{"id":"https://openalex.org/W1978399033","doi":"https://doi.org/10.1016/s0040-6090(01)01706-0","title":"Atomic layer deposition of BN thin films","display_name":"Atomic layer deposition of BN thin films","publication_year":2002,"publication_date":"2002-01-01","ids":{"openalex":"https://openalex.org/W1978399033","doi":"https://doi.org/10.1016/s0040-6090(01)01706-0","mag":"1978399033"},"language":"en","primary_location":{"id":"doi:10.1016/s0040-6090(01)01706-0","doi":"https://doi.org/10.1016/s0040-6090(01)01706-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(01)01706-0","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5091232241","display_name":"Bj\u00f6rn M\u00e5rlid","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Bj\u00f6rn M\u00e5rlid","raw_affiliation_strings":["Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003123589","display_name":"Mikael Ottosson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Mikael Ottosson","raw_affiliation_strings":["Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Ulrika Pettersson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Ulrika Pettersson","raw_affiliation_strings":["Department of Materials Science, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 534 SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 534 SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048628629","display_name":"Karin Larsson","orcid":"https://orcid.org/0000-0002-4156-9442","observed_orcids":["https://orcid.org/0000-0002-4156-9442"]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":true,"raw_author_name":"Karin Larsson","raw_affiliation_strings":["Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111595877","display_name":"Jan\u2010Otto Carlsson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Jan-Otto Carlsson","raw_affiliation_strings":["Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Chemistry, \u00c5ngstr\u00f6m Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5048628629"],"corresponding_institution_ids":["https://openalex.org/I123387679"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":0.6495,"has_fulltext":false,"cited_by_count":64,"citation_normalized_percentile":{"value":0.63254383,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":99},"biblio":{"volume":"402","issue":"1-2","first_page":"167","last_page":"171"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11341","display_name":"Boron and Carbon Nanomaterials Research","score":0.8173999786376953,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11341","display_name":"Boron and Carbon Nanomaterials Research","score":0.8173999786376953,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.07859999686479568,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.0551999993622303,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/boron-nitride","display_name":"boron nitride","score":0.9670000076293945},{"id":"https://openalex.org/keywords/atomic-layer-deposition","display_name":"atomic layer deposition","score":0.9449999928474426},{"id":"https://openalex.org/keywords/boron-tribromide","display_name":"boron tribromide","score":0.6809999942779541},{"id":"https://openalex.org/keywords/nh3","display_name":"NH3","score":0.6909999847412109},{"id":"https://openalex.org/keywords/turbostratic-structure","display_name":"turbostratic structure","score":0.9190000295639038},{"id":"https://openalex.org/keywords/deposition-temperature","display_name":"deposition temperature","score":0.8569999933242798},{"id":"https://openalex.org/keywords/film-density","display_name":"film density","score":0.9679999947547913},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.9079999923706055},{"id":"https://openalex.org/keywords/optical-transparency","display_name":"optical transparency","score":0.7329999804496765},{"id":"https://openalex.org/keywords/silica-substrate","display_name":"silica substrate","score":0.7329999804496765}],"concepts":[{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.7606964707374573},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6860552430152893},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6246059536933899},{"id":"https://openalex.org/C2780243435","wikidata":"https://www.wikidata.org/wiki/Q410193","display_name":"Boron nitride","level":2,"score":0.6039838194847107},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5995274782180786},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5852898359298706},{"id":"https://openalex.org/C30646810","wikidata":"https://www.wikidata.org/wiki/Q185648","display_name":"Torr","level":2,"score":0.5703074932098389},{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.4938226640224457},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.4525333344936371},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.4372970759868622},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.43383437395095825},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.42660221457481384},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.26882386207580566},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.23957425355911255},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16788801550865173},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11449828743934631},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0040-6090(01)01706-0","doi":"https://doi.org/10.1016/s0040-6090(01)01706-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(01)01706-0","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322581","display_name":"Vetenskapsr\u00e5det","ror":"https://ror.org/03zttf063"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W1966310340","https://openalex.org/W1972229039","https://openalex.org/W1976131242","https://openalex.org/W1976868164","https://openalex.org/W1977041649","https://openalex.org/W1982741821","https://openalex.org/W1990996636","https://openalex.org/W1993769974","https://openalex.org/W1998070237","https://openalex.org/W2000124618","https://openalex.org/W2001161495","https://openalex.org/W2006815693","https://openalex.org/W2009138474","https://openalex.org/W2012133167","https://openalex.org/W2016329169","https://openalex.org/W2017485914","https://openalex.org/W2018531545","https://openalex.org/W2030668500","https://openalex.org/W2049898031","https://openalex.org/W2061967384","https://openalex.org/W2133763362"],"related_works":["https://openalex.org/W2073301485","https://openalex.org/W7120414525","https://openalex.org/W2889749650","https://openalex.org/W1999998300","https://openalex.org/W2008636408","https://openalex.org/W1971128711","https://openalex.org/W2054550195","https://openalex.org/W2032167406","https://openalex.org/W2050972438","https://openalex.org/W2010821060"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":9},{"year":2019,"cited_by_count":8},{"year":2018,"cited_by_count":6},{"year":2017,"cited_by_count":8},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}