{"id":"https://openalex.org/W1980375423","doi":"https://doi.org/10.1117/12.474620","title":"Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities","display_name":"Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities","publication_year":2002,"publication_date":"2002-07-15","ids":{"openalex":"https://openalex.org/W1980375423","doi":"https://doi.org/10.1117/12.474620","mag":"1980375423"},"language":"en","primary_location":{"id":"doi:10.1117/12.474620","doi":"https://doi.org/10.1117/12.474620","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.474620","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5031918684","display_name":"Theodore M. Bloomstein","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Theodore M. Bloomstein","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013839011","display_name":"Vladimir Liberman","orcid":"https://orcid.org/0000-0001-7470-4957","observed_orcids":["https://orcid.org/0000-0001-7470-4957"]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Vladimir Liberman","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004265091","display_name":"M. Rothschild","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Mordechai Rothschild","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035787652","display_name":"Stephen T. Palmacci","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Stephen T. Palmacci","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061781847","display_name":"Dennis E. Hardy","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. E. Hardy","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]},{"author_position":"last","author":{"id":null,"display_name":"Jan H. C. Sedlacek","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122954","display_name":"MIT Lincoln Laboratory","ror":"https://ror.org/022z6jk58","country_code":"US","type":"facility","lineage":["https://openalex.org/I4210122954","https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jan H. C. Sedlacek","raw_affiliation_strings":["MIT Lincoln Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MIT Lincoln Lab. (United States)","institution_ids":["https://openalex.org/I4210122954"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210122954"],"apc_list":null,"apc_paid":null,"fwci":1.1263,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.74862116,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"4691","issue":null,"first_page":"709","last_page":"709"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8964999914169312,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.8964999914169312,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.044599998742341995,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.014299999922513962,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/optical-surface-contamination","display_name":"optical surface contamination","score":0.7630000114440918},{"id":"https://openalex.org/keywords/hydrocarbon-impurities","display_name":"hydrocarbon impurities","score":0.8820000290870667},{"id":"https://openalex.org/keywords/calcium-fluoride-substrate","display_name":"calcium fluoride substrate","score":0.8379999995231628},{"id":"https://openalex.org/keywords/magnesium-fluoride-thin-films","display_name":"magnesium fluoride thin films","score":0.8650000095367432},{"id":"https://openalex.org/keywords/outgassing","display_name":"outgassing","score":0.7279999852180481},{"id":"https://openalex.org/keywords/oxygen-contamination","display_name":"oxygen contamination","score":0.6320000290870667}],"concepts":[{"id":"https://openalex.org/C2777207669","wikidata":"https://www.wikidata.org/wiki/Q43648","display_name":"Hydrocarbon","level":2,"score":0.8202860355377197},{"id":"https://openalex.org/C1012414","wikidata":"https://www.wikidata.org/wiki/Q778653","display_name":"Outgassing","level":2,"score":0.7180536985397339},{"id":"https://openalex.org/C112570922","wikidata":"https://www.wikidata.org/wiki/Q60528603","display_name":"Contamination","level":2,"score":0.7157952785491943},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6413449048995972},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.615011990070343},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.4956701993942261},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.46687954664230347},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.46615469455718994},{"id":"https://openalex.org/C56819118","wikidata":"https://www.wikidata.org/wiki/Q27084","display_name":"Parts-per notation","level":2,"score":0.43475210666656494},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4222796559333801},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.4164992570877075},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.413720965385437},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.41138702630996704},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3109622001647949},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2716047465801239},{"id":"https://openalex.org/C107872376","wikidata":"https://www.wikidata.org/wiki/Q321355","display_name":"Environmental chemistry","level":1,"score":0.21280932426452637},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.21009081602096558},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.11922165751457214},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.474620","doi":"https://doi.org/10.1117/12.474620","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.474620","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2026205114","https://openalex.org/W2090017346","https://openalex.org/W2037853252","https://openalex.org/W2009254314","https://openalex.org/W2043884634","https://openalex.org/W2140884540","https://openalex.org/W2049406427","https://openalex.org/W2064225588","https://openalex.org/W2008569076","https://openalex.org/W4321641547"],"abstract_inverted_index":{"Photodeposition":[0,46],"rates":[1,47],"for":[2,52,73],"ten":[3],"hydrocarbon":[4,29,57],"species":[5,25,58],"have":[6,48],"been":[7,50],"measured":[8,51],"on":[9,59,78,94],"CaF2":[10,79],"substrates":[11],"under":[12],"157-nm":[13,42],"irradiation":[14],"in":[15,33,41],"the":[16,56,76,88,95],"presence":[17],"of":[18,22,28,36,55,90,110],"ppm":[19],"scale":[20],"levels":[21,109],"oxygen.":[23],"The":[24,97],"are":[26,84],"representative":[27],"based":[30,43],"compounds":[31],"observed":[32],"outgassing":[34],"studies":[35],"common":[37],"build":[38],"materials":[39],"used":[40],"lithographic":[44],"systems.":[45],"also":[49],"a":[53,60,100],"subset":[54],"MgF2":[61],"thin":[62],"film,":[63],"six":[64],"anti-reflective":[65],"dielectric":[66],"stacks,":[67],"and":[68],"fluorine":[69],"doped":[70],"fused":[71],"silica":[72],"comparison":[74],"with":[75],"results":[77],"substrates.":[80],"Two":[81],"contamination":[82,102],"processes":[83],"observed.":[85],"One":[86],"is":[87,99,104],"formation":[89],"an":[91],"equilibrium":[92],"layer":[93],"surfaces.":[96],"other":[98],"quasi-permanent":[101],"which":[103],"most":[105],"pronounced":[106],"at":[107],"elevated":[108],"contaminant.":[111]},"counts_by_year":[],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}