{"id":"https://openalex.org/W1978987659","doi":"https://doi.org/10.1016/j.ssc.2012.12.024","title":"Low temperature electrical transport properties of F-doped SnO2 films","display_name":"Low temperature electrical transport properties of F-doped SnO2 films","publication_year":2013,"publication_date":"2013-01-04","ids":{"openalex":"https://openalex.org/W1978987659","doi":"https://doi.org/10.1016/j.ssc.2012.12.024","mag":"1978987659"},"language":"en","primary_location":{"id":"doi:10.1016/j.ssc.2012.12.024","doi":"https://doi.org/10.1016/j.ssc.2012.12.024","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ssc.2012.12.024","pdf_url":null,"source":{"id":"https://openalex.org/S82088436","display_name":"Solid State Communications","issn_l":"0038-1098","issn":["0038-1098","1879-2766"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid State Communications","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5071265786","display_name":"Kuang Hong Gao","orcid":"https://orcid.org/0000-0002-5396-4052","observed_orcids":["https://orcid.org/0000-0002-5396-4052"]},"institutions":[{"id":"https://openalex.org/I162868743","display_name":"Tianjin University","ror":"https://ror.org/012tb2g32","country_code":"CN","type":"education","lineage":["https://openalex.org/I162868743"]},{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"K.H. Gao","raw_affiliation_strings":["Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200062, China","Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Department of Physics, Tianjin University, Tianjin 300072, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200062, China","institution_ids":["https://openalex.org/I66867065"]},{"raw_affiliation_string":"Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Department of Physics, Tianjin University, Tianjin 300072, China","institution_ids":["https://openalex.org/I162868743"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033464710","display_name":"Tie Lin","orcid":"https://orcid.org/0000-0002-4510-268X","observed_orcids":["https://orcid.org/0000-0002-4510-268X"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"T. Lin","raw_affiliation_strings":["National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5031201629","display_name":"X. D. Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I162868743","display_name":"Tianjin University","ror":"https://ror.org/012tb2g32","country_code":"CN","type":"education","lineage":["https://openalex.org/I162868743"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"X.D. Liu","raw_affiliation_strings":["Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Department of Physics, Tianjin University, Tianjin 300072, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Department of Physics, Tianjin University, Tianjin 300072, China","institution_ids":["https://openalex.org/I162868743"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026890210","display_name":"X.H. Zhang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I184843921","display_name":"Hebei University of Technology","ror":"https://ror.org/018hded08","country_code":"CN","type":"education","lineage":["https://openalex.org/I184843921"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"X.H. Zhang","raw_affiliation_strings":["School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China","School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China","institution_ids":["https://openalex.org/I184843921"]},{"raw_affiliation_string":"School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China#TAB#","institution_ids":["https://openalex.org/I184843921"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108166663","display_name":"X.N. Li","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"X.N. Li","raw_affiliation_strings":["National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]},{"author_position":"middle","author":{"id":null,"display_name":"J. Wu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"J. Wu","raw_affiliation_strings":["National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055383799","display_name":"Y.F. Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210163874","display_name":"Shanghai Institute of Ceramics","ror":"https://ror.org/05etnz140","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210163874"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Y.F. Liu","raw_affiliation_strings":["Shanghai Institute of Ceramics, Chinese Academy of Science, Shanghai 200050, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Ceramics, Chinese Academy of Science, Shanghai 200050, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210163874"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067335857","display_name":"X.F. Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"X.F. Wang","raw_affiliation_strings":["National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072936428","display_name":"Y.W. Chen","orcid":"https://orcid.org/0000-0003-2566-018X","observed_orcids":["https://orcid.org/0000-0003-2566-018X"]},"institutions":[{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Y.W. Chen","raw_affiliation_strings":["Department of Physics, East China Normal University, Shanghai 200062, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, East China Normal University, Shanghai 200062, China","institution_ids":["https://openalex.org/I66867065"]}]},{"author_position":"middle","author":{"id":null,"display_name":"B. Ni","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"B. Ni","raw_affiliation_strings":["Electron Microscope Centre, East China Normal University, Shanghai 200062, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electron Microscope Centre, East China Normal University, Shanghai 200062, China","institution_ids":["https://openalex.org/I66867065"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027058494","display_name":"Ning Dai","orcid":"https://orcid.org/0000-0002-6164-4331","observed_orcids":["https://orcid.org/0000-0002-6164-4331"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"N. Dai","raw_affiliation_strings":["National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5023440487","display_name":"Junhao Chu","orcid":"https://orcid.org/0000-0003-1867-9296","observed_orcids":["https://orcid.org/0000-0003-1867-9296","https://orcid.org/0000-0001-5278-8969"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135723","display_name":"Shanghai Institute of Technical Physics","ror":"https://ror.org/02txedb84","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]},{"id":"https://openalex.org/I66867065","display_name":"East China Normal University","ror":"https://ror.org/02n96ep67","country_code":"CN","type":"education","lineage":["https://openalex.org/I66867065"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"J.H. Chu","raw_affiliation_strings":["Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200062, China","National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai 200062, China","institution_ids":["https://openalex.org/I66867065"]},{"raw_affiliation_string":"National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135723"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5071265786"],"corresponding_institution_ids":["https://openalex.org/I162868743","https://openalex.org/I66867065"],"apc_list":{"value":2960,"currency":"USD","value_usd":2960},"apc_paid":null,"fwci":1.1995,"has_fulltext":false,"cited_by_count":16,"citation_normalized_percentile":{"value":0.76673848,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"157","issue":null,"first_page":"49","last_page":"53"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10382","display_name":"Quantum and electron transport phenomena","score":0.9398999810218811,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10382","display_name":"Quantum and electron transport phenomena","score":0.9398999810218811,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.01889999955892563,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.016300000250339508,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/f-doped-sno2","display_name":"F-doped SnO2","score":0.9049999713897705},{"id":"https://openalex.org/keywords/sno2-thin-films","display_name":"SnO2 thin films","score":0.8989999890327454},{"id":"https://openalex.org/keywords/electrical-transport","display_name":"electrical transport","score":0.7379999756813049},{"id":"https://openalex.org/keywords/low-temperature-electrical-conductivity","display_name":"low-temperature conductivity","score":0.7089999914169312},{"id":"https://openalex.org/keywords/negative-magnetoresistance","display_name":"negative magnetoresistance","score":0.8399999737739563},{"id":"https://openalex.org/keywords/weak-localization","display_name":"weak localization","score":0.984000027179718},{"id":"https://openalex.org/keywords/inelastic-scattering-time","display_name":"inelastic scattering time","score":0.9359999895095825},{"id":"https://openalex.org/keywords/electron-phonon-coupling","display_name":"electron-phonon coupling","score":0.9559999704360962},{"id":"https://openalex.org/keywords/phonon-scattering","display_name":"phonon scattering","score":0.6779999732971191},{"id":"https://openalex.org/keywords/metallic-conductivity","display_name":"metallic conductivity","score":0.5649999976158142}],"concepts":[{"id":"https://openalex.org/C49023278","wikidata":"https://www.wikidata.org/wiki/Q5260650","display_name":"Dephasing","level":2,"score":0.7538425326347351},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.7130275964736938},{"id":"https://openalex.org/C39353612","wikidata":"https://www.wikidata.org/wiki/Q5283759","display_name":"Atmospheric temperature range","level":2,"score":0.6874156594276428},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.6804308295249939},{"id":"https://openalex.org/C7515221","wikidata":"https://www.wikidata.org/wiki/Q2252683","display_name":"Weak localization","level":4,"score":0.6716196537017822},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.6051903367042542},{"id":"https://openalex.org/C142199849","wikidata":"https://www.wikidata.org/wiki/Q3027672","display_name":"Inelastic scattering","level":3,"score":0.5617814064025879},{"id":"https://openalex.org/C172100665","wikidata":"https://www.wikidata.org/wiki/Q7465774","display_name":"Thermal conduction","level":2,"score":0.5576568841934204},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.510246753692627},{"id":"https://openalex.org/C65053842","wikidata":"https://www.wikidata.org/wiki/Q7187311","display_name":"Phonon scattering","level":3,"score":0.5036501288414001},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4796657860279083},{"id":"https://openalex.org/C204323151","wikidata":"https://www.wikidata.org/wiki/Q905424","display_name":"Range (aeronautics)","level":2,"score":0.47960102558135986},{"id":"https://openalex.org/C24169881","wikidata":"https://www.wikidata.org/wiki/Q186608","display_name":"Phonon","level":2,"score":0.47252753376960754},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4698547124862671},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.35423389077186584},{"id":"https://openalex.org/C117958382","wikidata":"https://www.wikidata.org/wiki/Q58347","display_name":"Magnetoresistance","level":3,"score":0.25184351205825806},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2074342966079712},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.08677473664283752},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.05062460899353027},{"id":"https://openalex.org/C115260700","wikidata":"https://www.wikidata.org/wiki/Q11408","display_name":"Magnetic field","level":2,"score":0.04736688733100891},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.ssc.2012.12.024","doi":"https://doi.org/10.1016/j.ssc.2012.12.024","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ssc.2012.12.024","pdf_url":null,"source":{"id":"https://openalex.org/S82088436","display_name":"Solid State Communications","issn_l":"0038-1098","issn":["0038-1098","1879-2766"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid State Communications","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":36,"referenced_works":["https://openalex.org/W622342603","https://openalex.org/W1491795847","https://openalex.org/W1503829047","https://openalex.org/W1967933802","https://openalex.org/W1970578230","https://openalex.org/W1973019636","https://openalex.org/W1981032346","https://openalex.org/W1983865991","https://openalex.org/W1988690910","https://openalex.org/W1991686672","https://openalex.org/W1997555020","https://openalex.org/W1999668991","https://openalex.org/W2005667694","https://openalex.org/W2009525808","https://openalex.org/W2012586940","https://openalex.org/W2015566956","https://openalex.org/W2023696694","https://openalex.org/W2023710085","https://openalex.org/W2038830226","https://openalex.org/W2039065103","https://openalex.org/W2045263889","https://openalex.org/W2053954238","https://openalex.org/W2056810393","https://openalex.org/W2057215992","https://openalex.org/W2061916363","https://openalex.org/W2063885490","https://openalex.org/W2067988494","https://openalex.org/W2070023439","https://openalex.org/W2073955767","https://openalex.org/W2074700465","https://openalex.org/W2083076148","https://openalex.org/W2102403649","https://openalex.org/W2123399291","https://openalex.org/W2167810515","https://openalex.org/W2499906541","https://openalex.org/W4386412882"],"related_works":["https://openalex.org/W2032837002","https://openalex.org/W2808149641","https://openalex.org/W4293217087","https://openalex.org/W2021244546","https://openalex.org/W7097173613","https://openalex.org/W2154597597","https://openalex.org/W2063885490","https://openalex.org/W2514694502","https://openalex.org/W4405639713","https://openalex.org/W2056051850"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":2}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}