis illumination","score":0.859000027179718},{"id":"https://openalex.org/keywords/sub-resolution-assist-features","display_name":"sub-resolution assist features","score":0.8960000276565552},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.6079999804496765},{"id":"https://openalex.org/keywords/numerical-aperture","display_name":"numerical aperture","score":0.6420000195503235},{"id":"https://openalex.org/keywords/phase-shifting-masks","display_name":"phase-shifting masks","score":0.6809999942779541},{"id":"https://openalex.org/keywords/double-exposure","display_name":"double exposure","score":0.8529999852180481},{"id":"https://openalex.org/keywords/pattern-fidelity","display_name":"pattern fidelity","score":0.4410000145435333},{"id":"https://openalex.org/keywords/process-margin","display_name":"process margin","score":0.6510000228881836}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8471691608428955},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.8348565101623535},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7617637515068054},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.6921795010566711},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6377934217453003},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5381811857223511},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.5355989933013916},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.5250177979469299},{"id":"https://openalex.org/C89002693","wikidata":"https://www.wikidata.org/wiki/Q1538481","display_name":"Depth of focus (tectonics)","level":4,"score":0.5149558186531067},{"id":"https://openalex.org/C159108749","wikidata":"https://www.wikidata.org/wiki/Q898896","display_name":"Numerical aperture","level":3,"score":0.5033945441246033},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.47532323002815247},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.47119900584220886},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.45878392457962036},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.45104408264160156},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.43564146757125854},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.42810964584350586},{"id":"https://openalex.org/C774472","wikidata":"https://www.wikidata.org/wiki/Q6760393","display_name":"Margin (machine learning)","level":2,"score":0.42442527413368225},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3822925388813019},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3350021243095398},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.13732096552848816},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.13144707679748535},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.07364419102668762},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.0},{"id":"https://openalex.org/C58097730","wikidata":"https://www.wikidata.org/wiki/Q176318","display_name":"Subduction","level":3,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C77928131","wikidata":"https://www.wikidata.org/wiki/Q193343","display_name":"Tectonics","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.681825","doi":"https://doi.org/10.1117/12.681825","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.681825","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2011864239","https://openalex.org/W1982361390","https://openalex.org/W1970324381","https://openalex.org/W1990151988","https://openalex.org/W2070569268","https://openalex.org/W2008187725","https://openalex.org/W2006894793","https://openalex.org/W2058790668","https://openalex.org/W3178935475","https://openalex.org/W2007663783"],"abstract_inverted_index":{"The":[0,39,74,87],"contact":[1,31,60,83,142],"hole":[2,143],"patterning":[3,85,144],"has":[4],"been":[5],"huge":[6],"challenge":[7],"in":[8,35,56],"the":[9,36,91,115],"photolithography":[10],"since":[11,27],"sub-100nm":[12],"node":[13],"device.":[14],"There":[15],"are":[16,33],"many":[17],"difficulties":[18],"for":[19,50,71,103],"NA":[20,41],"(Numerical":[21],"Aperture)":[22],"and":[23,29,42,53,114,120,131,150],"illumination":[24,119],"optimization,":[25],"especially":[26],"dense":[28,59],"sparse":[30,72],"holes":[32,61,84],"mixed":[34],"same":[37],"mask.":[38],"high":[40],"OAI":[43,130,149],"(Off":[44],"Axis":[45],"Illumination)":[46],"have":[47,77],"strong":[48],"improvements":[49],"pattern":[51],"fidelity":[52],"process":[54],"margin":[55,67],"case":[57],"of":[58,65],"but":[62],"DoF":[63],"(Depth":[64],"Focus)":[66],"is":[68,89,117],"a":[69,147],"problem":[70],"patterns.":[73],"lithography":[75],"engineers":[76],"two":[78],"ways":[79],"to":[80],"overcome":[81],"these":[82],"problems.":[86],"one":[88],"using":[90,146],"resist":[92,96],"techniques":[93],"such":[94,123],"as":[95,124],"thermal":[97],"flow,":[98],"SAFIER":[99],"(Shrink":[100],"Assist":[101,128],"Techniques":[102],"Enhanced":[104],"Resolution),":[105],"RELACS":[106],"(Resolution":[107],"Enhancement":[108],"Lithography":[109],"Assisted":[110],"by":[111],"Chemical":[112],"Shrink)":[113],"other":[116],"optimizing":[118],"mask":[121],"layout":[122],"SRAF":[125,151],"(Sub":[126],"Resolution":[127],"Feature),":[129],"PSM":[132],"(Phase":[133],"Shift":[134],"Mask),":[135],"double":[136],"exposure.":[137],"This":[138],"paper":[139],"will":[140],"discuss":[141],"results":[145],"combination":[148],"with":[152],"KrF.":[153]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}