{"id":"https://openalex.org/W1978659742","doi":"https://doi.org/10.1117/12.213762","title":"Laser conditioning of LaF 3 /MgF 2 dielectric coatings for excimer lasers","display_name":"Laser conditioning of LaF 3 /MgF 2 dielectric coatings for excimer lasers","publication_year":1995,"publication_date":"1995-07-14","ids":{"openalex":"https://openalex.org/W1978659742","doi":"https://doi.org/10.1117/12.213762","mag":"1978659742"},"language":"en","primary_location":{"id":"doi:10.1117/12.213762","doi":"https://doi.org/10.1117/12.213762","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.213762","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055421825","display_name":"Norbert Kaiser","orcid":"https://orcid.org/0009-0004-6162-253X","observed_orcids":["https://orcid.org/0009-0004-6162-253X"]},"institutions":[{"id":"https://openalex.org/I4210115660","display_name":"Fraunhofer Institute for Applied Optics and Precision Engineering","ror":"https://ror.org/02afjh072","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210115660","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Norbert Kaiser","raw_affiliation_strings":["Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik Jena (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik Jena (Germany)","institution_ids":["https://openalex.org/I4210115660"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109344373","display_name":"Bernhard Anton","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210115660","display_name":"Fraunhofer Institute for Applied Optics and Precision Engineering","ror":"https://ror.org/02afjh072","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210115660","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Bernhard Anton","raw_affiliation_strings":["Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)","institution_ids":["https://openalex.org/I4210115660"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051191988","display_name":"Heidrun Jaenchen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210115660","display_name":"Fraunhofer Institute for Applied Optics and Precision Engineering","ror":"https://ror.org/02afjh072","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210115660","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H. Jaenchen","raw_affiliation_strings":["Fraunhofer Institut fuer Angewandte Optik und Feinmechanik Jena (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institut fuer Angewandte Optik und Feinmechanik Jena (Germany)","institution_ids":["https://openalex.org/I4210115660"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108271580","display_name":"Klaus R. Mann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210093385","display_name":"Institut f\u00fcr Nanophotonik","ror":"https://ror.org/00ecchs44","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210093385"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Klaus R. Mann","raw_affiliation_strings":["Laser-Lab. Goettingen eV (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser-Lab. Goettingen eV (Germany)","institution_ids":["https://openalex.org/I4210093385"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080957301","display_name":"Eric Eva","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210093385","display_name":"Institut f\u00fcr Nanophotonik","ror":"https://ror.org/00ecchs44","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210093385"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Eric Eva","raw_affiliation_strings":["Laser Lab. Goettingen eV (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Lab. Goettingen eV (Germany)","institution_ids":["https://openalex.org/I4210093385"]}]},{"author_position":"middle","author":{"id":null,"display_name":"C. Fischer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210093385","display_name":"Institut f\u00fcr Nanophotonik","ror":"https://ror.org/00ecchs44","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210093385"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"C. Fischer","raw_affiliation_strings":["Laser Lab. Goettingen eV (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Lab. Goettingen eV (Germany)","institution_ids":["https://openalex.org/I4210093385"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071640332","display_name":"Rainer Henking","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210102034","display_name":"Laser Zentrum Hannover","ror":"https://ror.org/01gkym270","country_code":"DE","type":"nonprofit","lineage":["https://openalex.org/I4210102034"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Rainer Henking","raw_affiliation_strings":["Laser Zentrum Hannover eV (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Zentrum Hannover eV (Germany)","institution_ids":["https://openalex.org/I4210102034"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069262079","display_name":"Detlev Ristau","orcid":"https://orcid.org/0000-0002-1778-1945","observed_orcids":["https://orcid.org/0000-0002-1778-1945"]},"institutions":[{"id":"https://openalex.org/I4210102034","display_name":"Laser Zentrum Hannover","ror":"https://ror.org/01gkym270","country_code":"DE","type":"nonprofit","lineage":["https://openalex.org/I4210102034"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Detlev Ristau","raw_affiliation_strings":["Laser Zentrum Hannover eV (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Zentrum Hannover eV (Germany)","institution_ids":["https://openalex.org/I4210102034"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002794279","display_name":"Peter Weissbrodt","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165433","display_name":"Jenoptik (Germany)","ror":"https://ror.org/05g7t5c49","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210165433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Peter Weissbrodt","raw_affiliation_strings":["Jenoptik Technologie GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Jenoptik Technologie GmbH (Germany)","institution_ids":["https://openalex.org/I4210165433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080430604","display_name":"Dirk Mademann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165433","display_name":"Jenoptik (Germany)","ror":"https://ror.org/05g7t5c49","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210165433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Dirk Mademann","raw_affiliation_strings":["Jenoptik Technologie GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Jenoptik Technologie GmbH (Germany)","institution_ids":["https://openalex.org/I4210165433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056426678","display_name":"L. Raupach","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165433","display_name":"Jenoptik (Germany)","ror":"https://ror.org/05g7t5c49","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210165433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"L. Raupach","raw_affiliation_strings":["Jenoptik Technologie GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Jenoptik Technologie GmbH (Germany)","institution_ids":["https://openalex.org/I4210165433"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5080469540","display_name":"Erich J. Hacker","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210165433","display_name":"Jenoptik (Germany)","ror":"https://ror.org/05g7t5c49","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210165433"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Erich J. Hacker","raw_affiliation_strings":["Jenoptik Technologie GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Jenoptik Technologie GmbH (Germany)","institution_ids":["https://openalex.org/I4210165433"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":9.6893,"has_fulltext":false,"cited_by_count":9,"citation_normalized_percentile":{"value":0.98393574,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"2428","issue":null,"first_page":"400","last_page":"409"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/laser-conditioning","display_name":"laser conditioning","score":0.9639999866485596},{"id":"https://openalex.org/keywords/dielectric-thin-films","display_name":"dielectric thin films","score":0.8299999833106995},{"id":"https://openalex.org/keywords/excimer-laser","display_name":"excimer laser","score":0.8209999799728394},{"id":"https://openalex.org/keywords/248-nm","display_name":"248 nm","score":0.8209999799728394},{"id":"https://openalex.org/keywords/high-reflection-coatings","display_name":"high-reflectance coatings","score":0.6980000138282776},{"id":"https://openalex.org/keywords/laser-induced-damage-threshold","display_name":"laser-induced damage threshold","score":0.8970000147819519},{"id":"https://openalex.org/keywords/absorptivity","display_name":"absorptivity","score":0.9539999961853027},{"id":"https://openalex.org/keywords/multilayer-structures","display_name":"multilayer structures","score":0.7689999938011169},{"id":"https://openalex.org/keywords/stoichiometry","display_name":"stoichiometry","score":0.722000002861023},{"id":"https://openalex.org/keywords/high-power-laser-optics","display_name":"high-power laser optics","score":0.38600000739097595}],"concepts":[{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.45023074746131897},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.29750382900238037},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.23577892780303955}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1117/12.213762","doi":"https://doi.org/10.1117/12.213762","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.213762","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},{"id":"pmh:oai:fraunhofer.de:PX-21517","doi":null,"is_oa":false,"landing_page_url":"http://publica.fraunhofer.de/documents/PX-21517.html","pdf_url":null,"source":{"id":"https://openalex.org/S4306400801","display_name":"Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Fraunhofer IOF","raw_type":"Conference Paper"},{"id":"pmh:oai:publica.fraunhofer.de:publica/324521","doi":null,"is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/324521","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320323015","display_name":"Bundesministerium f\u00fcr Forschung und Technologie","ror":"https://ror.org/04pz7b180"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2080201068","https://openalex.org/W2031976390","https://openalex.org/W2005189747","https://openalex.org/W7067857229","https://openalex.org/W4253012506","https://openalex.org/W7030412790","https://openalex.org/W1515630840","https://openalex.org/W2020612065","https://openalex.org/W2017387368","https://openalex.org/W4236718680"],"abstract_inverted_index":{"LaF3/MgF2-dieletric":[0],"thin":[1],"film":[2],"combinations":[3],"can":[4],"be":[5,43],"applied":[6],"in":[7,60,64],"optics":[8],"for":[9,19],"wavelengths":[10],"down":[11],"to":[12,42,55],"150":[13],"nm.":[14],"Several":[15],"such":[16],"HR":[17],"systems":[18],"a":[20],"wavelength":[21],"of":[22,32],"248":[23],"nm":[24],"were":[25],"investigated.":[26],"In":[27],"these":[28],"coatings,":[29],"the":[30,50,61,65],"influence":[31],"laser":[33],"conditioning":[34,51],"on":[35],"damage":[36],"threshold":[37],"and":[38,46,57],"absorptivity":[39],"was":[40],"found":[41],"remarkable.":[44],"XPS-":[45],"TEM-investigations":[47],"showed":[48],"that":[49],"effect":[52],"is":[53],"related":[54],"structural":[56],"stoichiometric":[58],"changes":[59],"multilayers,":[62],"especially":[63],"near-surface-sublayers.":[66]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2022,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}