{"id":"https://openalex.org/W1980243644","doi":"https://doi.org/10.2494/photopolymer.21.383","title":"Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)","display_name":"Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)","publication_year":2008,"publication_date":"2008-01-01","ids":{"openalex":"https://openalex.org/W1980243644","doi":"https://doi.org/10.2494/photopolymer.21.383","mag":"1980243644"},"language":"en","primary_location":{"id":"doi:10.2494/photopolymer.21.383","doi":"https://doi.org/10.2494/photopolymer.21.383","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.383","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/3/21_3_383/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/3/21_3_383/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5058471449","display_name":"Francis M. Houlihan","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Francis Houlihan","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111170174","display_name":"Shinji Miyazaki","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Shinji Miyazaki","raw_affiliation_strings":["AZ Electronic Materials, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027903802","display_name":"Alberto D. Dioses","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Alberto Dioses","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100351841","display_name":"Lin Zhang","orcid":"https://orcid.org/0000-0002-3362-8908","observed_orcids":["https://orcid.org/0000-0002-3362-8908"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lin Zhang","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024236001","display_name":"Yuki Ubayashi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yuki Ubayashi","raw_affiliation_strings":["AZ Electronic Materials, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Kazuyoshi Ohta","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kazuyoshi Ohta","raw_affiliation_strings":["AZ Electronic Materials, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055774677","display_name":"Joseph E. Oberlander","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Joseph Oberlander","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080987390","display_name":"Alexandra Krawicz","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Alexandra Krawicz","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103402724","display_name":"Sumathy Vasanthan","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Sumathy Vasanthan","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100457532","display_name":"Meng Li","orcid":"https://orcid.org/0000-0003-0087-3082","observed_orcids":["https://orcid.org/0000-0003-0087-3082"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Meng Li","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017385371","display_name":"Yayi Wei","orcid":"https://orcid.org/0000-0003-3733-3274","observed_orcids":["https://orcid.org/0000-0003-3733-3274"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yayi Wei","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110075799","display_name":"Ping-Hung Lu","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"PingHung Lu","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5079783999","display_name":"Mark O. Neisser","orcid":"https://orcid.org/0000-0002-3758-0534","observed_orcids":["https://orcid.org/0000-0002-3758-0534"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mark Neisser","raw_affiliation_strings":["AZ Electronic Materials, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"AZ Electronic Materials, USA","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.2916,"has_fulltext":true,"cited_by_count":1,"citation_normalized_percentile":{"value":0.64328918,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"21","issue":"3","first_page":"383","last_page":"392"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9556000232696533,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9556000232696533,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.025800000876188278,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.006000000052154064,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bottom-anti-reflective-coating","display_name":"bottom anti-reflective coating","score":0.8479999899864197},{"id":"https://openalex.org/keywords/radiation-sensitive-materials","display_name":"radiation-sensitive materials","score":0.5519999861717224},{"id":"https://openalex.org/keywords/193-nm-lithography","display_name":"193 nm lithography","score":0.8600000143051147},{"id":"https://openalex.org/keywords/248-nm-lithography","display_name":"248 nm lithography","score":0.9980000257492065},{"id":"https://openalex.org/keywords/photomask","display_name":"photomask","score":0.5830000042915344}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7910056114196777},{"id":"https://openalex.org/C153385146","wikidata":"https://www.wikidata.org/wiki/Q18335","display_name":"Radiation","level":2,"score":0.5377936363220215},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.39377039670944214},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3077528774738312},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2494/photopolymer.21.383","doi":"https://doi.org/10.2494/photopolymer.21.383","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.383","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/3/21_3_383/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2494/photopolymer.21.383","doi":"https://doi.org/10.2494/photopolymer.21.383","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.383","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/3/21_3_383/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W1980243644.pdf","grobid_xml":"https://content.openalex.org/works/W1980243644.grobid-xml"},"referenced_works_count":6,"referenced_works":["https://openalex.org/W1994004060","https://openalex.org/W2004040942","https://openalex.org/W2013794333","https://openalex.org/W2037323659","https://openalex.org/W2068745685","https://openalex.org/W4236566899"],"related_works":["https://openalex.org/W2037323659","https://openalex.org/W1988814204","https://openalex.org/W2013794333","https://openalex.org/W2029161986","https://openalex.org/W2040363685","https://openalex.org/W1974721342","https://openalex.org/W2087198846","https://openalex.org/W2057977538","https://openalex.org/W1994004060","https://openalex.org/W1988617872"],"abstract_inverted_index":{"We":[0],"review":[1],"approaches":[2],"that":[3],"we":[4],"have":[5],"developed":[6],"at":[7],"193":[8],"and":[9,14,25],"248":[10],"nm":[11],"for":[12,34],"first":[13],"second":[15],"generation":[16],"Radiation":[17],"Sensitive":[18],"Developable":[19],"Bottom":[20],"Anti":[21],"Reflective":[22],"Coatings":[23],"(DBARC)":[24],"give":[26],"an":[27],"account":[28],"of":[29,37],"our":[30],"most":[31],"recent":[32],"results":[33],"both":[35],"types":[36],"DBARC's.":[38]},"counts_by_year":[],"updated_date":"2026-11-05T12:25:35.769452","created_date":"2016-06-24T00:00:00"}